Muir Patent Law, PLLC
Semiconductor device and method of manufacturing the same
The inventive concepts provide semiconductor devices and methods of manufacturing the same. One semiconductor device includes a substrate, a device isolation layer disposed on the substrate, a fin-type active pattern defined by the device isolation layer and having a top surface higher than a top surface of the device isolation layer, a first conductive line disposed on an edge portion of the fin-type active pattern and on the device isolation layer adjacent to the edge portion of the fin-type active pattern, and an insulating thin layer disposed between the fin-type active pattern and the first conductive line. The first conductive line forms a gate electrode of an anti-fuse that may be applied with a write voltage.
SAMSUNG ELECTRONICS CO., LTD.
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Jihoon Shigenobu Hyun-Min Sungman
Yoon Maeda Choi Lim