McDermott Will & Emery LLP
Treatment to interface between metal film and BARC or photoresist
A method of manufacturing a semiconductor device is disclosed. In the method, a metallic layer is formed over a substrate, the metallic layer is surface-treated with an alkaline solution, and a bottom anti-reflective coating (BARC) layer is formed on the surface-treated metallic layer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Keh-Wen Chung-Hao Chih-Jen
Chang Chang Yu