Cantor Colburn LLP
Photosensitive resin composition and method of forming pattern using the same
A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography:
SAMSUNG DISPLAY CO., LTD.
G G G G G G G G
G03F G03F G03F G03F G03F G03F G03F G03F
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Seung Bo Jin Ho Yang-Ho Jin-Sun Byung-Uk Hyang-Shik Jun Gi Sang-Hoon Tae-Hoon Hyoc-Min
Shim Ju Jung Kim Kim Kong Kim Lee Yeo Youn