Westerman, Hattori, Daniels & Adrian, LLP
Chemically amplified negative resist composition and patterning process
A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized.
SHIN-ETSU CHEMICAL CO., LTD.
G G
G03F G03F
inventional additional
Tamotsu Osamu Akinobu Takanobu Keiichi Ryuji
Watanabe Watanabe Tanaka Takeda Masunaga Koitabashi