Birch, Stewart, Kolasch & Birch, LLP
Method for performing a photolithography process
A method for performing a photolithography process is provided. The method includes forming a layer over a substrate, and exposing a portion of the layer to form an exposed region. The method also includes performing a baking process on the layer, so that voids are formed in the exposed region of the layer. The method further includes filling the void with a post treatment coating material, and the post treatment coating material is over the exposed region of the layer.
Taiwan Semicondutor Manufacturing Co., Ltd.
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Tsung-Han Ching-Yu Chin-Hsiang Joy
Ko Chang Lin Cheng