McDermott Will & Emery LLP
Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof
A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.
Renesas Technology Corp.
G G H H G H H H
G03F G03F H01L H01L G03F H01L H01L H01L
inventional inventional additional additional inventional additional inventional additional
Koichiro Masahiko Atsushi
Narimatsu Takeuchi Ueno