Lee & Morse, P.C.
Hardmask composition and method of forming patterns using the hardmask composition
A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
SAMSUNG SDI CO., LTD.
H C C C H H C C C H H H H
H01L C08G C08G C08G H01L H01L C08G C08L C08G H01L H01L H01L H01L
inventional additional additional additional inventional inventional additional inventional additional inventional inventional inventional inventional
Joon-Young Chung-Heon Yong-Woon Hyun-Ji Young-Min Yoo-Jeong Yu-Shin Yun-Jun
Moon Lee Yoon Song Kim Choi Park Kim