Antonelli, Terry, Stout & Kraus
Method of optical lithography with super resolution and projection printing apparatus
 It is possible to improve the resolution of a formed pattern by utilizing anti-dissolution surface treatment of a photoresist layer and super resolution of an optical system, thereby to print a finer pattern having a narrower width than that of the resolving power determined by the wavelength of light used and the numerical aperture of a projection optical system, and patterning in the order of submicron is made possible easily when applied to a printing technique in a manufacturing process of semiconductor integrated circuits. 
Hitachi, Ltd. Hitachi Maxell, Ltd.
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inventional inventional inventional
Masumi Masaru
Fujita Itoo