Birch, Stewart, Kolasch & Birch, LLP
Resist composition and patterning process
Resist compositions comprising as the base resin a polymer having alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in fine feature size regions. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.
Shin-Etsu Chemical Co., Ltd.
G G
G03F G03F
inventional inventional
Takanobu Daisuke Osamu
Takeda Manba Watanabe