Wafer supporting device of a sputtering apparatus
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a peripheral portion of the pedestal, and a cover ring positioned on the pedestal and the deposition ring. The cover ring has a gate corresponding to the recess.
United Microelectronics Corp.
H C H H
H01J C23C H01J H01J
inventional inventional inventional inventional
Been Sheng-Yih Li-Chun Yu-Jen Chi-Piao
Chen Ting Liang Huang Cheng