Polishing composition and method utilizing abrasive particles treated with an aminosilane
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Cabot Microelectronics Corporation
C B C H C
C09K B24B C09G H01L C09K
inventional inventional inventional inventional inventional
Jeffrey Shoutian William Pankaj Steven
Dysard Li Ward Singh Grumbine