Charter IP LLC
Apparatus and method of cleaning substrate
A substrate cleaning apparatus includes a supporting plate supporting a substrate and a shielding unit that is disposed above the substrate to protect the substrate. A portion of the shielding unit, which is adjacent to a focal point where light for generating shock waves is focused, is switched. Therefore, the substrate cleaning apparatus prevents the concentration of plumes and residence beams, which are generated together with the shock waves, on a specific region of the shielding unit and further prevents the recontamination of the substrate by the damage of the shielding unit.
Semes Co., Ltd.
H H
H01J H01L
additional inventional
Jae-Jeong Jung-Gun Se-Won
Jeong Cho Lee