WPAT, P.C., Intellectual Property Attorneys
Semiconductor structure and manufacturing method thereof
A semiconductor structure includes a substrate including a first surface, a second surface opposite to the first surface, a sidewall substantially orthogonal to the first surface and the second surface; and a metallic layer surrounding and connected with the sidewall of the substrate, wherein the metallic layer includes an exposed surface substantially level with the first or second surface of the substrate. Further, a method of manufacturing the semiconductor structure is also disclosed.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
additional additional inventional additional additional additional additional additional inventional additional additional additional additional additional additional additional inventional additional inventional additional additional additional additional inventional inventional additional additional additional additional additional additional additional additional additional additional additional additional inventional additional additional additional additional additional additional inventional additional additional inventional additional additional additional inventional additional additional additional additional additional additional additional inventional
Chi-Yang Jung Tsung Kuan-Lin Chih-Hao Chien-Kuo
Yu Cheng Ho Lin Chang