Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
 A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films. 
Allied Corporation
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G03F G03F
inventional inventional
Ronald W. Robert E. James M. Robert A. Richard F.
Wake Rinehart Lewis Owens Sweeney