The Mueller Law Office, P.C.
Stencil design and method for cell projection particle beam lithography
A method and system for particle beam lithography, such as electron beam (EB) lithography, is disclosed. The method and system include selecting one of a plurality of cell patterns from a stencil mask and partially exposing the cell pattern to a particle beam, such as an electron beam, so as to selectively project a portion of the cell pattern on a substrate.
D2S, Inc.
B G H B
B82Y G03F H01J B82Y
inventional inventional inventional inventional
Shohei Akira Kenji Takashi
Matsushita Fujimura Yoshida Mitsuhashi