Lowe Hauptman & Ham, LLP
Method of generating a bias-adjusted layout design of a conductive feature and method of generating a simulation model of a predefined fabrication process
A method of generating a bias-adjusted layout design of a conductive feature includes receiving a layout design of the conductive feature. If a geometry configuration of the layout design is within a first set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a first layout bias rule. If the geometry configuration of the layout design is within a second set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a second layout bias rule.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chia-Ming Hsiao-Shu Yi-Kan Ke-Ying
Ho Chao Cheng Su