Greenblum & Bernstein, P.L.C.
Susceptor device, manufacturing apparatus of epitaxial wafer, and manufacturing method of epitaxial wafer
In a manufacturing apparatus for manufacturing an epitaxial wafer with a wafer being mounted substantially concentrically with a susceptor, a center rod is provided to extend in an up-and-down direction on a side of a non-mounting surface of the susceptor so that its upper end is adjacent to the center of the susceptor. With this arrangement, part of radiation light irradiated toward the susceptor is diffusely reflected by the center rod before reaching the central portion of the susceptor, thereby reducing the amount of the radiation light irradiated to the central portion of the susceptor as well as lowering the temperature of the portion. Since the center rod and the susceptor are not in surface contact, the center rod does not take the heat from the susceptor, thereby suppressing the temperature from decreasing locally at the central portion of the susceptor.
Sumco Techxiv Corporation
C C C C
C23C C30B C23C C30B
inventional inventional inventional inventional
Motonori Takeshi Kazuhiro Yoshinobu Hidenori
Nakamura Masuda Narahara Mori Kobayashi