Beusse Wolter Sanks & Maier, P.A.
Method for monitoring alignment between contact holes and polycrystalline silicon gate
The present invention is related to the semiconductor manufacturing field, especially a method for monitoring alignment between contact holes and polycrystalline silicon gate by setting a plurality of equidistant contact holes with same sharp on poly-silicon and residual active area, and then obtain the process alignment profile of the quantized values in the plane in order to have a better control of process quality, thereby have a better control of the quality of the process.
SHANGAI HUALI MICROELECTRONICS CORPORATION
H H G
H01L H01L G01B
inventional inventional inventional
Hunglin Mingsheng Yin Zhounan Qiliang
Chen Guo Long Wang Ni