Roberts, Mlotkowski, Safran & Cole, P.C.
Structures, methods and applications for electrical pulse anneal processes
Structures and methods are provided for nanosecond electrical pulse anneal processes. The method of forming an electrostatic discharge (ESD) N+/P+ structure includes forming an N+ diffusion on a substrate and a P+ diffusion on the substrate. The P+ diffusion is in electrical contact with the N+ diffusion. The method further includes forming a device between the N+ diffusion and the P+ diffusion. A method of annealing a structure or material includes applying an electrical pulse across an electrostatic discharge (ESD) N+/P+ structure for a plurality of nanoseconds.
International Business Machines Corporation
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Tom C. Junjun Souvick Michel J. Christopher S. Robert Robert J.
Lee Li Mitra Abou-Khalil Putnam Robison Gauthier, Jr.