Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Cleaning substrate and cleaning method
A cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus. The cleaning substrate that cleans the interior of a chamber in the substrate processing apparatus has a removal mechanism that removes foreign matter in the chamber.
Tokyo Electron Limited
C H B C B
C11D H01J B08B C23C B08B
inventional inventional inventional inventional inventional
Yohei Masashi Masanobu Hiroshi
Yamazawa Saito Honda Nagaike