Novick, Kim & Lee, PLLC
Photoresist pattern shrinking composition and pattern shrinking method
Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.
YOUNG CHANG CHEMICAL CO., LTD.
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C11D C11D C11D H01L C11D C11D G03F C11D C11D C11D C11D C11D C11D H01L C11D
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Seung Hyun Su Jin Seung Hun Gi Hong
Lee Lee Lee Kim