Haynes and Boone, LLP
Photosensitive material and method of photolithography
Methods and materials directed to solubility of photosensitive material in negative tone developer are described. The photosensitive material may include greater than 50% acid labile groups as branches to a polymer chain. In another embodiment, a photosensitive material, after exposure or irradiation, is treated. Exemplary treatments include applying a base to the photosensitive material.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Ching-Yu
Chang