Gauthier & Connors LLP
Method of fabricating Ge or SiGe/Si waveguide or photonic crystal structures by selective growth
A method of forming a low loss crystal quality waveguide is provided. The method includes providing a substrate and forming a dielectric layer on the substrate. A channel is formed by etching a portion of the dielectric layer. A selective growth of a Si Ge, or SiGe layer is performed in the area that defines the channel. Furthermore, the method includes thermally annealing the waveguide at a defined temperature range.
Massachusetts Institute of Technology
B G G G G G
B82Y G02B G02B G02B G02B G02B
inventional additional inventional inventional inventional inventional
Lionel C. Jurgen John Jifeng Dong
Kimerling Michel Yasaitis Liu Pan