Haynes and Boone, LLP
EUV source generation method and related system
A method and extreme ultraviolet (EUV) light source including a laser source configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam. In some embodiments, a droplet is irradiated within an extreme ultraviolet (EUV) vessel using the first pre-pulse laser beam to form a re-shaped droplet. In some examples, the droplet includes a tin droplet. In various embodiments, a seed plasma is then formed by irradiating the re-shaped droplet using the second pre-pulse laser beam. Thereafter, and in some cases, the seed plasma is heated by irradiating the seed plasma using the main pulse laser beam to generate EUV light.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H H
H05G H05G
additional inventional
Chun-Lin Louis Bo-Tsun Shang-Chieh Wei-Ting Tzung-Chi Li-Jui Po-Chung
Chang Liu Chien Yi Fu Chen Cheng