Lee & Morse, P.C.
Exposure apparatus and method of fabricating semiconductor device using the same
An exposure apparatus is provided. The exposure apparatus includes a stage for a wafer, a first light source generating a first light beam, an exposure optical system to receive the first light beam and to direct the first light beam as an exposure light beam onto an exposure area in a field of the wafer, and a heating unit including a second light source, which generates second light, and heating the exposure area by applying the second light to the exposure area.
SAMSUNG ELECTRONICS CO., LTD.
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Chan Sam
Chang