Oblon, McClelland, Maier & Neustadt, L.L.P.
Reflection mask and pattern formation method
According to one embodiment, there is provided a reflection mask including a multilayer reflection film configured to reflect EUV light or soft X-rays. The reflection mask includes a periodic pattern arrangement region in which first patterns are periodically arranged, and a non-periodic pattern arrangement region in which second patterns are non-periodically arranged. The non-periodic pattern arrangement region and the periodic pattern arrangement region differ from one another in reflectivity for the EUV light or the soft X-rays.
Toshiba Memory Corporation
G G G G G G G
G03F G03F G03F G03F G03F G03F G03F
inventional inventional inventional inventional inventional inventional inventional
Masaru Kazuyuki Hiroyuki
Suzuki Yoshimochi Mizuno