Positive working photosensitive material
The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.
Merck Patent GmbH
G C G G C G C G
G03F C08L G03F G03F C08K G03F C08L G03F
inventional inventional inventional inventional inventional inventional inventional inventional
Chunwei Aritaka Weihong PingHung Yoshiharu SookMee
Chen Hishida Liu Lu Sakurai Lai