Schmeiser, Olsen & Watts
Method of forming asymmetric spacers and methods of fabricating semiconductor device using asymmetric spacers
A method of fabricating asymmetrical spacers, structures fabricated using asymmetrical spacers and an apparatus for fabricating asymmetrical spacers. The method includes: forming on a substrate, a structure having a top surface and opposite first and second sidewalls and having a longitudinal axis parallel to the sidewalls; forming a conformal layer on the top surface of the substrate, the top surface of the structure and the sidewalls of the structure; tilting the substrate about a longitudinal axis relative to a flux of reactive ions, the flux of reactive ions striking the conformal layer at acute angle; and exposing the conformal layer to the flux of reactive ions until the conformal layer is removed from the top surface of the structure and the top surface of the substrate leaving a first spacer on the first sidewall and a second spacer on the second sidewall, the first spacer thinner than the second spacer.
International Business Machines Corporation
H H H H H H H H H H H H H H
H01L H01L H01L H01L H01J H01L H01L H01L H01L H01L H01L H01L H01L H01J
inventional inventional inventional inventional inventional inventional inventional inventional additional inventional additional additional inventional additional
Richard Stephen Xi Kangguo
Wise Li Cheng