Cushman, Darby & Cushman
Open tube-type impurity-diffusion apparatus for simultaneously diffusing impurities into a plurality of wafers subjected to a common environment, for producing a mass of semiconductor chips
 An open-tube type impurity diffusion apparatus for simultaneously diffusing impurities into a plurality of wafers in a same controlled environment. The apparatus includes a diffusion box including a diffusion source, a diffusion box for holding a plurality of wafers, a slider including a body having a perforated portion and non-perforated portion and heaters disposed in a furnace. Because the apparatus can be used to simultaneously diffuse impurities into a plurality of wafers once, a mass of semiconductors can be produced, production cost and time can be decreased, and deviation of the wafer characteristics from wafer to wafer within a batch can be minimized. 
SamSung Electronics Co., Ltd.
C
C23C
inventional
Jun-Young Dong-Soo
Kim Bang