Martine Penilla & Gencarella, LLP
Methods and systems for a stress-free cleaning a surface of a substrate
A method of cleaning a substrate includes receiving a substrate and applying a stress-free cleaning process to the top surface of the substrate. The substrate includes a top surface that is substantially free of device dependent planarity nonuniformities and device independent planarity nonuniformities. The top surface also includes a first material and a device structure formed in the first material, the device structure being formed from a second material. The device structure has a device surface exposed. The device surface has a first surface roughness. A system for stress-free cleaning a substrate is also described.
LAM Research Corporation
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Yunsang Shrikant P. Simon Andrew D.
Kim Lohokare McClatchie Bailey, III