Haynes and Boone, LLP
CMOS image sensor structure
Provided is a method of fabricating an image sensor device. The method includes providing a first substrate having a radiation-sensing region disposed therein. The method includes providing a second substrate having a hydrogen implant layer, the hydrogen implant layer dividing the second substrate into a first portion and a second portion. The method includes bonding the first portion of the second substrate to the first substrate. The method includes after the bonding, removing the second portion of the second substrate. The method includes after the removing, forming one or more microelectronic devices in the first portion of the second substrate. The method includes forming an interconnect structure over the first portion of the second substrate, the interconnect structure containing interconnect features that are electrically coupled to the microelectronic devices.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Jen-Cheng Wen-De Min-Feng Dun-Nian Chun-Chieh
Liu Wang Kao Yaung Chuang