McClure, Qualey & Rodack, LLP
Method and apparatus for lithography in semiconductor fabrication
A reticle holding tool is provided. The reticle holding tool includes a housing including a top housing member and a lateral housing member. The lateral housing member extends from the top housing member and terminates at a lower edge. The reticle holding tool further includes a reticle chuck. The reticle chuck is positioned in the housing and configured to secure a reticle. The reticle holding tool also includes a gas delivery assembly. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Li-Jui Che-Chang Po-Chung Chia-Hsin Tzung-Chi Chueh-Chi Tsung-Yen
Chen Hsu Cheng Chou Fu Kuo Lee