Burns, Doane, Swecker & Mathis
Method of cleaning a photo-mask
 A photo-mask to be used in a light exposure step for manufacturing semiconductor devices is cleaned by wetting front and rear surfaces of the mask with a liquid, brushing the wetted surfaces with a pair of rotary brushes, wetting the brushed surfaces with an electrolytic solution containing sufficient electrolyte to substantially eliminate electrostatic charge from the surfaces, spraying and immersing the photo-mask in an organic liquid such as an alcohol, and then drying the photo-mask. 
NEC Corporation
H H H G H B
H01L H01L H01L G03F H01L B08B
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Toshio Hiromi
Wada Yamashita