Patterson & Sheridan, LLP
Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamber
Embodiments of the present disclosure generally relate to methods for detecting unstable plasma in a substrate processing chamber. In one embodiment, the method includes providing a forward power from a power source to the substrate processing chamber through a detection device, splitting the forward power passing through the detection device at a predetermined ratio to obtain a first value of the power to the substrate processing chamber, measuring a reflected power from the substrate processing chamber to obtain a second value of the power from the substrate processing chamber, and directing the power source to turn off the forward power if the second value of the power is different than the first value of the power.
APPLIED MATERIALS, INC.
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H05H H01J H05H H01J
inventional inventional additional inventional
Shilpa Mohamad A. Jian J.
Sudhakaran Ayoub Chen