Sughrue Mion, PLLC
Photosensitive transfer material, pattern formation method, and etching method
A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
FUJIFILM Corporation
G C C G G Y C G H G C G G G G C G G G
G03F C08F C08F G03F G03F Y02P C08F G03F H03K G03F C08F G03F G03F G03F G03F C08F G03F G03F G03F
inventional inventional inventional inventional inventional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Shinji Hideaki Yasumasa
Fujimoto Ito Kawabe