Haynes Boone, LLP
Exposure method and apparatus for immersion lithography
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Burn Jeng David Ching-Yu Chin-Hsiang
Lin Lu Chang Lin