Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Rohm and Haas Electronics Materials LLC Dow Global Technologies LLC
Y C G C G C C G
Y10S C08F G03F C08F G03F C07D C07D G06F
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Matthias S. Young Cheol Jong Keun Yi Seung-Hyun
Ober Bae Park Liu Lee