Faegre Baker Daniels LLP
Anti-reflective coating for photolithography and methods of preparation thereof
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
Honeywell International Inc.
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C09D C08G C03C C09D Y10T C03C C08K C09D C08G G02B G03F H01L
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Nancy William Mello Jason Tadashi Teresa Joseph Arlene
Iwamoto Bedwell Hebert Stuck Nakano Baldwin Kennedy Suedemeyer