Oblon, Spivak, McClelland, Maier & Neustadt
Silicon naphthalocyanines and thin radiation sensitive coating films containing same
 Thin radiation sensitive coating films contain silicon naphthalocyanines of the formula ##STR1## where Nc is the radical of a naphthalocyanine system which may be substituted by C.sub.1 -C.sub.10 -alyl or C.sub.1 -C.sub.10 -alkoxy, and PA0 R.sup.1 and R.sup.2 are indentical or different and each is independently of the other a radical of the formula ##STR2## where R.sup.3 is branched C.sub.6 -C.sub.20 -alkyl of the formula ##STR3## where n is from 1 to 5 and R.sup.6 and R.sup.7 independently of each other are C.sub.1 -C.sub.16 -alkyl, and R.sup.4 and R.sup.5 are independently of each other C.sub.1 -C.sub.10 -alkyl or the radical OR.sup.3 where R.sup.3 is as defined above, or the radical R.sup.1 may also be C.sub.1 -C.sub.10 -alkyl. 
BASF Aktiengesellschaft
C G G Y G C C G C C Y C G
C07F G11B G03G Y10S G11B C07F C07F G11B C07F C07F Y10S C07F G03F
inventional inventional inventional additional inventional inventional inventional inventional inventional inventional additional inventional inventional
Bernhard Peter Sibylle
Albert Neumann Brosius