Eschweiler & Associates, LLC
Apparatus to improve internal wafer temperature profile
Some embodiments relate to methods and apparatus for providing a homogeneous wafer temperature profile in a wafer cleaning tool without introducing unwanted particles onto the wafer. In some embodiments, a disclosed wafer cleaning tool has a processing chamber configured to house a semiconductor wafer. A dispensing arm provides a high temperature cleaning solution to the semiconductor wafer. A heating cup is located within the processing chamber at a position that is around the perimeter of the semiconductor wafer. The heating cup generates heat that increases the temperature of outer edges of the semiconductor wafer by a greater amount than a temperature of a center of the semiconductor wafer, thereby homogenizing an internal temperature profile of the semiconductor wafer.
Taiwan Semiconductor Manufacturing Co., Ltd.
H H H
H05B H01L H01L
inventional inventional inventional
Yu-Yen Shao-Yen Chun-Li
Hsu Ku Chou