Lee & Morse, P.C.
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
SAMSUNG SDI CO., LTD.
C C C G C C C C G
C09D C07C C07C G03F C07C C09D C07C C07C G03F
inventional inventional additional inventional additional inventional additional inventional inventional
Youn-Hee Hea-Jung Chung-Heon Yong-Woon Hyun-Ji Yun-Jun Sung-Hwan Joon-Young
Nam Kim Lee Yoon Song Kim Kim Moon