Haynes and Boone, LLP
Negative tone developer composition for extreme ultraviolet lithography
A method for lithography patterning includes providing a substrate; forming a material layer over the substrate; exposing a portion of the material layer to a radiation; and removing an unexposed portion of the material layer in a developer, resulting in a patterned material layer. The developer has a Log P value greater than 1.82 and contains an organic solvent. In an embodiment, the organic solvent is an n-butyl acetate derivative that is represented by the formula CH3R5CHR4CHR3CHR2COOCH2R1, wherein R1, R2, R3, R4, and R5 are each selected from a group consisting of hydrogen, a methyl group, an ethyl group, and a fluoroalkyl group.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
C G C C C H H
C07C G03F C07C C07C C07C H01L H01L
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Ching-Yu Wei-Han
Chang Lai