Stout, Uxa, Buyan & Mullins, LLP
Method of reducing film stress on overlay mark
An integrated circuit capable of operating despite a profile shift is disclosed. Overlay marks on the integrated circuit are surrounded by a trench that tends to relieve the effect of a profile shift caused by stress applied to the integrated circuit. The position of the overlay marks tends, therefore, not to be affected by the stress.
Macronix International Co., Ltd.
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Ching-Yu Yu-Lin
Chang Yen