Hauptman Ham, LLP
Method of determining overlay error and control system for dynamic control of reticle position
A method of determining overlay error. The method includes transferring a pattern from a reticle to a wafer and selecting a first set of data points to measure the positional difference between features on the reticle and features on the wafer. The method also includes determining a second set of data points characteristic of the first set of data points but containing fewer data points. A control system for using the second set of data points to dynamically adjust the position of the reticle.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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G03F G03F
inventional inventional
Heng-Hsin Yung-Yao Fei-Gwo Sophia
Liu Lee Tsai Wang