Saile Ackerman LLC
Method to trim and smooth high index contrast waveguide structures
Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.
Agency for Science Technology and Research
B G H G G H H
B82Y G02B H01L G02B G02B H01L H01L
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Chi Fo Chang Kuo My The Vladimir Ramana Murthy
Tsang Chang Doan Bliznetsov Badam