Morgan, Lewis & Bockius LLP
Method of fabricating array substrate using dry etching process of silicon nitride
A method of fabricating an array substrate includes: forming a line or an electrode on a substrate on which a pixel region is defined, forming a protection layer on the line or the electrode, the protection layer formed of silicon nitride (SiNX), forming photoresist patterns on the protection layer, and loading the substrate having the photoresist pattern into a chamber of a dry etching apparatus, and performing a first dry etching process on the protection layer exposed between the photoresist patterns using a first gas mixture containing nitrogen trifluoride (NF3) gas to form a contact hole exposing the line or the electrode.
LG Display Co., Ltd.
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Jun-Hee Jin-Hyun Young-Sup
Lee Ahn Jung