Shapiro and Shapiro
Projection exposure apparatus
 The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected. 
Nikon Corporation
G
G03F
inventional
Koichi Toshiyuki Kyoichi Kinya Kazuo Koichi
Matsumoto Namikawa Suwa Kato Ushida Ohno