Jianq Chyun IP Office
Multi-mode thin film deposition apparatus and method of depositing a thin film
A multi-mode thin film deposition apparatus including a reaction chamber, a carrying seat, a showerhead, an inert gas supplying source, a first gas inflow system and a second gas inflow system is provided. The carrying seat is disposed in the reaction chamber. The showerhead has a gas mixing room and gas holes disposed at a side of the gas mixing room. The gas mixing room is connected to the reaction chamber through the plurality of gas holes which faces the carrying seat. The first gas inflow system is connected to the reaction chamber and supplies a first process gas during a first thin film deposition process mode. The inert gas supplying source is connected to the gas mixing room for supplying an inert gas. The second gas inflow system is connected to the gas mixing room to supply a second process gas during a second thin film deposition process mode.
Industrial Technology Research Institute
C C H H C C C H H H C C
C23C C23C H01L H01J C23C C23C C23C H01J H01L H01L C23C C23C
inventional inventional additional inventional inventional inventional inventional inventional additional additional inventional inventional
Shieh-Sien Chien-Chih Kung-Liang Kuan-Yu Fu-Ching Chih-Yung Chia-Hao Shih-Chin
Wu Chen Lin Lin Tung Chen Chang Lin