Slater and Matsil, L.L.P.
System and method for improved automated semiconductor wafer manufacturing
A method for aligning a photolithographic machine in an automated semiconductor manufacturing system is provided. The method may include identifying a maximum precision degree for a wafer and identifying a maximum overlay correction value. The method may simulate one or more algorithms to determine whether an algorithm aligns a leading lot within alignment specifications. The method may align a photolithography machine using an algorithm selected based on the simulations.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G G Y G Y G
G05B G05B G05B Y10S G05B Y02P G03F
inventional additional inventional additional inventional additional inventional
Hsueh-Chen Wen-Yao Anwei Che-Yu Jian-Hung
Wu Hsieh Peng Chiu Chen