MIT Technology Licensing Office
Process for making nanocone structures and using the structures to manufacture nanostructured glass
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
Massachusetts Institute of Technology
B B B
B81C B81C B81C
additional inventional inventional
George Hyungryul Chih-Hao Gareth H Kyoo Chul Jeong-gil
Barbastathis Choi Chang McKinley Park Kim