Muir Patent Law, PLLC
Method of manufacturing a semiconductor device using purified block copolymers and semiconductor devices
In a method of manufacturing a semiconductor device, a blend solution that includes a block copolymer and an adsorbent is prepared. The block copolymer is synthesized by a copolymerization between a first polymer unit and a second polymer unit having a hydrophilicity greater than that of the first polymer unit. The adsorbent on which the block copolymer is adsorbed is extracted. The block copolymer is separated from the adsorbent. The block copolymer is collected. The block copolymer may be used to form a mask on an object layer on a substrate and the mask used to etch the object layer.
SAMSUNG ELECTRONICS CO., LTD.
G H C H C H H
G03F H01L C08L H01L C08F H01L H01L
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Jung-Sik Su-Jin Jun Won Hye-Ryun Jae-Hyun
Choi Kwon Han Kim Kim