Leydig, Voit & Mayer, Ltd.
Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus
A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.
Siltronic AG
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Y10T G01N Y10T Y10T H01L H01L H01L B08B Y10T Y10T
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Masashi Yoshihiro Teruo Etsuko
Uchibe Mori Haibara Kubo