Moser Taboada
Tuning work function of p-metal work function films through vapor deposition
The present disclosure relates to a method for forming a p-metal work function nitride film having a desired p-work function on a substrate, including: adjusting one or more of a temperature of a substrate, a duration of one or more temporally separated vapor phase pulses, a ratio of a tungsten precursor to a titanium precursor, or a pressure of a reaction to tune a work function of a p-metal work function nitride film to a desired p-work function, and contacting the substrate with temporally separated vapor phase pulses of the tungsten precursor, the titanium precursor, and a reactive gas to form a p-metal work function nitride film thereon having the desired p-work function.
APPLIED MATERIALS, INC.
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Yixiong Mei Guoqiang Paul Wenyi Wei Chi-Chou
Yang Chang Jian Ma Liu Tang Lin