Williams Morgan, P.C.
Methods, apparatus, and system for a semiconductor device comprising gates with short heights
At least one method, apparatus and system providing semiconductor devices with relatively short gate heights but without a relatively high risk of contact-to-gate shorts. In embodiments, the method, apparatus, and system may provide contact formation by way of self-aligned contact processes.
GLOBALFOUNDRIES INC.
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Hui Haigou Jinping Garo Jacques Jiehui John
Zang Huang Liu Derderian Shu Zhang