Haynes and Boone, LLP
Conformal middle layer for a lithography process
A method includes performing a first polymerization process on a monomer solution to form a partially processed resin solution, the partially processed resin solution comprising a solvent and a silicon-based resin, spin coating the partially processed resin solution on a substrate, and performing a second polymerization process on the partially processed resin solution to shrink the partially processed resin solution to form a conformal silicon-based resin layer.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Ming-Huei Ching-Yu Chen-Yu
Weng Chang Liu