Millen, White, Zelano & Branigan, P.C.
Ester compounds, polymers, resist compositions and patterning process
 A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions. 
Shin-Etsu Chemical Co., Ltd.
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C07C C07C C07C Y02P C07C C08F C07C C07C C07C C07C C07C G03F G03F
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Koji Osamu Hideshi Takanobu Takeshi Jun Takeru Tsunehiro Mutsuo
Hasegawa Watanabe Kurihara Takeda Kinsho Hatakeyama Watanabe Nishi Nakashima