Haynes and Boone, LLP
Apparatus and method for immersion lithography
Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.
Taiwan Semiconductor Manufacturing Company, Ltd.
G
G03F
inventional
Ching-Yu Tsai-Sheng Burn Jeng
Chang Gau Lin