Beyer & Weaver, LLP
Method for igniting a plasma inside a plasma processing reactor
 The invention relates to a plasma processing reactor for processing a substrate. The plasma processing reactor includes a process chamber. The plasma processing reactor further includes an inductive coil configured to be coupled to a RF power source having a RF frequency wherein the inductive coil generates an electric field inside of the process chamber. The plasma processing reactor additionally includes a magnetic field producing device configured to produce a magnetic field inside the process chamber in proximity of the electric field. 
Lam Research Corporation
H H H
H01J H01J H01J
inventional inventional inventional
Thomas E. Jian J. Joel M.
Wicker Chen Cook