Hauptman Ham, LLP
Overlay mark
A method of forming an overlay mark includes disposing a first feature of a plurality of first alignment segments extending along a first direction in a first layer, disposing a second feature of a plurality of second alignment segments extending along a second direction in a second layer over the first layer, and forming a third feature of a plurality of third alignment segments extending along the first direction and a plurality of fourth alignment segments extending along the second direction in a third layer over the second layer. In a plan view, each first alignment segment of the first alignment segments is adjacent to a corresponding third alignment segment of the third alignment segments along the first direction, and each second alignment segment of the second alignment segments is adjacent to a corresponding fourth alignment segment of the fourth alignment segments along the second direction.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Chen-Yu Ming-Feng Ching-Yu
Chen Shieh Chang