Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Inductively-coupled-plasma-processing apparatus
 An inductively-coupled-plasma-processing apparatus includes a main vessel which is partitioned into an antenna chamber and a process chamber by a partition structure. The antenna chamber includes an RF antenna and the process chamber includes a susceptor on which an LCD glass substrate is placed. The partition structure has a dielectric panel constituted of four segments supported by a cross-shaped supporting bracket. The supporting bracket is suspended from the ceiling of the main vessel by a plurality of suspenders. The supporting bracket is used as a case of a showerhead for supplying a process gas into the process chamber. 
Tokyo Electron Limited
H H
H01J H01J
inventional inventional
Yoshito Tsutomu Kenji Hiromichi
Miyazaki Satoyoshi Amano Ito