Onello & Mello, LLP
Method of controlling an etching process for forming fine patterns of a semiconductor device
A method of controlling an etching process for forming fine patterns of a semiconductor device includes forming a lower pattern having a plurality of openings on a substrate, obtaining a width value of the lower pattern, and controlling a process recipe of an etching process for forming the lower pattern by using the width value.
Samsung Electronics Co., Ltd.
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Sungwoo Seobum Chunghowan Youngmook Chongkwang Gahyun
Kang Lee Kim Oh Chang Lim