Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Substrate treatment system, substrate treatment method, and computer readable storage medium
In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided which transfer a substrate in zones between adjacent heat treatment plates. At the time when performing a pre-baking treatment in the heat treatment apparatus, the substrate is transferred in order to the heat treatment plates at the same temperature, whereby the heat treatment is dividedly performed on the heat treatment plates. According to the present invention, substrates are subjected to heat treatment along the same route, so that the thermal histories are made uniform among the substrates.
Tokyo Electron Limited
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inventional inventional inventional
Takahisa Tsuyoshi
Otsuka Shibata