Moser Taboada
NH3 containing plasma nitridation of a layer of a three dimensional structure on a substrate
Methods and apparatus for forming nitrogen-containing layers are provided herein. In some embodiments, a method includes placing a substrate having a first layer disposed thereon on a substrate support of a process chamber; heating the substrate to a first temperature; and exposing the first layer to an RF plasma formed from a process gas comprising ammonia (NH3) to transform the first layer into a nitrogen-containing layer, wherein the plasma has an ion energy of less than about 8 eV.
APPLIED MATERIALS, INC.
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Theresa Kramer Wei
Guarini Liu