Scully, Scott, Murphy & Presser, P.C.
Wet developable bottom antireflective coating composition and method for use thereof
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
International Business Machines Corporation
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C08F Y10S G03F C08F C08F
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Wenjie Kuang-Jung J. Mahmoud Ranee Wai-Ling Kaushal S. Margaret C. Pushkara R.
Li Chen Khojasteh Kwong Patel Lawson Varanasi