Slater Matsil, LLP
Photoresist system and method
In an embodiment a radical inhibitor is included within a photoresist in order to reduce the amount of cross-linking that occurs during subsequent processing, such as an ion implantation process, that would otherwise form a crust within the photoresist. The crust can be removed in a separate process, such as a dry etch with an oxidative or reductive etchant. Alternatively, the crust may be treated to make it more hydrophyilic such that it can be removed simultaneously with the photoresist.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Cheng-Han Chien-Chih Ching-Yu
Wu Chen Chang