Millen, White, Zelano & Branigan, P.C.
Polymers and chemically amplified positive resist compositions
 The invention provides a novel polymer comprising a recurring unit of formula. (1) wherein R.sup.1 is hydrogen or methyl, R.sup.2 is hydrogen or acid labile group, at least one R.sup.2 being hydrogen and at least one R.sup.2 being an acid labile group, and n=2 or 3. The polymer's Mw is 3,000-300,000. Blending the polymer as a base resin with an organic solvent and a photoacid generator yields a chemically amplified positive resist composition. ##STR1## 
Shin-Etsu Chemical Co., Ltd.
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inventional additional inventional inventional
Osamu Toshinobu Junji Yoshihumi
Watanabe Ishihara Tsuchiya Takeda