Anova Law Group, PLLC
Reaction chamber and plasma processing apparatus
A reaction chamber is provided. The reaction chamber includes a chamber body, a dielectric window, and a power supplier. The dielectric window is provided on top of the chamber body along a first direction and hermetically connected with the chamber body. Each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the first direction. The plurality of sets of coils are connected in parallel, with first ends electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, and with second ends grounded. The second ends of the plurality of sets of coils are arranged in proximity between the first ends.
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
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Gang Dongsan Mingming Changle Xingcun Longchao Mingda
Wei Li Song Guan Li Zhao Qiu