Haynes and Boone, LLP
Electron beam lithography system and method for improving throughput
An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
H B H G H Y G B
H01J B82Y H01J G03F H01J Y10S G03F B82Y
inventional inventional additional inventional inventional additional inventional inventional
Burn Jeng Jaw-Jung Shy-Jay Wen-Chuan
Lin Shin Lin Wang