Lee & Morse, P.C.
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition.In the above Chemical Formula 1,A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
Cheil Industries, Inc.
G H C G G C H H C C G C C C H C G
G03F H01L C07C G03F G03F C07C H01L H01L C09D C07C G03F C07C C07C C07C H01L C07C G03F
additional inventional inventional inventional inventional inventional inventional inventional inventional additional inventional additional additional inventional inventional inventional inventional
Yoo-Jeong Chung-Heon Youn-Jin Hea-Jung Yun-Jun Hyo-Young
Choi Lee Cho Kim Kim Kwon