Birch, Stewart, Kolasch & Birch, LLP
Semiconductor devices and methods for forming the same
A semiconductor device includes a semiconductor substrate having a first conductivity type, and a first well region disposed in the semiconductor substrate, wherein the first well region has a second conductivity type opposite to the first conductivity type. The semiconductor device also includes a buried layer disposed in the semiconductor substrate and under the first well region, wherein the buried layer has the first conductivity type and is in contact with the first well region. The semiconductor device further includes a source electrode, a drain electrode and a gate structure disposed on the semiconductor substrate, wherein the gate structure is located between the source electrode and the drain electrode.
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
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Yu-Hao Shin-Cheng Cheng-Tsung Wen-Hsin Manoj
Ho Lin Wu Lin Kumar