Jackson IPG PLLC
Manufacturing method for a zinc oxide piezoelectric thin-film with high C-axis orientation
A manufacturing method for a Zinc Oxide (ZnO) piezoelectric thin-film with high C-axis orientation comprises the steps of providing a substrate having a base, a SiO2 layer and a Si3N4 layer; forming a bottom electrode layer on the Si3N4 layer; patterning the bottom electrode layer; sputtering a Zinc Oxide layer on the Si3N4 layer and the bottom electrode layer; forming a photoresist layer on the Si3N4 layer and the Zinc Oxide layer; patterning the photoresist layer to reveal the Zinc Oxide layer; forming a top electrode layer on the Zinc Oxide layer and the photoresist layer; removing the photoresist layer and the top electrode layer formed on the photoresist layer, and the top electrode layer formed on the Zinc Oxide layer can be remained; and patterning the Si3N4 layer to form a recess that reveals the base of the substrate.
National Sun Yat-Sen University
C H Y Y H Y
C23C H01L Y10T Y10T H01L Y10T
inventional inventional additional additional inventional additional
I-Yu Chang-Yu Yu-Hung
Huang Lin Chen