McDermott Will & Emery LLP
Apparatus and method for generating extreme ultraviolet radiation
An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Li-Jui Chun-Lin Han-Lung Ting-Ya
Chen Chang Chang Cheng