Millen, Whtie, Zelano & Branigan, P.C.
Chemical amplification resist compositions
A chemical amplification positive resist composition comprising a polymeric mixture of a polyhydroxystyrene derivative having a Mw of 1000-500,000 and a copolymer of hydroxystyrene and (meth)acrylate having a Mw of 1000-500,000, as a base resin, has improved dry etching resistance, high sensitivity, high resolution, and process adaptability, and is suppressed in the slimming of pattern films after development with aqueous base.
Shin-Etsu Chemical Co., Ltd.
Y Y G G Y Y
Y10S Y10S G03F G03F Y10S Y10S
additional additional inventional inventional additional additional
Akihiro Osamu Wataru Takanobu Kazuhiro Katsuya
Seki Watanabe Kusaki Takeda Hirahara Takemura