Harrity & Harrity, LLP
Contact spacer formation using atomic layer deposition
A contact structure in a semiconductor device includes a layer of dielectric material and a via formed through the dielectric material. The contact structure further includes a spacer formed on sidewalls of the via using atomic layer deposition (ALD) and a metal deposited in the via.
Spansion LLC Advanced Micro Devices, Inc,
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inventional inventional
Minh Van Ning Angela T. Ankur Bhushan Norimitsu Wenmei Amol Ramesh
Ngo Cheng Hui Agarwal Takagi Li Joshi