Lee & Morse, P.C.
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same.In the above Chemical Formula 1, A, A′, L, L′, X and n are the same as defined in the specification.
Cheil Industries, Inc.
C G G C G C G G G C G G G G C G G
C07C G03F G03F C07C G03F C07C G03F G03F G03F C07C G03F G03F G03F G03F C07C G03F G03F
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Hea-Jung Youn-Jin Yoo-Jeong Seung-Wook Yun-Jun
Kim Cho Choi Shin Kim