Finnegan, Henderson, Farabrow, Garrett & Dunner LLP
Film formation apparatus and film formation method
At the time of transporting a substrate into or from a space where a film formation process is performed, the space where the film formation process is performed, a space where a lower heater 16 is provided, and a space where an upper heater 19 is provided are made in an inert gas atmosphere.
NuFlare Technology, Inc. Denso Corporation
H C H C C C
H01L C30B H01L C23C C30B C30B
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Masami Hideki Ayumu Masahiko Hiroaki Koichi Hidekazu Isaho
Naito Ito Adachi Ito Fujibayashi Nishikawa Tsuchida Kamata