Birch, Stewart, Kolasch & Birch, LLP
Semiconductor device structure and method for forming the same
A method for forming a semiconductor device structure is provided. The method for forming the semiconductor device structure includes forming a first mask layer covering the gate stack, forming a contact alongside the gate stack and the first mask layer, recessing the contact, etching the first mask layer, and forming a second mask layer covering the contact and a portion of the first mask layer.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Yu-Ming Tien-Lu Chia-Hao Lin-Yu Jia-Chuan Chih-Hao
Lin Lin Chang Huang You Wang