Bacon & Thomas, PLLC
Alicyclic dissolution inhibitors and positive potoresist composition containing the same
 A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): ##STR1## wherein R.sub.1 and R.sub.2 each independently is a hydroxyl group, a C.sub.1-8 hydroxyalkyl group, or a C.sub.3-8 hydroxycycloalkyl group; R.sub.3, R.sub.4 and R.sub.5 each independently is a hydrogen, a C.sub.1-8 hydroxyalkyl group, a C.sub.1-6 carboxylic acid or a C.sub.3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The photoresist composition has high transparency to deep UV light and is capable of forming good fine patterns, roughness and high sensitivity, thus being useful as a chemically amplified type resist when exposed to deep UV light from an KrF and ArF excimer laser. 
Everlight USA. Inc.
Y C C G G
Y10S C07C C07C G03F G03F
additional inventional additional inventional inventional
Shang-Ho Wen-Chieh Shang-Wern Yen-Cheng
Lin Wang Chang Li