Ward and Smith, P.A.
Hard mask composition for spin-coating
Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.
Samsung Electronics Co., Ltd.
G H H H G H
G03F H01L H01L H01L G03F H01L
inventional inventional inventional inventional additional inventional
Song-se Jung-sik Jung-hoon Boo-deuk Nae-ry
Yi Choi Kim Kim Yu