Lee IP Law, P.C.
Method of designing layout of photomask and method of manufacturing photomask
A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.
SAMSUNG ELECTRONICS CO., LTD.
G G
G06F G03F
additional inventional
Jong-Su Yong-Seok Sung-Hoon Suk-Jong
Kim Jung Park Bae