Slater Matsil, LLP
Photoresist system and method
A system and method for photoresists is provided. In an embodiment the photoresist is exposed in a photoresist track system and developed in an offline developing system. After the photoresist is exposed, the photoresist may be idled for a time period prior to being developed in the offline developing system.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Wei-Han Ching-Yu
Lai Chang