Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device includes: forming sequentially an n− type epitaxial layer and an n+ type area on a first surface of an n+ type silicon carbide substrate; forming a plurality of first trenches and a plurality of second trenches by etching the n− type epitaxial layer and the n+ type area using a first mask pattern as a mask after forming the first mask pattern on the n+ type area; forming a groove by etching the first mask pattern using a first photosensitive film pattern as a mask after forming the first photosensitive film pattern in the plurality of first trenches; forming a p type area by injecting p ions in the plurality of second trenches using the first mask pattern with the groove as the mask after removing the first photosensitive film pattern; forming a gate insulating layer in the plurality of first trenches after removing the first mask pattern with the groove; forming a gate electrode on the gate insulating layer; forming a passivation layer on the gate electrode; forming a source electrode in the plurality of second trenches; and forming a drain electrode on a second surface which is an opposite side to the first surface of the n+ type silicon carbide substrate.
Hyundai Motor Company
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JongSeok Dae Hwan Junghee Youngkyun
Lee Chun Park Jung