Konrad, Raynes & Victor
Target misalignment detector
 A method and apparatus for detecting target misalignment and plasma instability in a sputtering chamber in a semiconductor fabrication system is provided. In certain embodiments, a detector is utilized to monitor the voltage of the power applied to bias the target. If the voltage fluctuates excessively, plasma instability and target misalignment is indicated. 
Applied Materials, Inc.
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John Seh Kwang
Egermeier Lee