Uniform recess of a material in a trench independent of incoming topography
Columnar elements which extend to varying heights above a major surface of a substrate, e.g., polysilicon studs within trenches in the substrate, are recessed to a uniform depth below the major surface. The columnar elements are etched selectively with respect to a material exposed at the surface in an at least partly lateral direction so that the columnar elements are recessed to a uniform depth below the major surface at walls of the trenches.
International Business Machines Corporation
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Johnathan E. Xi Kangguo
Faltermeier Li Cheng