Haynes and Boone, LLP
Patterning process and chemical amplified photoresist with a photodegradable base
A method for fabricating an integrated circuit device is disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photodegradable base material; and exposing at least a portion of the second material layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
Y Y G Y Y
Y10S Y10S G03F Y10S Y10S
additional additional inventional additional additional
Burn Jeng Ching-Yu Tsai-Sheng Chien-Wei
Lin Chang Gau Wang