Birch, Stewart, Kolasch & Birch, LLP
Method for forming micro-electro-mechanical system (MEMS) device structure
A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The method includes forming a recess in a first substrate and forming a dielectric layer on the first substrate and in the recess. The method also includes forming a second substrate on the dielectric layer and etching a portion of the second substrate to form a MEMS structure. The MEMS structure has a plurality of openings. The method further includes etching a portion of the dielectric layer to form a cavity below the openings.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chih-Hang I-Shi Jen-Hao
Chang Wang Liu