McClure, Qualey & Rodack, LLP
Method and system for wet chemical bath process
A method for performing a wet chemical process over a semiconductor wafer is provided. The method includes moving the semiconductor wafer into a chemical solution. The method further includes leaving the semiconductor wafer in the chemical solution for a processing time period. The method also includes turning the semiconductor wafer upside down while the wafer is in the chemical solution. Moreover, the method includes removing the semiconductor wafer from the chemical solution.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H H
H01L H01L
inventional inventional
Yung-Ho
Chen