Duane Morris LLP
Macro cell based process design kit for advanced applications
The present disclosure provides a system and method of designing an integrated circuit. A plurality of devices are selected and properties assigned to each of the plurality of devices. These plural devices having assigned properties are then combined into a macro cell whereby a density gradient pattern is generated for the macro cell. Layout dependent effect (LDE) parameters are determined for the macro cell as a function of the combination of plural devices, and electrical performance characteristics for the macro cell are simulated. A layout distribution of the plurality of devices within the macro cell can then be determined as a function of one or more of the simulated electrical performance characteristics, determined LDE parameters, and generated density gradient pattern. A design layout of an integrated circuit can be generated corresponding to the layout distribution for the macro cell.
Taiwan Semiconductor Manufacturing Co., Ltd.
G
G06F
inventional
Wen-Shen Hui Yu Chi-Wen Jui-Feng
Chou Lee Chang Kuan