Ziegler IP Law Group, LLC
ALD method and apparatus
A method that includes performing an atomic layer deposition sequence including at least one deposition cycle, each cycle producing a monolayer of deposited material, the deposition cycle including introducing at least a first precursor species and a second precursor species to a substrate surface in a reaction chamber, wherein both of said first and second precursor species are present in gas phase in said reaction chamber simultaneously.
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Timo Juhana Wei-Min Tero
Malinen Kostamo Li Pilvi