Lee & Sterba, P.C.
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates
A process chamber used in the manufacture of a semiconductor device for etching a material layer on a semiconductor wafer includes an electrostatic chuck for holding the semiconductor wafer, and an annular edge ring which surrounds the side of the semiconductor wafer on the electrostatic chuck to prevent the semiconductor wafer from departing from its original position. The annular edge ring has a first side which faces the side of the semiconductor wafer and contacts firmly with the side of the semiconductor wafer.
Samsung Electronics Co., Ltd.
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Ju-hyuck Jae-hyun Shin-woo Jung-hun Jang-eun Young-koo Hee-duk Sun-hoo Jin-sung Sung-bum Jeong-hyuck Jong-wook
Chung Lee Nam Cho Lee Lee Kim Park Kim Cho Park Choi