McClure, Qualey & Rodack, LLP
Method and apparatus for lithography in semiconductor fabrication
A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
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Po-Chung Li-Jui Chueh-Chi Tzung-Chi Tsung-Yen Chia-Hsin Che-Chang
Cheng Chen Kuo Fu Lee Chou Hsu