Harrity & Harrity, LLP
Film stacks to prevent UV-induced device damage
A film stack includes an interlayer dielectric formed over one or more devices. The film stack further includes a first layer having a high extinction coefficient formed on the interlayer dielectric and a second layer having a low extinction coefficient formed on the first layer. The first and second layers prevent ultraviolet induced damage to the one or more devices while minimizing reflectivity for lithographic processes.
Spansion LLC GlobalFoundries Inc.
G
G02B
inventional
Ning Wenmei Minh Van Angela T. Hirokazu
Cheng Li Ngo Hui Tokuno