Stripping compositions having high WN/W etching selectivity
A composition for cleaning integrated circuit substrates, the composition comprising: water; an oxidizer comprising an ammonium salt of an oxidizing species; a corrosion inhibitor comprising a primary alkylamine having the general formula: R′NH2, wherein R′ is an alkyl group containing up to about 150 carbon atoms and will more often be an aliphatic alkyl group containing from about 4 to about 30 carbon atoms; optionally, a water-miscible organic solvent; optionally, an organic acid; optionally, a buffer species; optionally, a fluoride ion source; and optionally, a metal chelating agent.
VERSUM MATERIALS US, LLC
G C C H H C H C G C C C C G
G03F C11D C11D H01L H01L C11D H01L C11D G03F C11D C11D C11D C11D G03F
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Gene Everad Wen Dar Yi-Chia William Jack Seiji Tianniu
Parris Liu Lee Casteel, Jr. Inaoka Chen