Hauptman Ham, LLP
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
An extreme ultraviolet photomask comprises a reflective layer over a substrate, a capping layer over the reflective layer, a hard mask layer over the capping layer, and an absorber. The absorber is in the hard mask layer, the capping layer and the reflective layer.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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inventional inventional
Ru-Gun Ching-Hsu Boren Wen-Chun Hung-Chun
Liu Chang Luo Huang Wang