Millen, White, Zelano & Branigan, P.C.
Lactone-containing compounds, polymers, resist compositions, and patterning method
 A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance. ##STR1## 
Shin-Etsu Chemical Co., Ltd.
G G C G
G03F G03F C07D G03F
inventional inventional inventional inventional
Jun Tsunehiro Koji Takeshi Osamu
Hatakeyama Nishi Hasegawa Kinsho Watanabe