Roberts Mlotkowski Safran Cole & Calderon, P.C.
Structures, methods and applications for electrical pulse anneal processes
Structures and methods are provided for nanosecond electrical pulse anneal processes. The method of forming an electrostatic discharge (ESD) N+/P+ structure includes forming an N+ diffusion on a substrate and a P+ diffusion on the substrate. The P+ diffusion is in electrical contact with the N+ diffusion. The method further includes forming a device between the N+ diffusion and the P+ diffusion. A method of annealing a structure or material includes applying an electrical pulse across an electrostatic discharge (ESD) N+/P+ structure for a plurality of nanoseconds.
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Robert R. Souvick Junjun Christopher S. Michel J. Robert J. Tom C.
Robison Mitra Li Putnam Abou-Khalil Gauthier, Jr. Lee