Lowe, Price, LeBlanc & Becker
Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive
 Disclosed herein is a positive resist composition comprising in admixture: PA1 (a) 100 parts by weight of an alkali-soluble phenolic resin; PA1 (b) 1-100 parts by weight of a photosensitive agent formed of a quinonediazide sulfonic acid ester; PA1 (c) 1-100 parts by weight of a hydroxy compound having a structure that at least part of its hydroxyl group(s) (--OH) has been modified by at least one conversion reaction selected from the group consisting of esterification with sulfonic acid (--OSO.sub.2 R), esterification with carboxylic acid (--OCOR) and etherification (--O--R), in which R means an alkyl, substituted alkyl, alkenyl, substituted alkenyl, aryl, substituted aryl, aralkyl or substituted aralkyl group; and PA1 (d) sufficient solvent to dissolve the foregoing composition components. 
Nippon Zeon Co., Ltd.
G
G03F
inventional
Shoji Shinya Hiroshi Motofumi Toshiaki Kazuko Teturyo
Kawata Ikeda Yagi Kashiwagi Fujii Koito Kusunoki