Horizon IP Pte Ltd
Integrated circuit and method of fabrication thereof
A method of forming an integrated circuit structure comprising the steps of forming a first and second device region on a surface of a wafer, forming a spacer of a first width on a sidewall of a first gate stack in the first device region, forming a spacer of a second width on a sidewall of a second gate stack in the second device region, with the first width being different from the second width.
Globalfoundries Singapore Pte. Ltd.
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Mei Sheng Binbin Alex K H Hai Liang Choo Jinping
Zhou Zhou See Cong Hsia Liu