Lee & Morse, P.C.
Methods of forming a pattern and methods of manufacturing a semiconductor device using the same
A method of forming a pattern includes forming an underlayer on an etching target layer by a chemical vapor deposition (CVD) process, the underlayer including a silicon compound combined with a photoacid generator (PAG), forming a photoresist layer on the underlayer, irradiating extreme ultraviolet (EUV) light on the photoresist layer to form a photoresist pattern, and etching the etching target layer using the photoresist pattern as an etching mask.
SAMSUNG ELECTRONICS CO., LTD.
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Ji-Man Hyo-Jin Jun-Hyun Jung-Sik Jin-Seo Youn-Joung
Park Yun Cho Choi Lee Cho