Staas & Halsey
Process for the formation of phosphosilicate glass coating
 A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas. According to this deposition process, the undesirable formation and adhesion of particulate by-products such as SiO.sub.2, P.sub.2 O.sub.5, and H.sub.2 SiO.sub.3 to the substrate surface can be effectively prevented, and the step coverage can be improved. 
Fujitsu Limited
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C23C H01L H01L C23C H01L
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Kanetake Masahide Kenji Atsuhiro
Takasaki Nishimura Koyama Tsukune