Haynes and Boone, LLP
Anti-reflective coating by ion implantation for lithography patterning
A method for lithography patterning includes depositing a target layer over a substrate, the target layer including an inorganic material; implanting ions into the target layer, resulting in an ion-implanted target layer; forming a photoresist layer directly over the ion-implanted target layer; and exposing the photoresist layer to radiation in a photolithography process. The ion-implanted target layer reduces reflection of the radiation back to the photoresist layer during the photolithography process.
Taiwan Semiconductor Manufacturing Co., Ltd.
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I-Chun Tsung-Han Chih-Wei Hsi-Yen Hsin-mei Cheng-Han
Hsieh Wu Chang Chang Lin Yang