RatnerPrestia
Process gas supply apparatus and wafer treatment system including the same
Provided are a process gas supply apparatus which supplies a process gas onto a wafer to etch an oxide layer by dividing an edge zone into a first zone and a second zone located outside the first zone and dividing the second zone into a plurality of sub-zones and a wafer treatment system including the process gas supply apparatus.
Semes Co., Ltd.
H H H H H H B
H01L H01L H01L H01L H01J H01L B01J
inventional inventional inventional inventional inventional inventional additional
Ki Yung Seung Bae
Lee Lee