Norton Rose Fulbright US LLP
Etching mask, manufacturing method therefor, porous membrane manufacturing method using etching mask, porous membrane, fine dust-blocking mask including porous membrane, and manufacturing method for surface enhanced Raman scattering active substrate
The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.
PUSAN NATIONAL UNIVERSITY INDUSTRY UNIVERSITY COOPERATION FOUNDATION OF PUSAN
B B B B Y B
B01D B01D B01D B01D Y02P B01D
inventional inventional inventional additional additional inventional
Sang-Gu Seung Yun Seunghyun
Yim Yang Lee