Slater Matsil, LLP
System and method for CMP station cleanliness
System and method for CMP station cleanliness. An embodiment comprises a chemical mechanical polishing (CMP) station comprising a housing unit covering the various components of the CMP station. The CMP station further comprising various surfaces of a slurry arm shield, a slurry spray nozzle, a pad conditioning arm shield, a platen shield, a carrier head; and the interior, vertical surfaces of the housing unit. A cleaning liquid delivery system configured to dose a cleaning liquid on the various surfaces of the CMP station at set intervals.
Taiwan Semiconductor Manufacturing Company, Ltd.
B B B
B08B B24B B24B
inventional inventional inventional
Chi-Yuan Teng-Chun Hsiang-Pi Wan-Chun Kuo-Yin
Chang Tsai Chang Pan Lin