Haynes and Boone, LLP
PEB embedded exposure apparatus
The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.
Taiwan Semiconductor Manufacturing Company, Ltd.
G H H
G03F H01L H01L
inventional inventional inventional
Feng-Ning Li-Jen Yao-Hwan Chin-Hsiang Yung-Cheng
Lee Ko Kao Lin Chen