Thomas|Kayden
Method and system for mask fabrication process control
A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.
Taiwan Semiconductor Manufacturing Co., Ltd.
G
G03F
inventional
Wen-Yao Chiech-Yi Chen-Yu Yuh-Fong
Chen Kuo Chang Hwang