Birch, Stewart, Kolasch & Birch, LLP
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
Shin-Etsu Chemical Co., Ltd.
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Toshihiko Kazunori Katsuhiro Youichi Koji Takao
Fujii Maeda Kobayashi Ohsawa Hasegawa Yoshihara