Fitzpatrick, Cella, Harper & Scinto
Method for forming deposited film
 A method for forming a deposited film comprises forming in a vacuum chamber housing a substrate therein a deposited film containing silicon on the substrate by subjecting a gas represented by the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4, can be the same or different and are each independently hydrogen or a hydrocarbon group, to polymerization. 
Canon Kabushiki Kaisha
B B B Y
B05D B05D B05D Y02E
inventional inventional additional additional
Yoshiyuki Hisanori Yutaka Katsuji Satoshi Masafumi
Osada Tsuda Hirai Takasu Omata Sano