Haynes and Boone, LLP
Photoresist with gradient composition for improved uniformity
The present disclosure provides an embodiment of a method for lithography patterning. The method includes coating a photoresist layer over a substrate, wherein the photoresist layer includes a first polymer, and a first photo-acid generator (PAG), and a chemical additive mixed in a solvent; performing an exposing process to the photoresist layer; and performing a developing process to the photoresist layer to form a patterned photoresist layer. The chemical additive has a non-uniform distribution in the photoresist layer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Chin-Hsiang Chang Ching-Yu
Lin Lilin Chang