Fish & Richardson P.C.
Substrate pretreatment compositions for nanoimprint lithography
A nanoimprint lithography method includes coating a surface of a nanoimprint lithography substrate with a pretreatment composition to yield a layer of the pretreatment composition on the surface of the substrate, disposing an imprint resist on the layer of the pretreatment composition to yield a composite layer on the surface of the substrate, contacting the composite layer with a nanoimprint lithography template, and forming a polymeric layer on the surface of the substrate by polymerizing the composite layer. The pretreatment composition includes a polymerizable component having a molecular mass between about 300 and about 750. The imprint resist is a polymerizable composition. The composite layer includes a mixture of the pretreatment composition and the imprint resist. An average spreading rate of the imprint resist to form the composite layer exceeds an average spreading rate of the imprint resist on the substrate under otherwise identical conditions.
Canon Kabushiki Kaisha
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G03F G03F G03F H01L
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Fen Timothy Brian Weijun
Wan Stachowiak Liu