Nixon Peabody LLP
Method and device for measuring temperature of substrate in vacuum processing apparatus
A method and device for determining temperature of a substrate in a vacuum processing apparatus during a process of the substrate are disclosed, the substrate to be measured is placed on a susceptor in the vacuum processing apparatus for a manufacture process, and the method includes: selecting i wavelengths from radiance emitted from the susceptor through a substrate, where i is a natural number greater than 1; obtaining at least i pieces of radiance corresponding to the selected i wavelengths; and calculating the temperature of the substrate based on the i pieces of radiance and the i wavelengths, by using a mathematical equation: E(λi)=T(d)×M(λi,T), where E(λi) is the ith radiant quantity corresponding to the ith wavelength λi, T(d) is transmittance of the substrate, which is a function of thickness d of a film grown on the substrate, and M(λi,T) is blackbody radiation equation, which is a function of the ith wavelength λi and the substrate temperature T.
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
G C H G
G01K C23C H01L G01K
inventional inventional inventional inventional
David Zhehao Steven Yousen
Chen Lee Li