Novick, Kim & Lee, PLLC
Negative photoresist composition for KrF laser for forming semiconductor patterns
Provided is a negative photoresist composition for a KrF laser for semiconductor pattern formation, which includes a predetermined compound in order to improve the properties of a conventional negative photoresist, thereby realizing high transparency, high resolution and an excellent profile, even in the presence of an exposure source having a short wavelength compared to the conventional negative photoresist, and is thus suitable for use in semiconductor processing.
YOUNG CHANG CHEMICAL CO., LTD
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Su Jin Young Cheol Seung Hun Seung Hyun Sang Woong
Lee Choi Lee Lee Yoon