Harness, Dickey & Pierce, P.L.C.
Focusing apparatus and lithography system using the same
A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-beam emitter of the lithography system. In the focusing apparatus, a uniformity of the magnetic field in the vacuum chamber may be adjusted through movement of the portion of the magnetic field generator with respect to the vacuum chamber.
Samsung Electronics Co., Ltd.
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Dong-Soo Chang-Wook Myung-Gon Seung-Woon Yun-Sang
Kim Moon Song Lee Oh