Method of forming fin-shaped structure
A fin-shaped structure includes a substrate having a first fin-shaped structure located in a first area and a second fin-shaped structure located in a second area, wherein the second fin-shaped structure includes a ladder-shaped cross-sectional profile part. The present invention also provides two methods of forming this fin-shaped structure. In one case, a substrate having a first fin-shaped structure and a second fin-shaped structure is provided. A treatment process is performed to modify an external surface of the top of the second fin-shaped structure, thereby forming a modified part. A removing process is performed to remove the modified part through a high removing selectivity to the first fin-shaped structure and the second fin-shaped structure, and the modified part, thereby the second fin-shaped structure having a ladder-shaped cross-sectional profile part is formed.
UNITED MICROELECTRONICS CORP.
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inventional inventional inventional inventional inventional additional
Ssu-I Yi-Wei Chia-Jong Yen-Liang Yu-Hsiang Wen-Jiun Chung-Fu Man-Ling
Fu Chen Liu Wu Hung Shen Chang Lu