Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Resist underlayer film-forming composition
A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R3 to R8 individually represent a group shown by the following formula (2) or the like. R1 represents a single bond or the like. R2 represents a hydrogen atom or the like.
JSR Corporation
G C C G
G03F C08G C08L G03F
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Makoto Yushi Takanori Shinya Kyoyu Kazuhiko Satoru Shin-ya
Sugiura Matsumura Nakano Nakafuji Yasuda Komura Murakami Minegishi