Knobbe, Martens, Olson & Bear LLP
Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds
Methods of forming metal carbide films are provided. In some embodiments, a substrate is exposed to alternating pulses of a transition metal species and an aluminum hydrocarbon compound, such as TMA, DMAH, or TEA. The aluminum hydrocarbon compound is selected to achieve the desired properties of the metal carbide film, such as aluminum concentration, resistivity, adhesion and oxidation resistance. In some embodiments, the methods are used to form a metal carbide layer that determines the work function of a control gate in a flash memory.
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Dong Suvi P. Wei-Min Steven
Li Haukka Li Marcus