Anova Law Group, PLLC
ESD protection structure and ESD protection circuit
An electrostatic discharge (ESD) protection structure and an ESD protection circuit are provided. A PMOS transistor is located in a first region of a first N-type well region of a semiconductor substrate. A first doped base region located in a second region of a first N-type well region is N-type doped and connected to an external trigger-voltage adjustment circuit. An NMOS transistor is located in a third region of a first P-type well region. Second doped base regions discretely located in a fourth region of a first P-type well region are P-type doped and connected to the external trigger-voltage adjustment circuit. A first N-region is located in the fourth region, surrounding the second doped base regions, and connected to the I/O interface terminal. A second N-region is located in the fourth region, surrounding the first N-region and the second doped base regions, and connected to the ground terminal.
Semiconductor Manufacturing International (Shanghai) Corporation
H
H01L
inventional
Huijuan Paul Hongwei Jie Wenjun
Cheng Ouyang Li Chen Weng