Nath, Goldberg & Meyer
Deposition device and deposition method
A deposition device according to one embodiment includes a processing container. A mounting table is installed inside the processing container, and a metal target is installed above the mounting table. Further, a head is configured to inject an oxidizing gas toward the mounting table. This head is configured to move between a first region that is defined between the metal target and a mounting region where a target object is mounted on the mounting table and a second region spaced apart from a space defined between the metal target and the mounting region.
TOKYO ELECTRON LIMITED
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Chiaki Yasunobu Toru Keisuke Hiroshi Atsushi Yusuke Kanto Yasuhiko Atsushi Tatsuo Koichi
Yasumuro Suzuki Kitada Sato Sone Shimada Suzuki Nakamura Kojima Gomi Hirasawa Takatsuki