Myers Bigel, P.A.
Fabrication system of semiconductor device and method of fabricating a semiconductor device using the same
Disclosed are a system for fabricating a semiconductor device and a method of fabricating a semiconductor device. The system may include a chamber, an extreme ultraviolet (EUV) source in the chamber and configured to generate an EUV beam, an optical system on the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a particle collector between the reticle and the optical system and configured to allow for a selective transmission of the EUV beam and to remove a particle.
Samsung Electronics Co., Ltd.
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Keunhee Seungmin Jinseok Jinhong Suntaek
Bai Lee Heo Park Lim