McDermott Will & Emery LLP
Method for determining applicabilty of a processing device, a processing path and a processing pattern
The present disclosure provides a method for determining an applicability of a specific processing device having a specific processing pattern. The method includes the following steps: locating a similarity index between the specific processing pattern and a reference processing pattern of a reference processing device; and confirming the applicability of the specific processing device if the similarity index is no less than a threshold. Besides, a method for assessing an applicability of a new processing pattern for a specific processing device, and a method for determining an applicability of an alternative processing path for a reference processing path are also provided.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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G06T G01N G06T G06V G06V
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Hann-Ru Ching-Hsi Wen-Pin Yu-Hsiu
Chen Nan Liu Fu