Heslin Rothenberg Farley & Mesiti P.C.
Method for improved fin profile
A method can include performing an etching process to define a fin trench having a first depth, the first depth being less that a target height of fin. A method can also include forming a layer to protect sidewalls defining the fin trench. A method can also include performing a second etching process to increase a depth of fin trench.
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Hong Jinping Nicholas Vincent Zhenyu
Yu Liu Licausi Hu