Rossi, Kimms & McDowell LLP
Evaluation method and exposure apparatus
An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
Canon Kabushiki Kaisha
G G G
G03B G03F G03F
inventional inventional inventional
Masato Shu
Hagiri Watanabe