Slater Matsil, LLP
Photoresist system and method
A system and method for photoresists is provided. In an embodiment a cross-linking or coupling reagent is included within a photoresist composition. The cross-linking or coupling reagent will react with the polymer resin within the photoresist composition to cross-link or couple the polymers together, resulting in a polymer with a larger molecular weight. This larger molecular weight will cause the dissolution rate of the photoresist to decrease, leading to a better depth of focus for the line.
Taiwan Semiconductor Manufacturing Company, Ltd.
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G03F H01L G03F H01L H01L H01L
inventional inventional inventional additional inventional inventional
Chen-Hau Ching-Yu
Wu Chang