Rabin & Berdo, P.C.
Method for manufacturing P-I-N microcrystalline silicon structure for thin-film solar cells
A method for manufacturing a P-I-N microcrystalline silicon structure for thin-film solar cells, includes the steps of: (a) forming a P-type layer; (b) forming an I-type layer including a plurality of sub-layers successively stacked on the P-type layer using gas mixtures including fluoride and hydride that have different gas ratios, respectively; and (c) forming an N-type layer on the I-type layer. First, second, and third I-type sub-layers may be formed on the P-type layer using gas mixtures including fluoride and hydride at a first, second, and third gas ratios, respectively. Then, advantageously, the third gas ratio may be larger than the second gas ratio and the second gas ratio may be larger than the first gas ratio, and the first gas ratio may be 8%, the second gas ratio may range between 15% and 35%, and the third gas ratio may range between 35% and 50%.
Industrial Technology Research Institute
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C30B Y02E H01L C30B C30B H01L H01L C30B H01L Y02E Y02P H01L
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Chun-Heng Jun-Chin Yu-Hung
Chen Liu Chen