Patterson & Sheridan, LLP
Method for removing oxides
A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, exposing the substrate to a gas mixture while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.
Applied Materials, Inc.
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Wei W. Joel M. Mei Xinliang See-Eng Jing-Pei (Connie) Chien-Teh Xiaoxiong (John) Yu Sal Chiukin (Steven) Son
Wang Huston Chang Lu Phan Chou Kao Yuan Chang Umotoy Lai Trinh