Composition for titanium nitride hard mask and etch residue removal
Aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing titanium nitride (TiN or TiNxOy) etch residue.
Air Products and Chemicals, Inc.
H C H H C
H01L C09K H01L H01L C09K
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Wen Dar Yi-Chia Madhukar Bhaskara Brenda Faye Seiji William Jack Tianniu
Liu Lee Rao Ross Inaoka Casteel, Jr. Chen