Lee & Morse, P.C.
Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer,
Cheil Industries, Inc.
H H H H H H
H01L H01L H01L H01L H01L H01L
additional inventional inventional inventional inventional inventional
Yun-Jun Yoo-Jeong Youn-Jin Bum-Jin Chung-Heon Joon-Young
Kim Choi Cho Lee Lee Moon