Cantor Colburn LLP
Cleaning composition and method of manufacturing metal wiring using the same
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
SAMSUNG DISPLAY CO., LTD. LTCAM CO., LTD.
C H H H H H C H C H C C C H C C H
C23F H05K H05K H01L H05K H05K C11D H05K C23F H05K C11D C11D C11D H05K C11D C11D H05K
inventional inventional additional inventional additional additional inventional additional inventional additional inventional inventional inventional additional inventional inventional additional
Bong-Yeon Jung-Hwan Jin-Ho Seok-Ho Jong-Su Seong-Sik Jun-Hyuk
Kim Song Ju Lee Han Jeon Woo