Polymers, photoresist compositions and methods of forming photolithographic patterns
Polymers include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety, photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Dow Global Technologies LLC Rohm and Haas Electronic Materials LLC
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Seung-Hyun Jong Keun Thomas H. Thomas Yi Young Cheol
Lee Park Peterson Cardolaccia Liu Bae