Antonelli, Terry, Stout & Kraus, LLP.
Method of inspecting a semiconductor device and an apparatus thereof
A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
Hitachi High-Technologies Corporation Hitachi, Ltd.
G G G G G G G G
G06T G01N G01N G01N G06T G06T G06T G01N
inventional inventional additional additional additional additional inventional inventional
Minori Hidetoshi Kenji Yoshio Kenji Takanori Akira Tetsuya Maki Yoshimasa
Noguchi Nishiyama Watanabe Morishige Oka Ninomiya Hamamatsu Watanabe Tanaka Ohshima