Dickstein Shapiro Morin & Oshinsky LLP
Electron beam drawing apparatus
To provide an electron beam drawing apparatus capable of drawing the grating pitch of a fine diffraction grating pattern highly precisely.An objective lens is constructed of lenses of two stages, and an object deflector is disposed over the objective lens of the lower stage. The power of the objective lens of the lower stage is changed to change the deflection width of the object deflector, and the power of the objective lens of the upper stage is changed to form the image on a sample plane thereby to make a focusing.
Hitachi-High Technologies Corporation
B H H B H
B82Y H01J H01J B82Y H01J
inventional additional inventional inventional additional
Hiroyuki
Ito