Coudert Brothers
Electron-beam treatment procedure for patterned mask layers
 Methods for pretreating patterned masks layers, such as photoresist masks, with electron-beam radiation for use in high temperature processes are disclosed. The electron-beam exposure deactivates compounds within the mask material which would ordinarily decompose and produce gasses within the photoresist layer. The gasses cause blistering in the untreated photoresist layer, which in turn degrades the dimensional integrity of the untreated layer. 
Fujitsu Limited
G H
G03F H01L
inventional inventional
Wen-chou Vincent Solomon I. William T. David
Wang Beilin Chou Kudzuma