Lexyoume IP Meister, PLLC
Lateral-flow deposition apparatus and method of depositing film by using the apparatus
A deposition apparatus according to an exemplary embodiment of the present invention is a lateral-flow deposition apparatus in which in which a process gas flows between a surface where a substrate is disposed and the opposite surface, substantially in parallel with the substrate. The lateral-flow deposition apparatus includes: a substrate support that moves up/down and rotates the substrate while supporting the substrate; a reactor cover that defines a reaction chamber by contacting the substrate support; and a substrate support lifter and a substrate support rotator that move the substrate support.
ASM Genitech Korea Ltd.
C C C C
C23C C23C C23C C23C
inventional inventional inventional inventional
Ki Jong Jeong Ho Seung Woo Hyung Sang Dong Rak Yong Min Jung Soo
Kim Lee Choi Park Jung Yoo Kim