Haynes and Boone, LLP
Photoresist composition and method of forming a resist pattern
A resist material utilized in photolithography patterning includes a first material, and a second material dispersed in the first material. The second material is capable of diffusing to a top surface of the resist material, and has an etch rate different from that of the first material.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Ching-Yu
Chang