Haynes and Boone, LLP
Photoresist and patterning process
A method and material layer for forming a pattern are disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photoacid generator and a photobase generator; and exposing one or more portions of the second material layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Ching-Yu Burn Jeng Chien-Wei
Chang Lin Wang