Lee & Morse, P.C.
Methods of forming layer patterns of a semiconductor device
A method of manufacturing a layer pattern of a semiconductor device, the method including forming an anti-reflective coating (ARC) layer on an etching object layer such that the ARC layer includes a polymer having an imide group; forming a photoresist pattern on the ARC layer; wet etching portions of the ARC layer exposed by the photoresist pattern to form an ARC layer pattern; and etching the etching object layer using the photoresist pattern as an etch mask to form the layer pattern.
SAMSUNG ELECTRONICS CO., LTD.
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Kwang-Sub Tae-Hwan Tae-Sun Yu-Ra
Yoon Oh Kim Kim