Slater Matsil, LLP
Semiconductor devices and methods of manufacturing
An apparatus, semiconductor device and method of manufacture are presented, wherein a hard mask layer and one or more etch stop layers are etched in an etching chamber. In an embodiment the semiconductor device is placed on a mounting platform at a first height and an etch process is performed, then the semiconductor device is moved to a second height within the chamber and a second etch process is performed, with the rotational speed of the semiconductor device reduced during movements in order to reduce the chance of cross contamination.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Ya Tzu Jao Sheng Yu-Li Neng-Jye Yen-Chiu Wan Hsuan Chun-Li
Chen Huang Cheng Yang Kuo Hsu Chou