Slater Matsil, LLP
Reticle transfer system and method
A fabrication system comprises placing an internal buffer at a default position of a local system, wherein the default position is a first boundary between a first service area and a second service area, loading a reticle from a first apparatus into a first carrier, wherein the first apparatus and the first carrier is located in the first service area, determining whether a conflicting reticle transfer event occurs in the second service area and transporting the reticle to a second apparatus in the second service area.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Ching-Jung
Chang