Birch, Stewart, Kolasch & Birch, LLP
Method for maintenance of liquid discharge head and liquid discharge apparatus
The method includes: a wiping processing step of performing wiping processing on a liquid discharge surface by eccentrically rotating a wiping surface of a wiping member, including raised irregularities on the wiping surface thereof, in a plane parallel to the liquid discharge surface of a liquid discharge head and moving the wiping member in a first direction in a state in which the wiping surface is in contact with the liquid discharge surface; and a post-wiping processing purge processing step of performing post-wiping processing purge processing after the wiping processing step. An eccentric parameter as a value obtained by dividing an eccentric distance of the wiping surface by an interval between the nozzles in a second direction orthogonal to the first direction, is set to 10 or more in the wiping processing step.
FUJIFILM Corporation
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B41J B41J B41J B41J B41J B41J
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Takuma
Nakano