Drop pattern generation for imprint lithography with directionally-patterned templates
Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
Canon Nanotechnologies, Inc.
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B29C B05D B29K B05D B29C B29C G03F B29K B29L
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Frank Y. Niyaz Se-Hyuk Gerard M. Yeshwanth Weijun Edward Brian
Xu Khusnatdinov Im Schmid Srinivasan Liu Fletcher