Allen, Dyer, Doppelt + Gilchrist, P.A.
Apparatus for measuring thickness and surface profile of multilayered film structure using imaging spectral optical system and measuring method
The present disclosure relates to an apparatus for measuring a thickness and a surface profile of a multilayered film structure using an imaging spectral optical system and a measuring method. More specifically, the present disclosure relates to a method and an apparatus which measure a thickness and a surface profile of a multilayered thin film structure by applying a method for obtaining an absolute reflectance value for an object to be measured having a multilayered thin film using a reflected light measuring method and extracting a phase from an interference signal with a reference mirror using a phase shift algorithm.
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
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G01B G01B G01B G06F G06F G01B G01B G01B
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Yun Woo Young-Sik Hyug-Gyo
Lee Ghim Rhee