Pearne & Gordon LLP
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
A substrate processing apparatus includes a substrate holding unit 31 configured to hold a substrate W; an outer nozzle 45 configured to discharge a processing liquid toward a surface of the substrate from a position at an outside of an outer edge of the substrate held by the substrate holding unit such that at least a central portion of the surface of the substrate is covered with a liquid film of the discharged processing liquid; and an actuator 46 (90) configured to change a height position or a discharge angle of the outer nozzle.
TOKYO ELECTRON LIMITED
H H H H B B H H H H H B
H01L H01L H01L H01L B08B B08B H01L H01L H01L H01L H01L B08B
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Hiroshi Kazuki Seiya Gentaro Yoshihiro Takahisa
Komiya Kosai Fujimoto Goshi Kai Otsuka