McDermott Will & Emery LLP
Method of cleaning extreme ultraviolet lithography collector
A method of cleaning an extreme ultraviolet lithography collector includes applying a cleaning composition to a surface of the extreme ultraviolet lithography collector having debris on the surface of the collector in an extreme ultraviolet radiation source chamber. The cleaning composition includes: a major solvent having Hansen solubility parameters of 25>δd>15, 25>δp>10, and 30>δh>6; and an acid having an acid dissociation constant, pKa, of −15<pKa<4. The debris is removed from the surface of the collector and the cleaning composition is removed from the extreme ultraviolet radiation source chamber.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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inventional inventional inventional
Chin-Hsiang An-Ren Ching-Yu
Lin Zi Chang