Oblon, McClelland, Maier & Neustadt, L.L.P.
Method of forming mark pattern, recording medium and method of generating mark data
In a method of forming a mark pattern according to the embodiments, a film to be processed on a substrate is coated with a photosensitive film, and the photosensitive film is irradiated with exposure light via a mask. On the mask, a first circuit pattern having a first transmittance and a mark having a second transmittance and used to measure a superposition between films are arranged. By irradiating with the exposure light, a second circuit pattern having a first film thickness and a mark pattern having a second film thickness thinner than the first film thickness are formed on the substrate.
TOSHIBA MEMORY CORPORATION
H G
H01L G03F
inventional inventional
Taketo Nobuhiro Yuji
Kuriyama Komine Setta