Martine & Penilla, LLP
Method for fabricating poly-spacers
 A method for fabricating poly-spacers used in a semiconductor substrate, comprising: forming an undoped first polysilicon layer on the semiconductor substrate; performing a first ion implantation with a first angle to implant impurities into the first polysilicon layer; performing a second ion implantation with a second angle to implant the impurities into the first polysilicon layer; forming a second polysilicon layer on the first polysilicon layer; and etching the first polysilicon layer and the second polysilicon layer to form spacers. 
TSMC-ACER Semiconductor Manufacturing Corp.
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inventional inventional inventional
Yau-feng Shiou-han Po-lung Jia-ren Yen-hung Calvin
Lo Liaw Chuang Chen Lai Wu