Janah & Associates
Electrostatic chuck having composite dielectric layer and method of manufacture
An electrostatic chuck has an electrode capable of being electrically charged to electrostatically hold a substrate. A composite layer covers the electrode. The composite layer comprises (1) a first dielectric material covering a central portion of the electrode, and (2) a second dielectric material covering a peripheral portion of the electrode, the second dielectric material having a different composition than the composition of the first dielectric material. The chuck is useful in a plasma process chamber to process substrates, such as semiconductor wafers.
Applied Materials Inc.
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H01L H01J H01J C23C H01L Y10T
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Kenneth S. Dan Ananda H. Dennis S. Brian Edwin C. Alexander M. Semyon L. Shamouil Arik Robert J. Kadthala R. Timothy Arnold
Collins Maydan Kumar Grimard Lue Weldon Veytser Kats Shamouilian Donde Steger Narendrnath Dyer Kholodenko