Lee & Morse, P.C.
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
A monomer for a hardmask composition is represented by the following Chemical Formula 1,
CHEIL INDUSTRIES, INC.
G C C G C G C C C C G G G G C C C C C G C C
G03F C07C C07D G03F C07C G03F C07D C07C C07C C07D G03F G03F G03F G03F C07C C07C C07C C07C C07C G03F C07C C07D
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Go-Un Young-Min Yun-Jun Hea-Jung Yoo-Jeong Yo-Choul Chung-Heon Seung-Wook Joon-Young Yong-Woon Yu-Shin Seung-Hee Hyun-Ji You-Jung
Kim Kim Kim Kim Choi Park Lee Shin Moon Yoon Park Hong Song Park