Volentine & Whitt, PLLC
Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition
An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.
Samsung Electronics Co., Ltd.
C C H
C08L C09G H01L
inventional inventional inventional
Nam-Soo Sei-Cheol Dong-Jun Sang-Mun Young-Sam Jae-Hyun Kyoung-Moon
Kim Lee Lee Chon Lim So Kang