Haynes and Boone, LLP
Method and apparatus for gating photomask contamination
A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to pass through and having one or more features formed of a first material, and an inspection structure formed on a second area of the substrate different from the first area, the inspection structure being formed of a second material different from the first material.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chih-Wing
Chang