Improved ion implantation using a variable mass resolving system
 An ion implantation system is modified to allow variation in the size of the aperture of the mass resolving system, thereby allowing more ions of one mass or ion of more than one mass, such as isotopes, to pass through said opening. Including all isotopes of the desired dopant ions to be collected increases beam current, and consequently the throughput of the implantation process, reduces contamination, and improves the dosage control. 
Applied Materials, Inc.
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additional additional inventional inventional inventional
Timothy G. David R. Craig J. Nicholas Hiroyuki
Morgan Burgin Lowrie Bright Ito