Tung & Associates
Micro-etching method to replicate alignment marks for semiconductor wafer photolithography
A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.
Taiwan Semiconductor Manufacturing Co. Ltd.
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Shih Che Yu-Liang Tony Henry Chung-Long Gorge Mei Sheng Chun-Hsien Li-Jui Ai-Sen Sunny Candy Cheng-Lin Gnesh
Wang Lin Lu Lo Chang Huang Zhou Lin Chen Liu Su Liang Huang Yeh