Fish & Richardson P.C.
Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
Facilitating throughput in nanoimprint lithography processes by using an imprint resist including fluorinated components and a substrate treated with a pretreatment composition to promote spreading of an imprint resist on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15°.
Canon Kabushiki Kaisha
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H01L H01L H01L H01L G03F
inventional inventional inventional inventional inventional
James P. Weijun Timothy Brian Niyaz
DeYoung Liu Stachowiak Khusnatdinov