Oliff & Berridge, PLC
Pattern forming method and apparatus, and device fabrication method and device
The invention saves resources and energy. A cleaning/fluid-feeding head integrates a cleaning head portion and a fluid-feeding head portion. The cleaning head portion includes an organic substance cleaning unit, an inorganic substance cleaning unit, a rinsing unit and a drying unit. The organic substance cleaning unit, inorganic substance cleaning unit and rinsing unit selectively clean pattern forming regions on a substrate by feeding thereto a first cleaning fluid, second cleaning fluid and pure water, respectively. The drying unit dries the rinsed pattern forming regions by blowing hot air thereonto. The fluid-feeding head portion selectively feeds a liquid pattern forming material to the cleaned pattern forming regions.
Seiko Epson Corporation
H H B H H Y H
H05K H05K B41J H01L H01L Y10S H05K
inventional additional inventional inventional inventional additional additional
Yoshiaki
Mori