McGinn IP Law Group, PLLC
Photomask reticle for use in projection exposure, and manufacturing methods therefor
A photomask reticle for use in projection exposure to form a resist pattern on a workable film formed over a semiconductor substrate, includes a first area in which a light shield is formed, a second area formed around said first area, a third area formed around said second area; and a fourth area formed around said third area, the areas being formed over a substrate, a relationship between transmissivities of said areas being second area transmissivity>fourth area transmissivity>third area transmissivity>first area transmissivity.
Elpida Memory, Inc.
G G
G03F G03F
additional inventional
Masayoshi
Saito