Snell & Wilmer, L.L.P.
Gas distribution apparatus for improved film uniformity in an epitaxial system
A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.
ASM IP Holding B.V.
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C30B C30B C23C C23C C23C
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Robert Wentao Stephen Dale Lee Timo
Vyne Wang Coomer Bode Bergman