Harness, Dickey & Pierce P.L.C.
Substrate treating apparatus
Provided is a substrate treating apparatus. The substrate treating apparatus includes a treating container having an opened upper portion, a substrate heating unit heating a substrate disposed in the treating container while supporting the substrate, and a treating solution supply unit supplying a treating solution onto the substrate disposed on the substrate heating unit. The substrate heating unit includes a rotatable chuck stage on which the substrate is placed, a rotation part having a hollow shape, the rotation part being coupled to the chuck stage to rotate the chuck stage, and a heat generation part disposed in the chuck stage.
Semes Co., Ltd.
H H
H01L H01L
inventional inventional
Jung-Bong Yu-Hwan Ho-Jong
Choi Kim Hwang