WPAT, P.C., Intellectual Property Attorneys
Chemical vapor deposition apparatus and blocker plate
The present disclosure provides a blocker plate, including a plate body having a plurality of through holes, a first zone from a center to a first radius of the plate body, having a first conductance, a second zone from the first radius to a second radius of the plate body, having a second conductance, a third zone from the second radius to a third radius of the plate body, having a third conductance, wherein the first radius is smaller than the second radius, the second radius is smaller than the third radius, and the second conductance is greater than the first conductance. A chemical vapor deposition (CVD) apparatus including the blocker plate is also disclosed.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
C C
C23C C23C
inventional inventional
Chih-Yu Chao-Chun Huan-Chieh Keith Kuang-Kuo
Wu Wang Chen Koai