Hauptman Ham, LLP
Method of manufacturing silicon nanowire array
Provided is a method for manufacturing a silicon nanowire array comprising the steps of: positioning plastic particles separated apart from one another in a uniform random pattern on a silicon substrate; forming a catalyst layer between the plastic particles; removing the plastic particles; vertically etching portions of the silicon substrate that contact the catalyst layer; and removing the catalyst layer. The present invention provides a simple and cost-effective process, enables mass-production through large surface area processing, enables the manufacture of nanowire even at a site having limited resources, and enables the structures of nanowire to be individually controlled.
GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
H B H H B B H B B H B H H H H
H01L B81C H01L H01L B81C B82Y H01L B81C B82Y H01L B81B H01L H01L H01L H01L
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Se Yeong Myung Han
Lee Yoon