Posz Law Group, PLC
Substrate treatment method and thermal treatment apparatus
A thermal treatment apparatus performs a thermal treatment on a metal-containing film formed on a substrate. The thermal treatment apparatus includes a treatment chamber that houses the substrate; a thermal treatment plate that is provided inside the treatment chamber and mounts the substrate thereon; and a moisture supply unit that supplies moisture to the metal-containing film. At the time of the thermal treatment, moisture is supplied to the metal-containing film of the substrate on the thermal treatment plate and an atmosphere in the treatment chamber is exhausted from a central portion of the treatment chamber.
Tokyo Electron Limited
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Shinichiro Yohei Masashi Keisuke Takahiro Tomoya
Kawakami Sano Enomoto Yoshida Shiozawa Onitsuka