Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Pattern management method and pattern management program
A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types of representative patterns from the extracted pattern, extracting patterns closest to the most outer periphery of the chip from the representative patterns, and representatively managing the extracted patterns which is closest to the most outer periphery of the chip.
Kabushiki Kaisha Toshiba
G Y G
G06F Y02P G06F
additional additional inventional
Soichi Kenji
Inoue Yoshida