Polishing composition and method utilizing abrasive particles treated with an aminosilane
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
CMC Materials, Inc.
C C C B H
C09K C09K C09G B24B H01L
inventional inventional inventional inventional inventional
William Pankaj Steven Shoutian Jeffrey
Ward Singh Grumbine Li Dysard