ScienBiziP, P.C.
Sputtering target
A sputtering target includes an indium cerium zinc oxide represented by In2CexZnO4+2x, wherein x=0.5˜2. A relative density of the sputtering target is larger than or equal to 90%. A bulk resistance of the sputtering target in a range from about 10−2 Ωcm to about 10 Ωcm. A weight percentage of crystalline In2CexZnO4+2x in the sputtering target is larger than 80%.
Tsinghua University HON HAI PRECISION INDUSTRY CO., LTD.
H H H C C H B
H01J H01J H01J C23C C23C H01J B28B
additional additional additional inventional inventional additional inventional
Shi-Lu Ming-Jie Xiao-Long Da-Ming Li Ming
Zhan Cao Li Zhuang Guo Zhao