Crowell & Moring LLP
Method and apparatus for structuring components made of a material composed of silicon oxide
A method and an apparatus for forming a structure on a component made of a material composed of silicon oxide, especially of silicate glass, glass ceramic or quartz, wherein in accordance with the process at least a first surface of the component a partial removal of the material by plasma etching takes place and during the plasma etching at least at the surface to be etched a substrate temperature is established which is substantially greater than 90° C. but less than the softening temperature of the material. The apparatus is equipped for this purpose with a heater for generating the substrate temperature.
FHR Anlagenbau GmbH
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C03C C03C C03C
additional inventional inventional
Lutz Andreas Reinhard Thomas Thomas Reinhard Wolfgang
Koehler Bertz Fendler Gessner Werner Schubert Hentsch