Haynes and Boone, LLP
Pellicle aging estimation and particle removal from pellicle via acoustic waves
A pellicle is disposed over a lithography mask. An acoustic wave generator is placed over the pellicle. The acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency. A resonance detection tool is configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves. One or more electronic processors are configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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G03F G03F
inventional inventional
Mark Chun-Hung Yu-Ching Ching-Fang Sheng-Chi Ting-Hao
Chang Lin Lee Yu Chin Hsu