Roberts Mlotkowski Safran & Cole, P.C.
Semiconductor structures with thinned junctions and methods of manufacture
A method of forming a semiconductor structure, including forming a channel in a first portion of a semiconductor layer and forming a doped extension region in a second portion of the semiconductor layer abutting the channel on a first side and abutting an insulator material on a bottom side. The first portion of the semiconductor layer is thicker than the second portion of the semiconductor layer.
International Business Machines Corporation
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Souvick Tom C. Christopher S. Robert J. Junjun Michel J.
Mitra Lee Putnam Gauthier, Jr. Li Abou-Khalil