Cooper Legal Group, LLC
Layout re-decomposition for multiple patterning layouts
Among other things, one or more techniques and systems for layout re-decomposition of a new layout corresponding to a change order to an original layout associated with an integrated circuit are provided. The change order is applied to the original layout to create the new layout. The original layout comprises one or more original pattern portions assigned pattern colors that correspond to pattern masks. One or more new pattern portions within the new layout are assigned pattern colors such that the new layout has a relatively high color similarity with respect to the original layout. In this way, changes to the pattern masks are reduced, thus mitigating fabrication delay or costs that would otherwise result from significant changes to the pattern masks.
Taiwan Semiconductor Manufacturing Company Limited
G
G03F
inventional
Yuan-Te Chung-Hsing Huang-Yu Wen-Hao Chin-Hsiung Yen-Pin
Hou Wang Chen Chen Hsu Chen