Alston & Bird LLP
Method for modeling a photoresist profile
A computer-implemented method includes modeling, using the computer, a photoresist profile in accordance with a magnitude of a gradient of an inhibitor concentration disposed in the photoresist. The photoresist is used during a process to form an integrated circuit. In one embodiment, the computer-implemented method further includes applying the modeled photoresist profile to reduce a distortion in a printed photoresist pattern caused by a response of the photoresist to an electromagnetic wave and/or particle beam during the process.
SYNOPSYS, INC.
G
G03F
inventional
Haiqing Cheng En Qiaolin Hua
Wei Wu Zhang Song