Oliff & Berridge, PLC
Substrate processing apparatus having covered thermocouple for enhanced temperature control
To provide a substrate treatment apparatus capable of performing temperature control in a reaction tube with accuracy.A substrate treatment apparatus 100 includes: a reaction tube 42 for treating a substrate 54; a heater 46 for heating the substrate 54 in the reaction tube 42; a cooling air channel 72 for circulating cooling air 70 outside the reaction tube 42; and a thermocouple 82 for detecting temperature around the reaction tube 42. The thermocouple 82 is disposed in the cooling air channel 72 for circulating cooling air 70 in a state where the thermocouple 82 is covered with a protection tube 86, and a cover 88 for intercepting flow toward the protection tube 86 of the cooling air 70 is disposed outside the protection tube 86. 
Hitachi Kokusai Electric Inc.
H H
H01L H01L
inventional inventional
Iwao Ryota Keishin
Nakamura Sasajima Yamazaki