Upper plasma-exclusion-zone rings for a bevel etcher
An upper plasma-exclusion-zone ring for a bevel etcher is provided that is configured to etch a bevel edge of a substrate. The upper plasma-exclusion-zone ring includes a ring-shaped body and a radially-inner stepped surface. The ring-shaped body of the upper plasma-exclusion-zone ring defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The radially-inner stepped surface of the upper plasma-exclusion-zone ring extends inwardly into the ring-shaped body between the radially inner surface of the ring-shaped body and the lower surface of the ring-shaped body. The ring-shaped body is made of a material selected from a group consisting of aluminum oxide, aluminum nitride, silicon, silicon carbide, silicon nitride, and yttria.
LAM RESEARCH CORPORATION
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inventional inventional inventional inventional
Tong Keechan George Yunsang
Fang Kim Stojakovic Kim