Haynes and Boone, LLP
Photoresist materials and photolithography processes
A material for use in lithography processing includes a polymer that turns soluble to a base solution in response to reaction with acid and a plurality of magnetically amplified generators (MAGs) each having a magnetic element and each decomposing to form acid bonded with the magnetic element in response to radiation energy.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Burn Jeng Ching-Yu Hsien-Cheng Heng-Jen Hua-Tai Chin-Hsiang
Lin Chang Wang Lee Lin Lin