Haynes Beffel & Wolfeld LLP
Layout design for fanout patterns in self-aligned double patterning process
A circuit structure comprises a plurality of first conducting lines extending in a first direction, the first conducting lines having a first pitch in a second direction orthogonal to the first direction; a plurality of linking lines extending in the second direction, the linking lines having a second pitch in the first direction, the second pitch being greater than the first pitch; and a plurality of connection structures connecting respective first conducting lines for current flow to respective linking lines, the connection structures each including a plurality of segments extending in the first direction, segments in the plurality of segments having a transition pitch in the second direction relative to adjacent segments in the plurality of segments greater than or equal to the first pitch, and less than the second pitch.
MACRONIX INTERNATIONAL CO., LTD.
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Chin-Cheng Chi-Hao Wei-Hung
Yang Huang Wang