McClure, Qualey & Rodack, LLP
Laser source device and extreme ultraviolet lithography device
A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Wen-Chih Cheng-Chieh Jeng-Yann Hsin-Liang Henry Yee-Shian Li-Jui Louis Chun-Lin Po-Chung
Wang Chen Tsay Chen Tong Chen Chang Cheng