Method of making a micro-electro-mechanical-systems (MEMS) device
A method of forming a MEMS device includes forming a sacrificial layer over a substrate. The method further includes forming a metal layer over the sacrificial layer and forming a protection layer overlying the metal layer. The method further includes etching the protection layer and the metal layer to form a structure having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes etching the sacrificial layer to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the etching of the sacrificial layer to form the movable portion of the MEMS device.
Freescale Semiconductor, Inc.
B B B
B81C B81C B81B
additional inventional additional
Robert F. David W. Lianjun Lisa H. Ruben B. Wei
Steimle Kierst Liu Karlin Montez Liu