Millen, White, Zelano, Branigan, P.C.
Lactone-containing compounds, polymers, resist compositions, and patterning method
A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Jun Osamu Takeshi Koji
Nishi Hatakeyama Watanabe Kinsho Hasegawa