Sughrue, Mion, Zinn Macpeak & Seas, PLLC
Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask
 The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation. 
NEC Corporation
G
G03F
inventional
Ken Hiroshi Hiroshi Takao
Nakajima Yamashita Nozue Tamura