Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Pattern formation method and pattern formation material
According to one embodiment, a pattern formation method is disclosed. The method can include a film formation process, and a exposure process. The film formation process forms a pattern formation material film on a base body. The pattern formation material film includes a pattern formation material including a first portion and a second portion. The first portion includes at least one of acrylate or methacrylate. The second portion includes an alicyclic compound and a carbonyl group. The alicyclic compound has an ester bond to the at least one of the acrylate or the methacrylate. The carbonyl group is bonded to the alicyclic compound. The exposure process causes the pattern formation material film to expose to a metal compound including a metallic element.
Toshiba Memory Corporation
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Naoko Shinobu Norikatsu Tomoaki Seekei Koji
Kihara Sugimura Sasao Sawabe Lee Asakawa