Antonelli, Terry, Stout & Kraus, LLP
Apparatus and method of inspecting foreign particle or defect on a sample
A system and method of inspecting a foreign particle or a defect on a sample are provided. Such a method comprises irradiating light to an object to be inspected; detecting reflected light or scattered light from the object to be inspected irradiated with the light; detecting a signal of the foreign particle or the defect from the detected signal; providing information related to a size of the foreign particle or the defect from the signal of the detected foreign particle or the defect; and outputting information on a display screen a distribution of the size of the foreign particle or defect with information indicating a cause of the distribution of the foreign particle or defect.
Hitachi, Ltd. Hitachi Electronics Engineering Co., Ltd.
G
G01N
inventional
Keiichi Yoshimasa Takahiro Minori Hisato Hidetoshi Yuko Kenji Tetsuya
Saiki Ohshima Jingu Noguchi Nakamura Nishiyama Inoue Watanabe Watanabe