Cooper Legal Group LLC
Self-aligned multiple patterning layout design
Among other things, one or more techniques and systems for performing design layout are provided. An initial design layout is associated with an electrical component, such as a standard cell. The initial design layout comprises a first pattern, such as a mandrel pattern, and a second pattern, such as a passive fill pattern. An initial cut pattern is generated for the initial design layout. Responsive to identifying a design rule violation associated with the initial cut pattern, the initial design layout is modified to generate a modified initial design layout. An updated cut pattern, not resulting in the design rule violation, is generated based upon the modified initial design layout. The updated cut pattern is applied to the modified initial design layout to generate a final design layout. The final design layout can be verified as self-aligned multiple patterning (SAMP) compliant.
Taiwan Semiconductor Manufacturing Company Limited
G
G06F
inventional
Chin-Hsiung Ru-Gun Chin-Chang Lee-Chung Ken-Hsien Huang-Yu Pin-Dai Li-Chun Jhih-Jian
Hsu Liu Hsu Lu Hsieh Chen Sue Tien Wang