Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
Compositions comprising base-reactive component and processes for photolithography
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Rohm and Haas Electronic Materials LLC
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Deyan Doris Cong Jinrong Cheng-Bai Anthony
Wang Kang Liu Liu Xu Zampini