Birch, Stewart, Kolasch & Birch, LLP
Compounds for photoresist and resin composition for photoresist
The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R1 represents a hydrogen atom or a methyl group; R2, R3, and R4 are the same or different from each other, each representing a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group, a hydroxylmethyl group, a carboxyl group, a functional group which forms a hydroxyl group, a hydroxymethyl group or a carboxyl group by elimination with an acid; at least one of the substituents R2 to R4 is the functional group defined above; X represents an ester bond or an amide bond; and each of m and n is 0 or 1.The above photoresist resin composition is highly resistant to an etching solution, solubilizable by irradiation with light, and capable of giving minute patterns.
Daicel Chemical Industries, Ltd.
G G G
G03F G03F G03F
inventional inventional inventional
Tatsuya Yoshinori
Nakano Funaki