Predictive modeling of contact and via modules for advanced on-chip interconnect technology
A computer program product estimates performance of a back end of line (BEOL) structure of a semiconductor integrated circuit (IC). Code executes on a computer to dynamically predict an electrical resistance of the BEOL structure based on input data specific to multiple layers of the BEOL structure. The BEOL structure can be a contact or a via. The layers of the contact/via include an inner filling material and an outer liner. The code accounts for a width scatter effect of the inner filling material, as well as a slope profile of the contact/via.
QUALCOMM Incorporated
G
G06F
inventional
Seung H. Yu Matthew Wei David Xia
Kang Cao Nowak Zhao Bang Li