Miles & Stockbridge P.C.
Charged particle beam apparatus
In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.
Hitachi High-Technologies Corporation
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Yasunari Tasuku Noritsugu Hajime Hiroyuki Muneyuki
Sohda Yano Takahashi Kawano Ito Fukuda