Kilpatrick Townsend & Stockton
Method of mask layout
The present disclosure relates to a method of a mask layout, including: providing a frame with preset areas arranged at intervals, a positioning area between two adjacent preset areas, and a fixed area provided to offset from the positioning area and each of the preset areas, and a distance between two adjacent preset areas being a first predetermined distance L1; providing a cover mask corresponding to the positioning area, and a distance between an edge of the cover mask and the center of the positioning area being a second predetermined distance L2; and providing an evaporation mask on the fixed area according to preset conditions, a distance between two adjacent fixed areas being a third predetermined distance L3, and the third predetermined distance L3 being equal to a difference between the first predetermined distance L1 and the second predetermined distance L2. 
YUNGU (GU'AN) TECHNOLOGY CO., LTD.
C H C
C23C H01L C23C
inventional additional inventional
Shuaiyan Xiaopeng Lingtao Enxia Ya Weili
Gan Lv Ou Wang Wang Li