Haynes and Boone, LLP
Grafting agent for forming spacer layer
A method includes forming a first layer over a substrate; forming a patterned photoresist layer over the first layer; applying a solution over the patterned photoresist layer to form a conformal layer over the pattern photoresist layer, wherein the conformal layer further includes a first portion over a top surface of the patterned photoresist layer and second portion extending along sidewalls of the patterned photoresist layer; selectively removing the first portion of the conformal layer formed over the top surface of the patterned photoresist layer; and selectively removing the patterned photoresist layer thereby leaving the second portion of the conformal layer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H G G G H H G G G H G
H01L G03F G03F G03F H01L H01L G03F G03F G03F H01L G03F
inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Chun-Kuang Ching-Yu Wei-Liang Siao-Shan Chien-Chih Ya-Ling
Chen Chang Lin Wang Chen Cheng