Dority & Manning, P.A.
Generation of hydrogen reactive species for processing of workpieces
Methods, systems, and apparatus for generating hydrogen radicals for processing a workpiece, such as a semiconductor workpiece, are provided. In one example implementation, a method can include generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source; mixing hydrogen gas with the one or more species to generate one or more hydrogen radicals; and exposing the workpiece in a processing chamber to the one or more hydrogen radicals.
Mattson Technology, Inc. Beijing E-Town Semiconductor Technology Co., Ltd.
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Qi Michael X. Xinliang Hua
Zhang Yang Lu Chung