Patterson + Sheridan, LLP
Apparatus and method of forming plasma using a pulsed waveform
Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
Applied Materials, Inc.
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Evgeny Olivier James Rajinder Leonid Viacheslav
Kamenetskiy Luere Rogers Dhindsa Dorf Plotnikov