Tung & Associates
Laminated silicate glass layer etch stop method for fabricating microelectronic product
A method for fabricating a microelectronic fabrication employs an undoped silicate glass layer as an etch stop layer when etching a doped silicate glass layer with an anhydrous hydrofluoric acid etchant. The method is particularly useful for forming a patterned salicide blocking dielectric layer when fabricating a complementary metal oxide semiconductor device.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Huan-Chi Dian-Hau Yu-Hua Chia-Hung Yen-Ming Kang-Min
Tseng Chen Lee Lai Chen Kuo