Antonelli, Terry, Stout & Kraus, LLP
Process for stripping photoresist while producing liquid crystal display device
 A liquid crystal display device is produced by effecting in the course of its production steps a resist-peeling method including the steps of (a) changing the quality of a resist layer on a substrate, (b) contacting the changed resist with a liquid containing 2-amino-1-ethanol, and (c) removing the liquid containing the thus peeled resist from the surface of the etched resist, and optionally, (d) regenerating a liquid containing 2-amino-1-ethanol by distillation from the liquid used in step (c) and reusing the regenerated liquid in step (b). 
Hitachi, Ltd.
G Y C G
G02F Y10S C11D G03F
additional additional inventional inventional
Masato Yasushi Michio Mitsuo Satoru Hitoshi Toshiyuki Hiroshi
Kikuchi Sano Tsukii Nakatani Todoroki Oka Koshita Kikuchi