Sawyer Law Group LLP
Method and system for providing a contact on a semiconductor device
 A method for providing at least one contact on a semiconductor is disclosed. The semiconductor includes a plurality of isolation structures. The method and system include providing an etch-stop layer in direct contact with the semiconductor, providing a dielectric layer over the etch-stop layer, and etching through the dielectric layer and a portion of the etch-stop layer. A portion of the semiconductor in proximity with one of the plurality of isolation structures is not exposed during the etch. 
Advanced Micro Devices, Inc.
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Y10S H01L H01L H01L
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Angela T. Unsoon Hung-Sheng
Hui Kim Chen