Compositions and methods for preventing collapse of high aspect ratio structures during drying
Described herein is an aqueous composition for treating a substrate including patterns having line-space dimensions of 50 nm or below to prevent collapse of the patters, the composition comprising: a solvent system comprising water and a water-miscible organic solvent; a surface modifier that is a reaction product between an alkylamine and an organic acid; and an optional pH adjusting agent.
Versum Materials US, LLC
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Tianniu Rick Yi-Chia Jhih Kuei Wen Dar
Chen Lee Ge Liu