Moser Taboada
Apparatus for controlling temperature uniformity of a substrate
Apparatus for controlling the thermal uniformity of a substrate can control the thermal uniformity of the substrate to be more uniform or to be non-uniform. In some embodiments, an apparatus for controlling the thermal uniformity of a substrate includes: a substrate support having a support surface to support a substrate thereon. A flow path is disposed within the substrate support to flow a heat transfer fluid beneath the support surface. The flow path comprises a first portion and a second portion, each portion having a substantially equivalent axial length. The first portion is spaced about 2 mm to about 10 mm from the second portion. The first portion provides a flow of heat transfer fluid in a direction opposite a flow of heat transfer fluid of the second portion.
APPLIED MATERIALS, INC.
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inventional additional
Douglas A. Shahid Xiaoping Andrew Kallol Hamid Surajit
Buchberger, Jr. Rauf Zhou Nguyen Bera Tavassoli Kumar