Method of manufacturing semiconductor devices
A method of manufacturing a semiconductor device including the steps of providing a substrate having first type semiconductor regions and second type semiconductor regions, forming a conformal first epitaxy mask layer on the substrate, forming first type epitaxial layer in the substrate of the first type semiconductor regions, forming a conformal second epitaxy mask layer on the substrate, forming second type epitaxial layer in the substrate of the second type semiconductor regions, and removing the second epitaxy mask layer.
UNITED MICROELECTRONICS CORP.
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Chung-Fu Yu-Hsiang Yen-Liang Home-Been Pei-Yu Chia-Jong
Chang Hung Wu Cheng Chou Liu