Lee & Morse, P.C.
Method of forming photomask
A photomask and a method of forming the same, the photomask including a transparent substrate; a light shielding pattern on the transparent substrate, the light shielding pattern including molybdenum and silicon; and an etch stop layer covering at least a sidewall of the light shielding pattern, wherein the etch stop layer has an etch rate lower than an etch rate of the light shielding pattern with respect to an ammonia-based cleaning solution.
SAMSUNG ELECTRONICS CO., LTD.
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Inkyun JunYoul Hyungho Jong Keun Jaehyuck
Shin Choi Ko Oh Choi