Maschoff Brennan
Photomask having recessed region
A photomask includes a translucent substrate and at least one main feature. The translucent substrate has a recessed region recessed from a first surface of the translucent substrate. The at least one main feature is disposed on the translucent substrate, and protrudes from the first surface of the translucent substrate.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
G G H H G G G G G
G03F G03F H01L H01L G03F G03F G03F G03F G03F
inventional inventional inventional inventional inventional inventional inventional inventional inventional
Chi-Hung Yu-Yu
Liao Chen