Hauptman Ham, LLP
Image sensor and fabrication method therefor
A method of fabricating an image sensor includes depositing a first dielectric layer over a substrate, removing a portion of the first dielectric layer from the substrate to form a trench, depositing a conductive layer over the first dielectric layer and in the trench, forming a protective layer lining a top surface of the conductive layer and sidewalls and a bottom surface of the groove in the conductive layer, and removing a portion of the conductive layer to form a grid structure. A groove corresponding to the trench is formed in the conductive layer.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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C. H. Y. T. Wen-Shan Yi-Ming Chao-Ching Min-Hui Chun-Chih Cheng-Yi Chin-Szu Jian-Shin
Chen Tsai Chang Lin Chang Lin Lin Wu Lee Tsai