Cantor Colburn LLP
Photoresist composition for multi-micro nozzle head coater
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
Samsung Electronics Co., Ltd.
G G
G03F G03F
inventional inventional
Hyo-Youl Dong-Ki Seung-Uk Hoon Jin-Ho You-Kyoung Sung-Chul Byung-Uk
Kim Lee Lee Kang Ju Lee Kang Kim