WPAT, PC
Imprint mold and method for manufacturing the same
An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns. The imprint mold manufacturing method includes: disposing a first layer on a substrate; disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area; forming a first mold pattern on the first layer by imprinting, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer; removing the first hard mask layer; disposing a second hard mask layer on the first layer, wherein the second hard mask layer includes one or more second hollow area, wherein the region of the vertical projection of the second hollow area on the first layer is adjacent to the first mold pattern; forming a second mold pattern on the first layer by imprinting, wherein the region of the second mold pattern completely overlaps the region of the vertical projection of the second hollow area on the first layer; and removing the second hard mask layer.
AU OPTRONICS CORPORATION
G
G03F
inventional
Chih-Chiang Jen-Kuei Sheng-Kai Tsai-Sheng Sheng-Ming Chia-Hsin Wei-Chi Hui-Ku Huang-Kai Ming-Jui
Chen Lu Lin Lo Huang Chung Wang Chang Shen Wang