Method and apparatus for measuring thin film thickness using x-ray
Provided is an apparatus and method for measuring a thickness of thin film using x-ray where a thickness of a thin film of nanometer_(nm) level can be accurately measured without destructing an target sample, through determination of thickness of thin film of the target sample, by determining a calibration curve by comparing a difference of intensities of signals scattered by a special component included in a base layer of the reference sample.
Nano CMS Co., LTD
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inventional inventional inventional additional
Joo Hye Sang Bong Shi Surk Seong Uk
Kim Lee Kim Lee