Lyon & Lyon
Stereolithography method and apparatus
 An improved stereolithographic apparatus and method is described. In one embodiment, the improvement includes immersing at least a portion of a part in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin. Several examples of solvents are provided, including ethanol, and Freon TMS. In a second embodiment, the improvement includes building the part on a layer of liquid resin supported by a volume of a dense, immiscible, and UV transparent intermediate liquid, and integratably immersing at least a portion of the built part in the intermediate liquid, and then either subjecting the immersed portion to ultrasonic agitation to substantially remove excess resin, or subjecting the immersed portion to UV light. Several examples of intermediate liquids are provided, including perfluorinated fluids, such as Fluorinert FC-40, and water-based salt solutions, such as solutions of magnesium sulfate or sodium chloride in water. 
3D Systems, Inc.
B B B B
B33Y B29C B29C B29C
inventional inventional additional additional
Hop D. Thomas A. Richard N. Mark A.
Nguyen Almouist Leyden Lewis