Servilla Whitney LLC
CD dependent gap fill and conformal films
A method of depositing a silicon-containing material is disclosed. Some embodiments of the disclosure provide films which fill narrow CD features without a seam or void. Some embodiments of the disclosure provide films which form conformally on features with wider CD. Embodiments of the disclosure also provide superior quality films with low roughness, low defects and advantageously low deposition rates.
APPLIED MATERIALS, INC.
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Wenhui Jingmei Praket P. Jung Chan Jinrui
Li Liang Jha Lee Guo