Haynes and Boone, LLP
Non-directional dithering methods
A method of data preparation in lithography processes is described. The method includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, converting the IC layout design GDS grid to a first exposure grid, applying a non-directional dither technique to the first exposure, coincident with applying dithering to the first expose grid, applying a grid shift to the first exposure grid to generate a grid-shifted exposure grid and applying a dither to the grid-shifted exposure grid, and adding the first exposure grid (after receiving dithering) to the grid-shifted exposure grid (after receiving dithering) to generate a second exposure grid.
Taiwan Semiconductor Manufacturing Copmany, Ltd.
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Wen-Chuan Shy-Jay Jaw-Jung Burn Jeng Pei-Yi
Wang Lin Shin Lin Liu