Brooks Kushman P.C.
Cleaning liquid and cleaning method for electronic material
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.
Siltronic AG
C C H C Y C
C11D C11D H01L C11D Y10S C11D
inventional inventional inventional inventional additional inventional
Takashi Yoshihiro Teruo
Mouri Mori Haibara