Rankin, Hill & Clark LLP
Vapor phase growth apparatus and vapor phase growth method
A vapor phase growth apparatus according to an embodiment includes a reaction chamber; a substrate holder having a holding wall capable holding an outer periphery of the substrate; a process gas supply part provided above the reaction chamber, the process gas supply part having a first region supplying a first process gas and a second region around the first region supplying a second process gas having a carbon/silicon atomic ratio higher than that of the first process gas, an inner peripheral diameter of the second region being 75% or more and 130% or less of a diameter of the holding wall; a sidewall provided between the process gas supply part and the substrate holder, an inner peripheral diameter of the sidewall being 110% or more and 200% or less of an outer peripheral diameter of the second region; a first heater; a second heater; and a rotation driver.
NuFlare Technology, Inc.
H C C C H H H C C C C H C C C C H C C C C
H01L C23C C23C C30B H01L H01L H01L C30B C23C C23C C30B H01L C30B C23C C23C C23C H01L C23C C30B C30B C23C
inventional inventional inventional inventional inventional inventional inventional inventional inventional additional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Yoshiaki Hideki Akio
Daigo Ito Ishiguro