Beyer Law Group LLP
Time varying segmented pressure control
An apparatus for processing a substrate is provided. A processing chamber is provided. A substrate support for supporting the substrate is within the processing chamber. A gas inlet provides gas into the processing chamber. An exhaust pressure system exhausts gas around a periphery of the substrate, wherein the periphery around the substrate is divided into at least three parts, wherein the exhaust pressure system controls exhaust pressure to control a velocity of the gas over the substrate, wherein the exhaust pressure system provides at independent exhaust pressure control for each part of the periphery for the at least three parts.
Lam Research Corporation
H C H C H H H H C C
H01L C23C H01J C30B H01J H01J H01J H01J C30B C23C
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Kyle James
Spaulding Rogers