Fleit Intellectual Property Law
Thiourea organic compound for gallium arsenide based optoelectronics surface passivation
A semiconductor structure and a method for fabricating the same. The semiconductor structure includes a gallium arsenide substrate, a thiourea-based passivation layer in contact with at least a top surface of the gallium arsenide substrate, and a capping layer in contact with the thiourea-based passivation layer. The method includes passivating a gallium arsenide substrate utilizing thiourea to form a passivation layer in contact with at least a top surface of the gallium arsenide substrate. The method further includes forming a capping layer in contact with at least a top surface of the passivation layer, and annealing the capping layer and the passivation layer.
International Business Machines Corporation
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Devendra K. Ning Qinglong Yun Seog
Sadana Li Li Lee