JCIPRNET
Photomask, photolithography system and manufacturing process
A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chih-Chiang Che-Yuan Ching-Hung Ming-Ho
Tu Chang Lai Tsai