Haynes and Boone, LLP
Structure and method for reflective-type mask
A reflective mask includes a substrate; a reflective multilayer formed on the substrate; an absorber layer formed on the reflective multilayer, wherein the absorber layer is patterned to have openings according to an integrated circuit layout; and a protection layer formed over the reflective multilayer within the openings.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Wei-Hung Jeng-Horng Chia-Chen Chi-Lun Chih-Tsung Anthony Shinn-Sheng
Liu Chen Chen Lu Shih Yen Yu