Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Method of an apparatus for sputtering
 A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction. 
Asahi Glass Company Ltd.
H C C C C G C C C C C C C C C C C C C H C C C
H01B C03C C03C C03C C03C G02F C03C C03C C03C C03C C03C C03C C03C C03C C23C C23C C03C C23C C03C H01J C23C C03C C03C
inventional additional additional additional additional additional inventional inventional additional inventional inventional additional inventional additional inventional inventional additional inventional additional inventional inventional additional additional
Hisashi Takuji Eiichi Satoru Shujiro Junichi
Osaki Oyama Ando Takaki Watanabe Shimizu