Haynes and Boone, LLP
Methods for electron beam patterning
A method for electron-beam patterning includes forming a conductive material layer on a substrate; forming a bottom anti-reflective coating (BARC) layer on the conductive material layer; forming a resist layer on the BARC layer; and directing an electron beam (e-beam) to the sensitive resist layer for an electron beam patterning process. The BARC layer is designed such that a top electrical potential of the resist layer is substantially zero during the e-beam patterning process.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Jaw-Jung Wen-Chuan Burn Jeng Shy-Jay
Shin Wang Lin Lin