Stein McEwen, LLP
Mask for LITI and LITI method using the same
A mask for LITI and a LITI method using the same wherein the mask includes patterns arranged in a direction perpendicular to a beam scanning direction and are arranged so that increasingly longer patterns are located towards the edge of the mask than in or near the center.
Samsung Mobile Display Co., Ltd.
H G H
H01L G03F H01L
additional inventional additional
Jae-Ho Tae-Min Seong-Taek
Lee Kang Lee