Fitzpatrick, Cella, Harper & Scinto
Oxide etching method
There is provided an etching method of an amorphous oxide layer containing In and at least one of Ga and Zn, which includes etching the amorphous oxide layer using an etchant containing any one of acetic acid, citric acid, hydrochloric acid, and perchloric acid.
Canon Kabushiki Kaisha
Y C C H H H Y H
Y02E C09K C09K H01L H01L H01L Y02P H01L
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Chienliu
Chang