Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Coating/developing device and method
A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.
Tokyo Electron Limited
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H01L H01L G03F H01L H01L
inventional inventional inventional inventional inventional
Shinichi Masami Yasushi Yoshio Issei Nobuaki Hikaru
Hayashi Akimoto Hayashida Kimura Ueda Matsuoka Ito