Haynes and Boone, LLP
Material and method for photolithography
A photosensitive material for use in semiconductor manufacture comprises a copolymer that includes a plurality of photoresist chains and a plurality of hydrophobic chains, each hydrophobic chain attached to the end of one of the photoresist chains. The copolymer in response to externally applied energy will self-assemble to a photoresist layer and a hydrophobic layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Hsiao-Wei Jian-Hong Jen-Chieh
Yeh Chen Shih