Jones Volentine, L.L.P.
Space-saving ion-implantation system installed both in and adjacent to a semiconductor manufacturing line
 An ion-implantation system for a semiconductor device manufacturing line is designed to save space within the manufacturing line by dividing the system into a first part located adjacent to the manufacturing line and a second part located in the manufacturing line. The first part includes an ion source, an ion-extractor, an ion-exchanger, an ion mass analyzer, an ion accelerator, and a charge exchange and acceleration chamber. The second part includes a charge filter, and an end station on which a wafer is mounted for ion-implantation along an ion beam path. The outlet of the charge exchange and acceleration chamber may also be included in the second part of the system, which is located in the manufacturing line, where semiconductor device manufacturing actually takes place. The first part of the system, which may include the inlet and body of the charge exchange and acceleration chamber, may be located below the manufacturing line. 
Samsung Electronics Co., Ltd.
H
H01J
inventional
Tae Hyo Jueng Gon Sang Guen
Ro Kim Oh