Patterson + Sheridan LLP
Method to improve film quality for PVD carbon with reactive gas and bias power
Embodiments of the present disclosure generally describe methods for depositing an amorphous carbon layer onto a substrate, including over previously formed layers on the substrate, using a high power impulse magnetron sputtering (HiPIMS) process, and in particular, biasing of the substrate during the deposition process and flowing a nitrogen source gas and/or a hydrogen source gas into the processing chamber in addition to an inert gas to improve the morphology and film stress of the deposited amorphous carbon layer.
APPLIED MATERIALS, INC.
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Ellie Y. Srinivas D. Zhong Qiang Bhargav Chentsau Jingjing
Yieh Nemani Hua Citla Ying Liu