Birch, Stewart, Kolasch & Birch, LLP
Fabrication method for microstructures with high aspect ratios
A fabrication method for microstructures with high aspect ratios uses a CMOS process to form a desired microstructure on a silicon substrate. The steps of forming a contact plug and a via plug of the process are used to form etching channels in insulation layers, polysilicon layers and metal layers, penetrating to the silicon substrate. An etching process is then performed through the etching channel to form the desired microstructure with high aspect ratio.
Industrial Technology Research Institute
B G
B81C G01P
inventional inventional
Nai-Hao Kai-Hsiang Yuh-Wen Jing-Hung Po-Hao
Kuo Yen Lee Chiou Tsai