Whitham, Curtis, Whitham & McGinn
Electron beam shaping mask for an electron beam system with pattern writing capability
 An electron beam shaping mask for an electron beam with pattern writing capability, includes a substrate with various opening patterns and metallic films, which are respectively formed on top- and bottom-surfaces of the substrate. The metallic films serve as foundation metallic layers. According to the structure, a total thickness of the metallic layer is divided into the two thin metallic films. Since the substrate is protected from both sides by the metallic films, its thickness can be made to be thin. Therefore, a highly accurate patterning can be easily performed, and thermal stresses can be decreased and exfoliations of the metallic films can be avoided. 
NEC Corporation
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Y10T H01J H01J H01J Y10T G03F
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Katsuyuki Hiroshi
Itoh Yamashita