WPAT, P.C., Intellectual Property Attorneys
Substrate processing apparatus and substrate processing method
Present disclosure provides a substrate processing apparatus, including a rotatable pedestal configured to hold a substrate, a driving mechanism connected to the rotatable pedestal, a liquid pouring nozzle over the pedestal, a temperature sensor configured to probe a temperature of the substrate processing apparatus, and a controller communicating with the temperature sensor and the driving mechanism. Present disclosure also provides a method for processing a substrate, including providing a substrate on a pedestal of a processing chamber, probing a temperature of the processing chamber, calculating a temperature difference between the temperature of the processing chamber and a predetermined temperature, and determining a rotational speed difference with respect to a predetermined rotational speed of the pedestal according to the temperature difference.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
H G B H H B
H01L G03F B05D H01L H01L B05B
inventional inventional inventional inventional inventional inventional
Wei-Hsiang Yung-Yao
Tseng Lee