Myers Bigel, P.A.
Precleaning apparatus and substrate processing system
A precleaning apparatus includes a chamber having an internal space in which a substrate is cleaned, a substrate support disposed in the chamber and configured to support the substrate, a plasma generation unit disposed in the chamber and configured to generate plasma gas, a heating unit configured to heat the substrate on the substrate support, a cleaning gas supply unit configured to supply gas for oxide etching to the internal space of the chamber, and a hydrogen gas supply unit configured to supply hydrogen gas to the internal space of the chamber.
Samsung Electronics Co., Ltd.
H H H H H H B B H H H H H H H H H H H H H H
H01L H01L H01L H01J H01L H01L B08B B08B H01L H01J H01L H01J H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
inventional inventional inventional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional additional inventional
Hyun Kwan Sun Jung Yi Hwan Dong Suk Pan Kwi Keum Seok Seung Hun
Yu Kim Kim Shin Park Park Lee