McGuireWoods LLP
Composition for positive type photoresist
A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of radiation and 3-methoxybutyl acetate and 4-butyrolactone as a solvent, is provided. The composition has a good photosensitivity and remainder ratio and no unpleasant odor.
Samsung Electronics Co., Ltd.
G G
G03F G03F
inventional inventional
Yun-Jung Sung-Chul Yu-Kyung Ki-Soo Jin-Ho Hong-Sik
Nah Kang Lee Kim Ju Park