Schwabe, Williamson & Wyatt, P.C.
Transition metal dichalcogenide semiconductor assemblies
Embodiments of semiconductor assemblies, and related integrated circuit devices and techniques, are disclosed herein. In some embodiments, a semiconductor assembly may include a flexible substrate, a first barrier formed of a first transition metal dichalcogenide (TMD) material, a transistor channel formed of a second TMD material, and a second barrier formed of a third TMD material. The first barrier may be disposed between the transistor channel and the flexible substrate, the transistor channel may be disposed between the second barrier and the first barrier, and a bandgap of the transistor channel may be less than a bandgap of the first barrier and less than a bandgap of the second barrier. Other embodiments may be disclosed and/or claimed.
INTEL CORPORATION
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Han Wui Sansaptak Robert S. Marko Niloy Ravi Brian S.
Then Dasgupta Chau Radosavljevic Mukherjee Pillarisetty Doyle