Slater Matsil, LLP
Photoresist and method
A photoresist with a group which will decompose bonded to a high etching resistance moiety is provided. Alternatively, the group which will decompose can additionally be attached to a re-attachment group that will re-attach to the polymer after the group which will decompose has cleaved from the polymer. The photoresist may also comprise a non-leaving monomer with a cross-linking site and a cross-linking agent.
Taiwan Semiconductor Manufacturing Company
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Chen-Hau Wei-Han Ching-Yu
Wu Lai Chang