Muncy, Geissler, Olds & Lowe, P.C.
Method of forming a metal bump
A method for forming a metal bump is provided. Firstly, a photo-resist layer is formed on an IC chip by using a lithographic process. The photo-resist layer comprises a metal bump reserved groove and a metal bump slit reserved portion with the extent covering a metal pad. The metal bump slit reserved portion is formed on the metal pad and within the metal bump reserved groove. Then, a deposition process is applied to form the metal bump in the metal bump reserved groove and have the metal bump slit reserved portion penetrating the metal bump. Afterward, the photo-resist layer is removed to leave the metal bump with a metal bump slit therein.
CHUNG YUAN CHRISTIAN UNIVERSITY
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Ching-Yuan Chang-Chun
Ho Lee