Jianq Chyun IP Office
Method for fabricating color filter layer
A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.
Au Optronics Corporation
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additional additional inventional inventional
Jui-Yin Chun-Hao
Chung Tung