Fitzpatrick, Cella, Harper & Scinto
Photovoltaic device
 A method for making a photovoltaic device comprises the steps of depositing a hydrogen-containing n-type silicon semiconductive layer, a hydrogen-containing i-type silicon semiconductive layer, and a hydrogen-containing p-type silicon semiconductive layer, in that order, on a supporting substrate. In the step of depositing the hydrogen-containing n-type silicon semiconductive layer, an n-type amorphous semiconductive layer and then an n-type microcrystalline semiconductive layer are deposited to constitute the hydrogen-containing n-type silicon semiconductive layer. The hydrogen-containing n-type silicon semiconductive layer is annealed. Further, an i-type microcrystalline silicon semiconductive layer as the hydrogen-containing i-type silicon semiconductive layer is formed on the annealed hydrogen-containing n-type silicon semiconductive layer. 
Canon Kabushiki Kaisha
Y H Y Y H
Y02P H01L Y02E Y02E H01L
additional inventional additional additional inventional
Masafumi
Sano