Myers Bigel Sibley & Sajovec
Methods of forming electronic devices including dielectric layers with different densities of titanium
Methods of forming an electronic device include providing a fist electrode, providing a dielectric oxide layer on the first electrode, and providing a second electrode on the dielectric oxide layer so that the dielectric oxide layer is between the first and second electrodes. More particularly, a first portion of the dielectric oxide layer adjacent the first electrode can have a first density of titanium, and a second portion of the dielectric oxide layer opposite the first electrode can have a second density of titanium different than the first density. Related structures are also discussed.
Samsung Electronics Co., Ltd.
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Ki-chul Sung-tae Jae-soon Young-sun Seung-hwan Gab-jin
Kim Kim Lim Kim Lee Nam