Birch, Stewart, Kolasch & Birch, LLP
Resist composition and patterning process
A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.
Shin-Etsu Chemical Co., Ltd.
G G G G G
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Hideto Yoshinori Toshihiko Hiromasa
Kato Hirano Fujii Yamaguchi