Thompson Hine LLP
Dummy assist features for pattern support
Methods of forming printed patterns and structures formed using printed patterns. A first line and a second line are lithographically printed in a first layer composed of photoimageable material with a space arranged between the first line and the second line. A dummy assist feature is also lithographically printed in the photoimageable material of the first layer. A second layer underlying the first layer is etched with the first line, the second line, and the dummy assist feature present as an etch mask. The dummy assist feature is arranged on a portion of the space adjacent to the first line and supports the photoimageable material of the first line during etching.
GLOBALFOUNDRIES Inc.
H H H H H H H
H01L H01L H01L H01L H01L H01L H01L
inventional inventional inventional inventional inventional inventional inventional
Ruilong Daniel J. Wenhui Guoxiang Lei Yulu Zhengqing John Erik
Xie Dechene Wang Ning Sun Chen Qi Verduijn