Posz Law Group, PLC
Semiconductor device, method for manufacturing the same, and multilayer substrate having the same
A method for manufacturing a semiconductor device includes: preparing a wafer formed of a SOI substrate; forming a circuit portion in a principal surface portion; removing a support substrate of the SOI substrate; fixing an insulation member on a backside of a semiconductor layer so as to be opposite to the circuit portion; dicing the wafer and dividing the wafer into multiple chips; arranging a first conductive member on the insulation member so as to be opposite to a part of the low potential reference circuit, and arranging a second conductive member on the insulation member so as to be opposite to a part of the high potential reference circuit; and coupling the first conductive member with a first part of the low potential reference circuit, and coupling the second conductive member with a second part of the high potential reference circuit.
Denso Corporation
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Tetsuo Satoshi Shinichi Yukihiro Kouji Takashi
Fujii Shiraki Hirose Maeda Senda Nakano