Darby & Darby
Polymer with a pericyclic protective group and resist composition containing the same
The present invention relates to a polymer with at least one pericyclic protective group such as 2-methyl-2-bicyclo[2,2,1]heptanyl. The resist composition containing the polymer can be used as a chemically amplified resist and exhibits strong etch resistance. In addition, a line-and-space pattern of 0.1 &mgr;m pitch can be resolved successfully using the resist composition.
Everlight Chemical Industrial Corporation Industrial Technology Research Institute
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G03F Y10S C08F G03F C08F
additional additional inventional inventional inventional
Jui-Fa Bang-Chein Sheng-Yueh Jian-Hong Ming-Chia
Chang Ho Chang Chen Tai