Tung & Associates
Anti-ESD photomask blank
An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from accumulating on a photomask fabricated from the photomask blank, thus preventing electrostatic discharges on the photomask.
Taiwan Semiconductor Manufacturing Co., Ltd
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inventional inventional inventional additional
Min-Chih Eric Ming-Tao Hung-Chun
Hsieh Chiang Ho Wang