Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology
Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model including a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.
Tokyo Electron Limited
G G G G
G03F G02B G03F G01B
inventional inventional inventional inventional
Weidong Wei Shifang
Yang Liu Li