McDermott, Will & Emery
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof
 The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided. 
Mitsubishi Denki Kabushiki Kaisha
G Y G Y
G03F Y10T G03F Y10T
inventional additional inventional additional
Takayuki Shinya Ayumi Nobuyuki Yuki Koichiro Shigenori Koji Atsushi
Saito Soeda Minamide Yoshioka Miyamoto Narimatsu Yamashita Taniguchi Hachisuka