Kinney & Lange, P.A.
Mask, masking exposure method, mask system and pattern control device
Embodiments of the present disclosure relate to a mask, a masking exposure method, a mask system and a pattern control device. The mask according to embodiments of the present disclosure includes a pattern control layer and a light conversion layer. The pattern control layer includes a plurality of light-transmission units and a control circuit connected to each of the light-transmission units. The control circuit is configured to control conversion of each of the light-transmission units between in a light-transmission state and in a light-tight state, such that different mask patterns are formed. The light conversion layer is provided on a light-outgoing directional side or a light-incoming directional side of the pattern control layer and is configured to convert incoming light into parallel light so as to emit the parallel light.
BOE TECHNOLOGY GROUP CO., LTD.
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inventional inventional inventional inventional inventional
Wei Zhongyuan
Wang Sun