Fluorinated surfactants for aqueous acid etch solutions
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
3M Innovative Properties Company
C H
C09K H01L
inventional additional
Zhongxing Zai-Ming Michael J. William M. Patricia M. Richard M. George G. I.
Zhang Qiu Parent Lamanna Savu Flynn Moore