Kilpatrick Townsend & Stockton LLP
High density, low stress amorphous carbon film, and process and equipment for its deposition
A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.
Applied Materials, Inc.
C C H C H H H H H C H C H C H
C23C C23C H01L C23C H01L H01J H01L H01J H01J C23C H01J C23C H01L C23C H01J
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Bhargav Chentsau Michael W. Viachslav Adolph Miller Srinivas D. Jingjing Zhong Qiang Andrej
Citla Ying Stowell Babayan Allen Nemani Liu Hua Halabica