Tung & Associates
Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region
Within a method for forming a color filter image array optoelectronic microelectronic fabrication, and the color filter image array optoelectronic microelectronic fabrication formed employing the method, there is provided a substrate having formed therein a series of photo active regions. There is also formed over the substrate at least one color filter layer having formed therein a color filter region having a concave upper surface. There is also formed upon the at least one color filter layer and planarizing the at least one color filter region having the concave upper surface, a planarizing layer. The planarizing layer provides for enhanced resolution of the color filter image array optoelectronic microelectronic fabrication.
Taiwan Semiconductor Manufacturing Co., Ltd.
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inventional inventional inventional additional
Sung-Yung Chih-Kung Chin-Chen Kuo-Liang Fu-Tien Chung-Sheng Yu-Kung
Yang Chang Kuo Lu Wong Hsiung Hsiao