Janah & Associates, P.C.
Detachable electrostatic chuck for supporting a substrate in a process chamber
A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.
Applied Materials, Inc.
H Y
H01L Y10T
inventional additional
Steve Karl Cheng-Hsiung Vineet Wei W. Allen Semyon
Sansoni Brown Tsai Mehta Wang Lau Sherstinsky