Maschoff Brennan
Method for fabricating image sensor
A method includes depositing a first reflective layer over a substrate. A first dielectric layer is deposited over the first reflective layer. A second dielectric layer is deposited over the first dielectric layer. The second dielectric layer, the first dielectric layer, and the first reflective layer are etched to form a grid isolation structure that defines a recess. The recess is filled with a color filter.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Kuo-Cheng Hsun-Ying Chun-Hao Yin-Chieh Yun-Wei
Lee Huang Chou Huang Cheng