High quality oxide for use in integrated circuits
An oxide for use in integrated circuits is substantially stress-free both in the bulk and at the interface between the substrate and the oxide. The interface is planar and has a low interface trap density (Nit). The oxide has a low defect density and may have a thickness of less than 1.5 nm or less.
Agere Systems Guardian Corp.
H H H H H H H H C C
H01L H01L H01L H01L H01L H01L H01L H01L C30B C30B
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Sailesh Mansinh Pradip Kumar Yuanning Sundar Srinivasan
Merchant Roy Chen Chetlur