Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.
International Business Machines Corporation
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Wenjie Pushkara Rao
Li Varanasi