Detection method and system for pellicle membrane of photomask
A detection method for a pellicle membrane of a photomask includes applying a predetermined pressure under which the pellicle membrane undergoes a deformation, measuring and calculating at least one of deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane by detection, and obtaining a detection result about the pellicle membrane according to at least one of the deformation level, Young's modulus, and flexural rigidity level of the pellicle membrane, so as to evaluate the quality of the pellicle membrane.
SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
G G
G03F G03F
inventional inventional
Yu-Ching
Lee