Composition for coating over a photoresist pattern
The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.
Z Electronic Materials USA Corp.
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G03F C08G C09D C08K C08K
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DongKwan Yi Jian Margareta Hengpeng SungEun Meng
Lee Cao Yin Paunescu Wu Hong Li