Haynes and Boone, LLP
System and method for generating direct-write pattern
A direct-write system is provided which includes a stage for holding a substrate, a processing module for processing pattern data and generating instructions associated with the pattern data, and an exposure module that includes beams that are focused onto the substrate and a beam controller that controls the beams in accordance with the instructions. The processing module includes vertex pair processors each having bit inverters. Each vertex pair processor is operable to process a respective vertex pair of an input scan line to generate an output scan line. Each bit inverter is operable to invert a respective input bit of the input scan line to generate a respective output bit of the output scan line if a bit position is located between the respective vertex pair, otherwise the respective input bit is copied to the respective output bit. The instructions correspond to the output bits for each beam.
Taiwan Semiconductor Manufacturing Company, Ltd.
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G03F G03F
inventional inventional
Chien-Hsun Faruk Shih-Ming Shy-Jay Wei-Long Tuane Ying Jeng-Horng
Chen Krecinic Chang Lin Wang Fang Chen