Duane Morris LLP
Method of applying photoresist to a semiconductor substrate
A method comprises dispensing a first solvent on a semiconductor substrate; dispensing a first layer of a high-viscosity polymer on the first solvent; dispensing a second solvent on the first layer of high-viscosity polymer; and spinning the semiconductor substrate after dispensing the second solvent, so as to spread the high-viscosity polymer to a periphery of the semiconductor substrate.
Taiwan Semiconductor Manufacturing Co., Ltd.
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inventional inventional inventional
Chih-Hsien Ching-Hsin Hu-Wei Hong-Hsing Yen-Chen Chia-Hung
Hsu Chang Lin Chou Lin Chu