Birch, Stewart, Kolasch & Birch, LLP
Photonic device and fabrication method thereof
A method for fabricating a photonic device is provided. The method includes patterning a semiconductor layer to form a waveguide structure, a semiconductor structure connected to the waveguide structure, and a dummy semiconductor structure disconnected from the waveguide structure and the semiconductor structure; epitaxially growing an epitaxial semiconductor feature over the semiconductor structure and a dummy epitaxial semiconductor feature over the dummy semiconductor structure; depositing a first capping film over the epitaxial semiconductor feature and the dummy epitaxial semiconductor feature; depositing a second capping film over the first capping film, wherein an oxide concentration of the second capping film is greater than an oxide concentration of the first capping film; and patterning the first and second capping films to form at least a dummy composite capping layer over the dummy epitaxial semiconductor feature.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Chien-Chang Chia-Ping Sui-Ying Yueh-Ying Chien-Ying Chen-Hao
Lee Lai Hsu Lee Wu Huang