Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Substrate cleaning apparatus and substrate cleaning method
A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
Kabushiki Kaisha Toshiba
B B H
B08B B08B H01L
inventional inventional inventional
Hiroshi Hajime Kunihiro Hiroaki
Tomita Onoda Miyazaki Yamada