Maschoff Brennan
Semiconductor device and method for manufacturing the same
A method of forming a semiconductor device includes forming an ILD structure over a source/drain region, forming a source/drain contact in the ILD structure and over the source/drain region, removing a portion of the source/drain contact such that a hole is formed in the ILD structure and over a remaining portion of the source/drain contact, forming a hole liner lining a sidewall of the hole, and forming a conductive structure in the hole.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Chia-Hao Wai-Yi Yu-Ming Jia-Chuan Chih-Hao
Chang Lien Lin You Wang