Birch, Stewart, Kolasch & Birch, LLP
Method for processing sputtering target and method for manufacturing sputtering target product
Disclosed is a method for processing a sputtering target comprises: processing a sputtering target by rotating a cutting tool which has a blade portion with an arc-shaped concave curved surface on a cross section along the axis, around an axis thereof, to chamfer the target at a corner portion between a sputtering surface and a side surface in the sputtering target with an arc-shaped concave curved surface of a blade portion in such a manner that the corner portion is approximated to an arc-shaped aimed R face, wherein the sputtering target is chamfered at the corner portion in such a manner that a curvature radius Ra of the concave curved surface in the blade portion is equal to or more than a curvature radius Rb of the aimed R face on the cross section along the axis and that both ends of the concave curved surface in the blade portion are positioned away from the sputtering target.
SUMITOMO CHEMICAL COMPANY, LIMITED
C C B
C23C C23C B23C
inventional inventional inventional
Masahiro
Fujita