Haynes and Boone, LLP
Integrated circuit fabrication with a passivation agent
Examples of fabricating an integrated circuit device are disclosed herein. In an embodiment, an integrated circuit workpiece is received that includes a conductive interconnect feature. A first Inter-Level Dielectric (ILD) layer is formed on the conductive interconnect feature, and a second ILD layer is formed on the first ILD layer. A hard mask is formed on the second ILD layer. A via recess is etched extending through the first ILD layer, the second ILD layer and the hard mask to expose the conductive interconnect feature. The etching includes providing a passivation agent that reacts with a material of the hard mask to reduce etchant sensitivity.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Chien-Chih Chun-Te Ming-Chung Da-Wei Shih-Yu
Chiu Ho Liang Lin Chang