Semiconductor device and method for forming the same
A semiconductor device include a substrate including at least a memory cell region formed thereon, an isolation mesh formed on the substrate; and a plurality of storage node contact plugs. The semiconductor device includes a plurality of memory cells formed in the memory cell region. The isolation mesh includes a plurality of essentially homogeneous dielectric sidewalls and a plurality of first apertures defined by the dielectric sidewalls. The storage node contact plugs are respectively formed in the first apertures, and electrically connected to the memory cells respectively.
UNITED MICROELECTRONICS CORP. Fujian Jinhua Integrated Circuit Co., Ltd.
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Ying-Chiao Yu-Chieh Li-Wei Chien-Ting
Wang Lin Feng Ho