Westerman, Hattori, Daniels & Adrian, LLP
Semiconductor device and method for manufacturing the same
A lower electrode film is formed above a semiconductor substrate first, and then a ferroelectric film is formed on the lower electrode film. After that, an upper electrode film is formed on the ferroelectric film. When forming the upper electrode, an IrOx film containing crystallized small crystals when formed is formed on the ferroelectric film first, and then an IrOx film containing columnar crystals is formed.
Fujitsu Microelectronics Limited
Wensheng
Wang