Rework procedure for the microlens element of a CMOS image sensor
A process for reworking a non-reflowed, defective microlens element shape, of an image sensor device, without damage to an underlying spacer layer, or to underlying color filter elements, has been developed. The non-reflowed, microlens element shape, if defective and needing rework, is first subjected to a high energy exposure, converting the non-reflowed, microlens element shape to a acid type, microlens shape, then removed using a base type developer solution. Prior to formation of a reworked microlens element shape a baking cycle is employed to freeze, or render inactive, any organic residue still remaining on the surface of the spacer layer, after the base type developer removal procedure. Formation of the reworked, microlens element shape, followed by an anneal cycle, results in the desired rounded, microlens element, on the underlying spacer layer.
Taiwan Semiconductor Manufacturing Company
B H G H
B29D H01L G02B H01L
inventional inventional inventional inventional
Kuang-Peng Fu-Tien Chih-Kung Yu-Kung Bii-Junq Kuo-Liang
Lin Weng Chang Hsiao Chang Lu