F. Chau & Associates, LLC
Photomasks and methods of manufacturing the same
In a method of manufacturing a photomask pattern, a light-shielding layer pattern and an anti-reflective layer pattern are formed sequentially on a transparent substrate. Oxidation and nitridation processes are performed on a sidewall of the light-shielding layer pattern to form a protection layer pattern on a lateral portion of the light-shielding layer pattern.
Samsung Electronics Co., Ltd.
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Jung-Jin Sung-Jae Hyung-Ho Dae-Hyuk Jong-Keun Chan-Uk
Kim Han Ko Kang Oh Jeon