Law Offices of Eugene M. Lee, PLLC
Method for forming a dielectric layer
A dielectric layer is formed by depositing a first dielectric layer above a semiconductor substrate including recessed regions, etching the first dielectric layer to remove any voids and to lower the aspect ratio of the recessed regions, and depositing a second dielectric layer on the first dielectric layer in the recessed regions. The method is particularly useful when the aspect ratios are high for recessed regions formed between patterns.
Samsung Electronics Co., Ltd.
H H H H H H H
H01L H01L H01L H01L H01L H01L H01L
inventional inventional additional additional inventional additional inventional
Byung-Keun Ju-Wan Chang-Hyun Jue-Goo Sung-Jin Gwan-Hyeob
Hwang Kim Cho Lee Kim Koh