Haynes and Boone, LLP
Apparatus and method for immersion lithography
A lithography apparatus includes an imaging lens module, a substrate table positioned underlying the imaging lens module and configured to hold a substrate, and a cleaning module adapted to clean the lithography apparatus. The cleaning module comprises one inlet and one outlet for providing a cleaning fluid to and from a portion of the lithography apparatus to be cleaned, and an ultrasonic unit configured to provide ultrasonic energy to the cleaning fluid.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G G B
G03F G03F G03F B08B
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Ching-Yu Burn Jeng
Chang Lin