Duane Morris LLP
Rotatable and tunable heaters for semiconductor furnace
A method for forming a layer of material on a semiconductor wafer using a semiconductor furnace that includes a thermal reaction chamber having a heating system having a plurality of rotatable heaters for providing a heating zone with uniform temperature profile is provided. The method minimizes temperature variations within the thermal reaction chamber and promotes uniform thickness of the film deposited on the wafers.
Taiwan Semiconductor Manufacturing Co., Ltd.
H H F
H01L H01L F27B
inventional inventional inventional
Hsin-Hsien Zin-Chang Chun-Lin
Wu Wei Chang