Anderson Kill & Olick, PC
Volatile copper aminoalkoxide complex and deposition of copper thin film using same
A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD): wherein, R1, R2, R3 and R4 are each independently C1-4 alkyl optionally carrying one or more fluorine substituents; and m is an integer in the range of 1 to 3.
Korea Research Institute of Chemical Technology
C
C23C
inventional
Sun Sook Taek Seung Chang Gyoun Yunsoo Hong Suk Taek-Mo Ki-Seok
Lee Yang Kim Kim Jang Chung An