Sughrue Mion, PLLC
Simulation method of sputtering
The method includes the steps of: calculating a direction-dependent distribution of ejected particles from a target, dividing a range of the vertical angle &thgr;, with respect to a direction perpendicular to the surface of the target, into sections of an equal interval, counting a number of the ejected particles for every section of the vertical angle &thgr;, and calculating a vertical distribution function by interpolating the counted numbers of the ejected particles as a function of the vertical angle &thgr;. The method also includes determining values of the vertical angle &thgr; likely to emerge in a random process of a particle ejection from the target using the vertical distribution function based on a rejection method, determining values of the horizontal angle &phgr;, measured from a direction in the surface plane of the target, likely to emerge in a random process of a particle ejection from the target, and calculating tracks of sputtered particles in a sputtering arrangement using the values of the vertical angles and the horizontal angles determined by the third step and the fourth step in accordance with the Monte Carlo method.
NEC Corporation
G G
G06F G06F
additional inventional
Hiroaki
Yamada