Fleshner & Kim
Fabrication method of micro tip for field emission display device
 A method for making a micro tip of an FED device includes the steps converting impurity layer regions into porous semiconductor layer regions by performing an anodic reaction using an HF aqueous solution as an electrolytic solution, oxidizing the porous silicon layer regions, and removing the oxidation layer by etching with HF aqueous solution. The shape of the fabricated micro tip is regular and precise, since the size and height of the micro tip are easily controlled. Hence, the size and direction of an electron beam emitted from the micro tip is regular, and a reliability of the FED device is enhanced. 
LG Semicon Co., Ltd.
H
H01J
inventional
Seok Soo
Lee