Birch, Stewart, Kolasch & Birch, LLP
Method of processing synthetic quartz glass substrate for semiconductor
Disclosed is a method of processing a synthetic quartz glass substrate for a semiconductor, wherein a polishing part of a rotary small-sized processing tool is put in contact with a surface of the synthetic quartz glass substrate in a contact area of 1 to 500 mm2, and is scanningly moved on the substrate surface while being rotated so as to polish the substrate surface. When the method is applied to the production of a synthetic quartz glass such as one for a photomask substrate for use in photolithography which is important to the manufacture of ICs or the like, a substrate having an extremely excellent flatness and capable of being used even with the EUV lithography can be obtained comparatively easily and inexpensively.
Shin-Etsu Chemical Co., Ltd.
B B B
B24B B24B B24B
inventional inventional inventional
Daijitsu Masaki Harunobu
Harada Takeuchi Matsui