McDermott Will & Emery LLP
Photoresist developer and method of developing photoresist
A photoresist developer includes a solvent having Hansen solubility parameters of 15<δd<25, 10<δp<25, and 6<δp<30; an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.5; and a chelate.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Joy Ching-Yu Chin-Hsiang An-Ren
Cheng Chang Lin Zi