Thomas, Kayden, Horstemeyer & Risley, LLP
Pixel structure and exposure method thereof
The present invention provides a pixel structure and exposure method thereof. This present invention divides these devices that influence the optical characteristic of the pixel region into two parts. Each part is located in a sub-pixel region of the pixel region. Different photolithography process rounds are performed in the different sub-pixel regions.
Hannstar Display Corporation
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inventional inventional additional
Po-Sheng Seok-Lyul
Shih Lee