Nath, Goldberg & Meyer
Fabrication methods of patterned metal film layer, thin film transistor and display substrate
A fabrication method of a patterned metal film layer, including: sequentially depositing a first metal layer and a photoresist on a substrate; forming a first patterned photoresist in the photoresist retaining area; etching the first metal layer, and removing a part of the first metal layer having a first thickness and located in an edge area of the photoresist retaining area and in the photoresist removing area, to form a second metal layer; processing the first patterned photoresist to form a second patterned photoresist; etching and removing a part, which is not in contact with the second patterned photoresist, of the second metal layer on the substrate to form a patterned metal film layer.
BOE TECHNOLOGY GROUP CO., LTD.
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Luke Wei Jun Leilei Jingang Yang Dongfang
Ding Li Liu Cheng Fang Zhang Wang