Tung & Associates
Method of inhibiting photoresist pattern collapse
A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist layer; rinsing the photoresist layer; and drying the photoresist layer.
Taiwan Semiconductor Manufacturing Co., Ltd.
G
G03F
inventional
Hung-Jui Kuei Shun Heng-Jen Tsung-Chih Bang-Chein Ching-Yu Hua-Tai Chin-Hsiang Ko-Bin Li-Kong
Kuo Chen Lee Chien Ho Chang Lin Lin Kao Turn