Maschoff Brennan
Warpage control of semiconductor die
A method is provided. A bottom passivation layer is formed on a dielectric layer over a semiconductor substrate. Then, a first opening is formed in the bottom passivation layer to expose a portion of the dielectric layer. Next, a metal pad is formed in the first opening. Afterwards, a first oxide-based passivation layer is formed over the metal pad. Then, a second oxide-based passivation layer is formed over the first oxide-based passivation layer. The second oxide-based passivation layer has a hardness less than a hardness of the first oxide-based passivation layer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
inventional inventional additional additional inventional inventional inventional additional additional additional inventional additional additional inventional additional inventional additional inventional additional inventional additional additional inventional inventional additional additional additional additional additional additional additional additional
Po-Chang Ching-Chuan Yun-Ting Yi-An
Kuo Chang Wang Lin