Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Photosensitive resin composition, photosensitive dry film and method for forming pattern
A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5).[In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; l and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.].
Micro Process Inc. Everlight Chemical Industrial Corporation Mitsubishi Rayon Co., Ltd.
H G H G G
H05K G03F H05K G03F G03F
additional inventional additional inventional inventional
Kazuo Shigeki Akifumi Chao Wen Wei Jen Hidetaka
Watanabe Watanabe Ueda Lin Lan Nakagawara