ZIP Group PLLC
Preventing strained fin relaxation
A semiconductor structure includes a stained fin, a gate upon the strain fin, and a spacer upon a sidewall of the gate and upon an end surface of the strained fin. The end surface of the strained fin is coplanar with a sidewall of the gate. The spacer limits relaxation of the strained fin.
International Business Machines Corporation
H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L
inventional additional inventional inventional inventional inventional inventional inventional
Derrick Bruce B. Kangguo Hong Juntao Sivananda K. Chun Wing Gauri Fee Li
Liu Doris Cheng He Li Kanakasabapathy Yeung Karve Lie