Fitzpatrick, Cella, Harper & Scinto
Method of forming crystalline silicon film by CVD
A film, typically a silicon-based film, is formed on a substrate by means of a plasma CVD process using a high frequency wave in a condition where a resistance element made of a different material than that of the substrate is provided on the electric path between the substrate and the earth. The resultant film shows a high quality and an improved adhesion strength while it can be formed at a practically high rate.
Canon Kabushiki Kaisha
H C H H H Y H H C H C C H Y C H
H01L C30B H01L H01L H01L Y02E H01L H01L C23C H01L C23C C30B H01L Y02P C23C H01L
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Koichi Masafumi Makoto Takaharu
Matsuda Sano Higashikawa Kondo