Ryan, Mason & Lewis, LLP
Self-aligned nanotips with tapered vertical sidewalls
A method of forming a semiconductor structure includes forming a substrate, forming an anchor layer, and forming one or more self-aligned nanotip pillar pairs disposed vertically between the substrate and the anchor layer. A given one of the nanotip pillar pairs comprises a bottom nanotip pillar and a top nanotip pillar, the bottom nanotip pillar comprising a base portion disposed on a top surface of the substrate and the top nanotip pillar comprising a base portion disposed in the anchor layer. The bottom nanotip pillar and the top nanotip pillar comprise sidewalls that taper to points as distance from the respective base portions increases.
International Business Machines Corporation
B B G B B
B82B B82B G01N B81B B81C
inventional inventional inventional additional inventional
Heng Peng Juntao Kangguo
Wu Xu Li Cheng