Sughrue Mion, PLLC
Image exposure device and laser exposure device applied thereto
When a ratio R between a total angle φ of a widening angle in a median intensity of light of a light source (a GaN based semiconductor laser) and a total angle 2/φ of a widening angle of light defining a numerical aperture NA of a collimator optical system (collimator lens) is defined as R=(sin−1NA)×2/φ, the numerical aperture of the collimator optical system (collimator lens) is set so that 2.0≧R≧0.58. Thus, an image exposure device is provided that can suppress stray light of a light source that emits a large amount of stray light.
Fujifilm Corporation
G
G03B
inventional
Yoshinori Kenji Toshiro Kiichi
Morimoto Matsumoto Hayakawa Kato