Fitzpatrick, Cella, Harper & Scinto
Antireflection film, optical element with antireflection film, and production method of the antireflection film
In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al2O3 for high-index layers and AlF3 or MgF2 for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.
Canon Kabushiki Kaisha
G
G02B
inventional
Hidehiro Yasuyuki Ryuji Kenji Minoru
Kanazawa Suzuki Biro Ando Otani