Slater Matsil, LLP
Morphology of resist mask prior to etching
Embodiments provide a patterning process. A photoresist layer is patterned. At least portions of the photoresist layer are converted from an organic material to an inorganic material by a deposition process of a metal oxide. All or some of the patterned photoresist layer may be converted to a carbon-metal-oxide. A metal oxide crust may be formed over the patterned photoresist layer. After conversion, the patterned photoresist layer is used as an etch mask to etch an underlying layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Tze-Liang Wei-Ren Jung-Hau Ching-Yu Shing-Chyang
Lee Wang Shiu Chang Pan