Rothwell, Figg, Ernst & Manbeck, P.C.
Focus ring heating method, plasma etching apparatus, and plasma etching method
There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching apparatus includes a vacuum processing chamber; a lower electrode serving as a mounting table for mounting a substrate thereon; an upper electrode provided to face the lower electrode; a gas supply unit for supplying a processing gas; a high frequency power supply for supplying a high frequency power to the lower electrode to generate a plasma of the processing gas; and a focus ring provided on the lower electrode to surround a periphery of the substrate. In the plasma etching apparatus, the focus ring is heated by irradiating a heating light thereto from a light source provided outside the vacuum processing chamber.
Tokyo Electron Limited
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inventional inventional additional inventional inventional
Masashi Chishio Tatsuo Jun
Saito Koshimizu Matsudo Yamawaku