Cantor Colburn LLP
Semiconductor substrate and method for manufacturing the same
Provided is a semiconductor substrate and a method for manufacturing the same. The semiconductor substrate includes a substrate, a discontinuously formed hemispheric metal layer on the substrate, and a semiconductor layer on the hemispheric metal layer. A plurality of voids on the interface of the substrate and discontinuous hemisphere are formed to absorb or relax the stain of interface. Accordingly, even if a subsequent layer is relatively thickly formed on the substrate, substrate bow or warpage can be minimized.
Lumigntech Co., Ltd.
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Hae Yong Jung Gyu Young Jun
Lee Kim Choi