Limbach & Limbach
Pattern recognition device
 The recognition pattern device is intended to improve the recognition ratio. In a pre-processing unit 3, an input pattern is prepared based on the image taken from a video camera 1. Then, in a comparing processing unit 4, the input pattern is compared with a basic pattern stored in a function learning storing unit, and the deformed amount of the input pattern to the basic pattern is calculated. Thus, in a deformed amount analysis unit, the deformed amount is analyzed. Finally, in a person's information learning storing unit, on the basis of the above result, the standard pattern stored therein is regenerated. 
Sony Corporation
G
G06V
inventional
Shigeru Masahiro
Arisawa Fujita