Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device
According to one embodiment, a step difference estimation unit, an assist pattern generation unit, and a spherical aberration conversion unit are installed. The step difference estimation unit estimates step difference of a processing layer. The assist pattern generation unit adds an assist pattern having different sensitivity to spherical aberration in an exposure process to a mask pattern based on the step difference of the processing layer. The spherical aberration conversion unit converts the step difference of the processing layer into the spherical aberration.
Kabushiki Kaisha Toshiba
G G G H
G03F G03F G03F H01L
inventional inventional inventional additional
Yuji
Setta