Method for manufacturing thin-film transistor substrate and thin-film transistor substrate manufactured with same
The present invention provides a method for manufacturing a thin-film transistor substrate and a thin-film transistor substrate manufactured with the method. The method includes: (1) providing a substrate (20); (2) forming a gate terminal (22) having a predetermined structure on the substrate (20); (3) forming a gate insulation layer (24) on the gate terminal (22) and the substrate (20); (4) forming a metal signal line (26) having a predetermined structure on the gate insulation layer (24); (5) forming an oxide semiconductor layer (28) having a predetermined structure on the gate insulation layer (24); (6) forming a passivation layer (32) having a predetermined structure on the gate insulation layer (24), the metal signal line (26), and the oxide semiconductor layer (28); and (7) forming a source/drain terminal (34) having a predetermined structure on the metal signal line (26), the oxide semiconductor layer (28), and the passivation layer (32) so as to form a thin-film transistor substrate.
Shenzhen China Star Optoelectronics Technology Co., Ltd
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Wenhui Chihyuan
Li Tseng