Birch, Stewart, Kolasch & Birch, LLP
Resist composition and patterning process
Resist compositions comprising as the base resin a polymer using an alkoxyalkyl (meth)acrylate as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a practical level of shelf stability, a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution over a wide baking temperature range. The compositions are best suited as a chemically amplified positive resist material for micropatterning in the manufacture of VLSI.
Shin-Etsu Chemical Co., Ltd.
Y G Y
Y10S G03F Y10S
additional inventional additional
Osamu Takanobu
Watanabe Takeda