Marshall, Gerstein & Borun LLP
Photoresist polymer and photoresist composition containing the same
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness).
Hynix Semiconductor Inc. Dongjin Semichem Co., Ltd.
G G G Y G
G03F G03F G03F Y10S G03F
inventional inventional inventional additional additional
Seung Chan Cheol Kyu Jung Woo Geun Su Ki Soo Jae Hyun Sang Hyang Jae Hyun
Moon Bok Kim Lee Shin Kim Lee Kang