Volentine Francos & Whitt, PLLC
Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment
A diffusion furnace of semiconductor manufacturing equipment is cleaned efficiently with a cleaning gas (ClF3) by using an auxiliary cleaner. The auxiliary cleaner is inserted into an inner tube of the wafer diffusion furnace. The auxiliary cleaner has a cylindrical body that occupies a central region of the interior of the furnace but is spaced apart from an inner wall surface of the inner tube. Accordingly, the gas is confined to a peripheral region adjacent the inner wall surface. As a result, a relatively small amount of the cleaning gas is comsumed during the cleaning process.
Samsung Electronics Co., Ltd.
C F C
C23C F27B C30B
inventional inventional inventional
Jung-Nam
Kim