Miller, White, Zelano, & Branigan, P.C.
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
 A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution. 
Shin-Etsu Chemical Co., Ltd.
Y C G G C C
Y10S C08F G03F G03F C08F C08F
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Shigehiro Tsuguo Yoshihumi Osamu Tomoyoshi Satoshi Toshinobu
Nagura Yamaoka Takeda Watanabe Furihata Watanabe Ishihara