Slater Matsil, LLP
Semiconductor devices employing a barrier layer
A semiconductor device includes providing a workpiece including an insulating material layer disposed thereon. The insulating material layer includes a trench formed therein. A barrier layer on the sidewalls of the trench is formed using a surface modification process and a surface treatment process.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chi-Ming Man-Kit Ying-Hsueh Yu-Ming
Yang Leung Chang Chien Lee