Connolly Bove Lodge & Hutz LLP
Photosensitive composition and use thereof
The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive compound (B) selected from the group consisting of azide compounds and diazo compounds.H2C&boxH;CH&#8212;X&#8212;Q&#8195;&#8195;(1)[wherein X is selected from the group consisting of a direct bond, a 1,4-phenylene group, a sulfonyl group, a methylene group, and an alkylene group of 2 to 5 carbon atoms (the methylene and alkylene groups may respectively have one ether, carbonyl, carboxyl, amide or urea group); Q represents a functional group selected from the group consisting of &#8212;NH&#8212;R, &#8212;COCH2COCH3, and &#8212;SO2NH2; R represents a residue selected from the group consisting of &#8212;CHO, &#8212;H (hydrogen), an alkyl group of 1 to 6 carbon atoms (the alkyl group may have one hydroxyl, ether, amino, nitro, cyano, carbonyl, carboxyl, amide, or urea group), &#8212;NH2, &#8212;N(CH3)2, &#8212;COOH, &#8212;CONH2 and &#8212;CONHCH3].
Sanyo Chemical Industries, Ltd.
H G G H G H G
H01J G03F G03F H01J G03F H01J G03F
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Tetsuya Naohito Tetsuya
Yamada Ogiso Watanabe