Oblon, McClelland, Maier & Neustadt, L.L.P.
Resist underlayer film-forming composition, pattern-forming method and resist underlayer film
A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching.
JSR CORPORATION
G C G H H C C C G
G03F C08L G03F H01L H01L C08L C08F C08F G03F
inventional inventional inventional inventional inventional inventional additional additional inventional
Shin-ya Kazuhiko Shin-ya Takanori
Nakafuji Komura Minegishi Nakano