Array substrate and manufacturing method thereof
The present invention provides an array substrate and a manufacturing method thereof. The manufacturing method of the array substrate according to the present invention forms a gate electrode in the same metal layer with source and drain electrodes and divides a common electrode layer that is conventionally in the form of an entire surface into two portions, of which one serves as a common electrode, while the other portion feeds an input of a gate scan signal thereby eliminating an operation of forming an interlayer insulation layer and thus reducing manufacturing cost of the operation. The array substrate of the present invention comprises a gate electrode that is formed in the same metal layer with source and drain electrodes so that no interlayer insulation layer is present between the gate electrode and the source and drain electrodes, thereby simplifying the structure and reducing the manufacturing cost of the array substrate.
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY, CO., LTD. SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
G G H H H G H G H G G H G G H
G09G G09G H01L H01L H01L G02F H01L G09G H01L G09G G09G H01L G02F G02F H01L
inventional additional inventional inventional inventional inventional inventional inventional inventional additional inventional inventional additional inventional inventional
Chao Yuxia Yuan Guoqiang Juan
He Chen Guo Tang Li