Haynes and Boone, LLP
Immersion photolithography with megasonic rinse
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.
Taiwan Semiconductor Manufacturing Company, Ltd.
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H01L G03F H01L G03F
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Ching-Yu
Chang