Hodgson Russ LLP
Wafer inspection using difference images
Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity. The computed reference image can minimize a norm of the difference of the test image and the computed reference image. A difference image between the test image and a computed reference image is determined. The computed reference image includes a linear combination of a second set of images.
KLA-TENCOR CORPORATION
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Pavan Hawren Xiaochun Abdurrahman Yalin Junqing Lisheng Grace H.
Kumar Fang Li Sezginer Xiong Huang Gao Chen