Haynesa and Boone, LLP
Systems and methods providing electron beam writing to a medium
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.
Taiwan Semiconductor Manufacturing Company, Ltd.
B H H H B G H H
B82Y H01J H01J H01J B82Y G03F H01J H01J
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Jaw-Jung Burn Jeng Wen-Chuan Shy-Jay
Shin Lin Wang Lin