Maschoff Brennan
Method of fabricating reticle
A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Tzong-Sheng Kuei-Shun Wei-Ti Meng-Wei Chi-Hung Hsueh-Yi Fei-Gwo Yung-Cheng Shih-Chi Jui-Ping
Chang Chen Hsu Chen Liao Chung Tsai Chen Fu Chuang