Maschoff Brennan
Lithography method for positive tone development
A lithography method includes forming a resist layer over a substrate. The resist layer is exposed to radiation. The exposed resist layer is developed using a developer that removes an exposed portion of the exposed resist layer, thereby forming a patterned resist layer. The patterned resist layer is rinsed using a basic aqueous rinse solution.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Ching-Yu Ming-Hui Chen-Yu Chin-Hsiang Cheng-Han
Chang Weng Liu Lin Wu