Cantor Colburn LLP
Method of supplying etching gas and etching apparatus
A method of supplying an etching gas includes: supplying a first etching gas used in an etching process into a processing container; and supplying a second etching gas used in the etching process into the processing container, in which, when the first etching gas and the second etching gas are switched therebetween, only a small amount of a gas, which is needed as an etching gas before the switching and is not needed as an etching gas after the switching, is continuously supplied into the processing container.
Tokyo Electron Limited
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inventional inventional additional inventional
Yoshinobu Hideki Masahiro Yoshiyuki
Hayakawa Mizuno Ogasawara Kato