Fish & Richardson P.C.
Catadioptric projection objective with parallel, offset optical axes
A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.
Carl Zeiss SMT GmbH
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G02B G03F G02B G02B G02B G02B G02B
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Aurelian Wilhelm Rudolf Murai Hans-Juergen David Alexander
Dodoc Ulrich von Buenau Mann Shafer Epple