Janah & Associates, P.C.
Cleaning of native oxide with hydrogen-containing radicals
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.
Applied Materials, Inc.
H H H H H H H H H H C H H
H01L H01L H01L H01J H01J H01J H01L H01L H01L H01L C23C H01J H01L
additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Roderick C. James S. Bingxi Sun Mark N. Hua Chiukun Steven Wei W. Chien-Teh
Mosely Papanu Wood Kawaguchi Ai Lai Wang Kao