F. Chau & Associates, LLC
Etchant composition, and method of fabricating metal pattern and thin film transistor array panel using the same
An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.
Samsung Electronics, Co., Ltd. Dongwoo Fine-Chem Co., Ltd.
H C C H H H
H01L C23F C09K H01L H01L H01L
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Sang-Hoon Min-Ki Young-Jun Jong-Hyun Ky-Sub Byeong-Jin Hong-Sick Seung-Yong Nam-Seok Joon-Woo Bong-Kyun Sun-Young Hyun-Kyu Young-Joo Young-Chul Seung-Jae
Jang Lim Jin Choung Kim Lee Park Lee Suh Lee Kim Hong Lee Choi Park Yang