McClure, Qualey & Rodack, LLP
Image sensor device and method for forming the same
A method for forming an image sensor device is provided. The method includes providing a substrate having a front surface and a back surface. The method includes removing a first portion of the substrate to form a first trench. The method includes forming a first isolation structure in the first trench. The first isolation structure has a top surface. The method includes removing a second portion of the first isolation structure and a third portion of the substrate to form a second trench passing through the first isolation structure and extending into the substrate. The method includes forming a second isolation structure in the second trench. The method includes forming a light-sensing region in the substrate. The method includes removing a fourth portion of the substrate to expose a first bottom portion of the second isolation structure and a backside of the light-sensing region.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Min-Hui Yi-Ming Sheng-Chan Chao-Ching Tsung-Wei Cheng-Hsien
Lin Lin Li Chang Huang Chou