McDonnell Boehnen Hulbert & Berghoff LLP
Manufacturing method of a high performance metal-oxide-metal
A method of manufacturing high performance metal-oxide-metal capacitor device that resolves problems with implementing high capacitance in the metal-oxide-metal region by filling with a low-k material both in the metal-oxide-metal region and the metal interconnection region, utilizing performing selective photolithography and etching of the first dielectric layer to define metal-oxide-metal (MOM for short) region, and filling the MOM region with high dielectric constant (high-k) material to realize a high performance MOM capacitor.
Shanghai Huali Microelectronics Corporation
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additional inventional inventional inventional
Chaos Feng Youcun Lei Yuwen
Zhang Ji Hu Li Chen