Brooks Kushman P.C.
Photoresist composition, pixel definition layer, display substrate and method for preparing the same, and display device
The present disclosure provides a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device. The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. BOE TECHNOLOGY GROUP CO., LTD.
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Yingbin Bin Guangyao Biao Wei Wei Jun Jingjing
Hu Zhou Li Luo Song Li Cheng Xia