Westman, Champlin & Koehler, P.A.
Array substrate, method of manufacturing array substrate and display device
Embodiments of the present invention disclose an array substrate, a method of manufacturing an array substrate and a display device, which belong to field of display technology. The method includes: forming a gate metal pattern and a gate insulating layer in turn on a base substrate; forming a source-drain metal pattern that is made of a preset metal on the base substrate, on which the gate insulating layer is formed, the source-drain metal pattern comprising a source electrode and a drain electrode and the preset metal including at least copper; forming a silicon nitride layer and a silicon oxide layer in turn on the base substrate, which compose a passivation layer; forming a trench in the passivation layer at a position corresponding to a gap between the source electrode and the drain electrode, wherein a width of the trench in the silicon oxide layer is smaller than a width of the trench in the silicon nitride layer and is larger than or equal to a distance of the gap between the source electrode and the drain electrode; forming an oxide trench pattern on the source-drain metal pattern, with is not in contact with the silicon nitride layer. The present invention solves problems of high-degree oxidation of copper metal layer and poorer display performance of an existing array substrate, and achieves advantages of reducing oxidation of copper metal layer and improving display performance of the array substrate for a display device.
BOE Technology Group Co., Ltd.
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Chunsheng Wei
Jiang Liu