Patterson & Sheridan LLP
Apparatus for uniformly etching a dielectric layer
Apparatus for plasma etching a layer of material upon a substrate comprising an anode having a first region protruding from a second region, wherein the second region defines a plane and the first region extends from said plane. In one embodiment, at least one solenoid is disposed near the apparatus to magnetize the plasma.
Applied Materials, Inc.
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Mahmoud Bryan Hongqing Yunsang Don Jingbao Kenny L.
Dahimene Pu Shan Kim Curry Liu Doan