Birch, Stewart, Kolasch & Birch, LLP
Polishing agent for synthetic quartz glass substrate
Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.
SHIN-ETSU CHEMICAL CO., LTD.
C C B C C B C C C B C
C03C C09K B24B C09K C03C B24B C09K C09K C09G B24B C09G
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Atsushi Masaki Yukio Daijitsu Shuhei
Watabe Takeuchi Shibano Harada Ueda