Haynes and Boone, LLP
Method of fabricating an integrated circuit with non-printable dummy features
The present disclosure provides one embodiment of an IC method that includes receiving an IC design layout, which has a plurality of main features and a plurality of space blocks. The IC method also includes calculating an optimized block dummy density ratio r0 to optimize a uniformity of pattern density (UPD), determining a target block dummy density ratio R, determining size, pitch and type of a non-printable dummy feature, generating a pattern for dummy features and adding the dummy features in the IC design layout.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Jyuh-Fuh Wen-Chuan Cheng-Hung Pei-Yi Burn Jeng Shy-Jay
Lin Wang Chen Liu Lin Lin