Birch, Stewart, Kolasch & Birch, LLP
Positive photosensitive resin composition
A positive photosensitive resin composition comprising (A) a polyamic acid, (B) a 1,4-dihydropyridine derivative represented by the general formula (II):wherein R2 is a monovalent organic group; each of R3, R4, R5, and R6 is independently hydrogen or a monovalent organic group; and Ar—NO2 is an aromatic hydrocarbon group having a nitro group at ortho-position, and (C) an amine compound.
Nitto Denko Corporation
Y G
Y10S G03F
additional inventional
Makoto Kenji Hirofumi
Saito Ohnishi Fujii