Array substrates and the manufacturing methods thereof, and display devices
The present disclosure relates to a manufacturing method of array substrates, wherein a second masking process forming an active layer, a source electrode and a drain electrode further includes: forming a semiconductor thin-film layer, N+ doping thin-film layer, a metal thin-film layer, and a photo-resistor layer on a gate insulation layer in sequence; applying a gray-tone-mask process to expose and develop the photo-resistor layer to obtain a first photo-resistor mask; applying a first wet etching process and a first dry etching process to etch the metal thin-film layer, the semiconductor thin-film layer, and the N+ doping thin-film layer; applying a plasma ashing process to the first photo-resistor mask to obtain a second photo-resistor mask; applying a second wet etching process to etch the metal thin-film layer; and peeling off the second photo-resistor mask, applying a second dry etching process to etch the N+ doping thin-film layer. The present disclosure also relates to the array substrate formed by the above manufacturing method and the display device having the array substrate.
Shenzhen China Star Optoelectronics Technology Co., Ltd
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Xiangyang Wei
Xu Zhao