Method and apparatus that determines charged particle beam shape codes
A lithography method and apparatus which represent a substrate surface as gray level values and determine a shape data that specifies a shape and position of a flash field. The apparatus receives a pattern in a vector format, represents the substrate surface as a grid of pixels, and then represents each pixel as a gray level value specifying a proportion of the pixel that includes the pattern. Subsequently the apparatus constructs a matrix of a quadrant of four pixels and surrounding pixels, modifies the matrix so that three intermediate shapes corresponding to an exposed region of the quadrant may be provided, determines an intermediate shape data of the quadrant; and performs a reverse modification on the shape to determine the shape data that specifies a flash field.
Applied Materials, Inc.
H B Y B H H
H01J B82Y Y10S B82Y H01J H01J
inventional inventional additional inventional inventional inventional
Ulrich Stephen A. Volker Weidong
Hofmann Rishton Boegli Wang