Tung & Associates
Cleaner and method for removing fluid from an object
A cleaner and method for removing excess residual cleaning fluid from an object, particularly a semiconductor wafer, before or as the wafer is removed from a cleaning chamber of a CMP cleaner, for example. Typically, a purge bar is mounted on each side of the cleaning chamber for blowing nitrogen or clean, dry air (CDA) against a corresponding surface of the wafer to remove the excess cleaning fluid from the wafer. The purge bars may be connected to a controller for a wafer transfer device which removes the wafer from the cleaning chamber, such that the purge bars are actuated as the wafer transfer device begins to remove the wafer from the chamber.
Taiwan Semiconductor Manufacturing Co., Ltd
H H B Y H H
H01L H01L B08B Y10S H01L H01L
inventional inventional inventional additional inventional inventional
Chia-Chen Yuan-Mou Yi-Chang
Chang Dai Liu