Paratus Law Group, PLLC
Image processing-based lithography system and method of coating target object
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
SNU R&DB FOUNDATION
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Jisung Sung Hoon Sueun Seungah Sangkwon
Jang Kwon Chung Lee Han