Marshall, Gerstein & Borun LLP
Photoresist coating composition and method for forming fine pattern using the same
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist pattern to effectively reduce a size of a photoresist contact hole and a space, which can be applied to all semiconductor processes.
Hynix Semiconductor Inc. Youngchang Chemical Co., Ltd.
G
G03F
inventional
Geun Su Seung Hun Seung Chan
Lee Lee Moon