Birch, Stewart, Kolasch & Birch LLP
Semiconductor structure and method for forming the same
A semiconductor structure and a method for forming the same are provided. A semiconductor structure includes a substrate, a seed layer on the substrate, an epitaxial layer on the seed layer, a first transistor on the epitaxial layer, an interlayer dielectric layer on the epitaxial layer, a dielectric pillar penetrating through the interlayer dielectric layer and the epitaxial layer, and a conductive liner disposed on a sidewall of the dielectric pillar. The conductive liner is electrically connected to the first transistor and the seed layer.
Vanguard International Semiconductor Corporation
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Cheng-Wei Yung-Fong Shin-Cheng Yu-Chieh
Chou Lin Lin Chou