McDermott Will & Emery LLP
Photoresist composition and method of forming photoresist pattern
A photoresist composition includes a photoresist material including metal oxide nanoparticles and a ligand, and an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Chin-Hsiang Ching-Yu An-Ren
Lin Chang Zi