Hauptman Ham, LLP
Method for forming semiconductor device structure having conductive structure with twin boundaries
A method, for forming a semiconductor device structure, includes: forming a conductive structure over a substrate, wherein the conductive structure includes twin boundaries. The forming the conductive structure includes: manipulating process conditions so as to promote formation of the twin boundaries and yet control a density of the twin boundaries to be outside a range for which a portion of a curve is an asymptote of a constant value, the curve representing values of an atomic migration ratio corresponding to values of the density of the twin boundaries.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Chien-Neng Tsung-Cheng Jian-Hong Chun-Lung Yu-Lun Chwei-Ching Yung-Huei
Liao Chan Lin Huang Chueh Chiu Lee