Tutunjian & Bitetto, P.C.
Indium gallium arsenide metal oxide semiconductor field effect transistor having a low contact resistance to metal electrode
A semiconductor device that includes source and drain regions that are doped to an n-type conductivity and are comprised of a type III-V semiconductor material. The semiconductor device further includes a contact to at least one of the source and drain regions. The contact includes an interface passivation layer atop the at least one source and drain region, and an n-type zinc oxide layer. A conduction band of the type III-V semiconductor material of the at least one source and drain region is substantially aligned with a conduction band of the n-type zinc oxide containing layer.
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Joel P. Yun Seog Devendra K. Ning
de Souza Lee Sadana Li