Haynes and Boone, LLP
Method and apparatus for electron beam lithography
A method of manufacturing a wafer with an integrated circuit (IC) layout includes receiving a first plurality of pixels, wherein each of the pixels corresponds to a portion of the IC layout and includes data members. The method further includes transforming the first plurality of pixels into a second plurality of control signals, wherein at least some of the control signals include both a data member of one of the pixels and another data member of another one of the pixels. The method further includes transferring the control signals to a third plurality of mirrors, wherein the mirrors conditionally reflect an energy beam incident thereupon when coupled with the control signals.
Taiwan Semiconductor Manufacturing Company, Ltd.
H H H H H H H H H H H
H01J H01J H01J H01J H01J H01J H01J H01J H01J H01J H01J
inventional inventional inventional additional inventional inventional additional additional additional additional additional
Yu-Chi
Chen