Haynes and Boone, LLP
Method for manufacturing a semiconductor device with reduced floating body effect
A semiconductor device includes a substrate, a first device situated on the substrate, the first device including a source and a drain each situated extending a first depth within the substrate, and a second device situated on the substrate, the second device including a source and a drain each situated extending a second depth within the substrate, the second depth not equal to the first depth.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Sheng-Da Shui-Ming Zhong Tang Hung-Wei
Liu Cheng Xuan Chen