Birch, Stewart, Kolasch & Birch, LLP
Substrate structure and method for fabricating semiconductor structure including the substrate structure
A substrate structure and a method for fabricating a semiconductor structure including the substrate structure are provided. The substrate structure includes a substrate, a bow adjustment layer, and a silicon layer. The bow adjustment layer is on the top surface of the substrate. The silicon layer is on the bow adjustment layer. The substrate structure has a total bow value, and the total vow value is from −20 μm to −40 μm.
Vanguard International Semiconductor Corporation
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Yung-Fong Cheng-Tao
Lin Chou