Haynes and Boone, LLP
Critical dimension (CD) control by spectrum metrology
A method for patterning a substrate includes forming a material layer on the substrate; performing a first etching on the material layer to form a pattern; measuring the pattern of the material layer using an optical spectrum metrology tool; determining whether the measuring indicates that the etching step achieved a predefined result; and producing an etching recipe and performing a second etching of the material layer using the etching recipe if the predefined result was not achieved.
Taiwan Semiconductor Manufacturing Company, Ltd.
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H01L H01L
inventional inventional
Chang-Cheng Wen-Chuan Chi-Lun Yen-Bin Allen Shih-Ming Hung Chang
Hung Wang Lu Huang Hsia Chang Hsieh