Semiconductor device and method for fabricating the same
A semiconductor device includes: a dummy gate on a substrate; a first control gate on one side of the dummy gate and a second control gate on another side of the dummy gate; a well in the substrate, wherein the well comprises a first conductive type; a first source/drain region between the dummy gate and the first control gate, wherein the first source/drain region comprises a second conductive type; a second source/drain region between the dummy gate and the second control gate, wherein the second source/drain region comprises the second conductive type; and a doped region directly under the dummy gate, wherein the doped region comprises the first conductive type.
UNITED MICROELECTRONICS CORP.
H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L
inventional inventional inventional inventional inventional inventional inventional inventional
Ting-Hsiang Sheng-Yuan Chih-Kai Yi-Chung Kuo-Hsing
Huang Hsueh Kang Sheng Lee