Armstrong, Kratz, Quintos, Hanson & Brooks, LLP
Method of manufacturing semiconductor device and method of manufacturing optical wave guide
A method of manufacturing a semiconductor device, including the steps of (a) rowing an InP layer on a surface of starting growth, resulting in the InP layer having a convex structure, and (b) wet etching the InP layer by an enchant including hydrochloric acid and acetic acid, and thereby flattening a surface of the InP layer.
Fujitsu Quantum Devices Limited
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Hiroaki Takuya Takayuki
Ito Fujii Watanabe