Haynes and Boone, LLP
Electron beam lithography system and method for improving throughput
An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
B Y B G H H H G
B82Y Y10S B82Y G03F H01J H01J H01J G03F
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Shy-Jay Jaw-Jung Wen-Chuan Burn Jeng
Lin Shin Wang Lin