Oblon, McClelland, Maier & Neustadt, L.L.P.
Composition for forming resist underlayer film and pattern-forming method
A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R1 represents a hydroxy group, or the like. n is an integer of 0 to 5. X represents a divalent hydrocarbon group having 1 to 20 carbon atoms or an alkanediyloxy group having 1 to 20 carbon atoms. m is an integer of 1 to 7. A sum of m and n is no greater than 7. R2 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms. R3 represents an alicyclic group having 4 to 20 carbon atoms or an aryl group having 6 to 30 carbon atoms. A part or all of hydrogen atoms included in the alicyclic group or the aryl group represented by R3 are unsubstituted or substituted.
JSR CORPORATION
G C C C G C G G C B
G03F C08G C08G C08G G03F C08G G03F G03F C08G B44C
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Shin-ya Takanori Shin-ya
Minegishi Nakano Nakafuji