Lee & Morse P.C.
Method of removing an oxide and method of filling a trench using the same
A method of removing a portion of an oxide layer includes forming first byproducts by reacting a reaction gas with the oxide layer, the reaction gas including fluorine and nitrogen, reacting the reaction gas with the first byproducts to form second byproducts, and removing the second byproducts.
Samsung Electronics Co., Ltd.
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Taek-Jung Kyu-Tae Seung-Heon Ju-Wan
Kim Na Lee Kim