Methods for etching an organic anti-reflective coating
One embodiment of the present invention is a process for etching an organic anti-reflective coating on a base of a substrate, the process including steps of: (a) placing the substrate into a processing chamber; (b) introducing into the processing chamber a processing gas including one or more of carbon monoxide (CO), carbon dioxide (CO2), and sulfur oxide (SO2); and (c) forming a plasma from the processing gas to etch the organic anti-reflective coating layer.
Applied Materials Inc.
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Chun Hong Wai-Fan Hui Xikun
Yan Shih Yau Chen Wang