Method of reducing critical dimension bias during fabrication of a semiconductor device
An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
Applied Materials, Inc.
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Jian Christopher Dennis Yung-Hee Yvette Alexander Wendy H. Melvin Warren Gilad
Ding Bencher Lee Buxbaum Yeh Montgomery Almogy