Blakely Sokoloff Taylor & Zafman LLP
Process for manufacturing micromechanical and microoptomechanical structures with single crystal silicon exposure step
The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a structure on a single crystal silicon layer separated by an insulator layer from a substrate layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilicon forming mechanical or optical elements of the structure; exposing a selected area of the single crystal silicon layer; and releasing the formed structure.
Xerox Corporation Microscan Systems, Inc.
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B81C B81B B81C B81C B81C G02B
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Jingkuang Joel A. Chuang-Chia Andrew J. Alex T. Peter M.
Chen Kubby Lin Zosel Tran Gulvin