Renaissance IP Law Group LLP
Substrate processing apparatus
The present disclosure relates to a substrate processing apparatus, and more particularly, a substrate processing apparatus that is capable of improving process uniformity on an entire surface of a substrate. The substrate processing apparatus includes a substrate boat in which a substrate is loaded, a reaction tube in which a processing process for the substrate loaded in the substrate boat is performed, a gas supply unit configured to supply a process gas into the reaction tube through an injection nozzle disposed on one side of the reaction tube, a heating unit including a plurality of vertical heating parts, which are disposed along a circumference of the reaction tube outside the reaction tube and configured to divide the circumference to the reaction tube into a plurality of portions so as to independently heat each of the divided portions of the reaction tube, and a control unit configured to control the heating unit.
EUGENE TECHNOLOGY CO., LTD.
C C C C C C H
C30B C23C C23C C30B C23C C23C H01L
inventional inventional inventional inventional inventional inventional inventional
Kyu Jin Jae Woo Yong Ki Bong Ju Jun Cha Young Sung Tae Ja Dae Kyung Seok
Choi Kim Kim Jung Kim Yoo Je Ku Park