Eschweiler & Associates, LLC
Reusable cut mask for multiple layers
The present disclosure relates to a method of forming a reusable cut mask or trim mask that can be used for multiple design levels, and an associated apparatus. In some embodiments, the method is performed by determining positions of a plurality of mask cuts for a reusable cut mask or a reusable trim mask. Shapes are then routed along a routing path having a plurality of design levels. The routing path intersects one or more of the plurality of mask cuts at positions that form distinct shapes that connect nodes of an integrated chip sharing a same electric network. By routing shapes on a plurality of design levels to intersect one or more of the plurality of mask cuts, the cut masks can be reused between the plurality of levels, therefore decreasing mask costs during fabrication.
Taiwan Semiconductor Manufacturing Co., Ltd.
G G
G06F G03F
inventional inventional
Wen-Hao Huang-Yu Chin-Hsiung Yuan-Te
Chen Chen Hsu Hou