Studebaker & Brackett PC
Extreme UV radiation light source device
An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
USHIO DENKI KABUSHIKI KAISHA
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H01S H01S H01S H05G H05G H05G
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Yusuke Takahiro Pieter Gota
Teramoto Hiraoka Goldhoorn Niimi