Sughrue Mion, PLLC
Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device, organic electroluminescent display device, and touch panel
There are provided a photosensitive resin composition having excellent chemical resistance, light resistance, and solubility in a solvent, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. The photosensitive resin composition contains a polybenzoxazole precursor, a photoacid generator which generates an acid having a pKa of 3 or less or a quinone diazide compound, and a solvent, in which the polybenzoxazole precursor contains a total of 70 mol % or more of a repeating unit represented by the following Formula (1) and a repeating unit represented by the following Formula (2) with respect to the total repeating units, and a ratio between the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) is 9:1 to 3:7 in a molar ratio. Y1 represents a cyclic aliphatic group having 3 to 15 carbon atoms, and Y2 represents a linear or branched aliphatic group having 4 to 20 carbon atoms.
FUJIFILM Corporation
G H H G G G H H G C H G G G G G H G G G H G
G03F H05B H01L G03F G03F G03F H05B H01L G02F C08G H01L G06F G06F G03F G03F G03F H05B G06F G03F G03F H01L G03F
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Satoru Kenta Takuma Mikio
Yamada Yoshida Amemiya Nakagawa