Tung & Associates
Method for forming an improved low power SRAM contact
A method of forming contact openings in a semiconductor device including providing a semiconducting substrate; forming an etch stop layer on said semiconducting substrate; forming a dielectric layer on said etch stop layer; forming a bottom anti-reflective coating (BARC) on said dielectric layer; forming and patterning a mask on said BARC layer; and, forming at least a first contact opening exposing said etch stop layer by a first etching process.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chia-Der Chien-Chih Yu-Ching Yi-Tung
Chang Chou Chang Yen