Lowe Hauptman & Ham, LLP
Overlay mark and method of measuring the same
A device having an overlay mark over a substrate and a method of adjusting multi-layer overlay alignment using the overlay mark for accuracy are disclosed. The overlay mark includes a first feature in a first layer, having a plurality of first alignment segments substantially parallel to each other extending only along an X direction; a second feature in a second layer over the first layer, having a plurality of second alignment segments substantially parallel to each other extending along a Y direction different from the X direction; and a third feature in a third layer over the second layer, having a plurality of third alignment segments substantially parallel to each other extending along the X direction and a plurality of fourth alignment segments substantially parallel to each other extending along the Y direction.
Taiwan Semiconductor Manufacturing Company, Ltd.
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G03F G03F H01L H01L H01L H01L H01L
inventional inventional additional inventional inventional inventional inventional
Ming-Feng Chen-Yu Ching-Yu
Shieh Chen Chang