Edwards Angell Palmer & Dodge LLP
Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process
A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.
Kanto Kagaku Labushiki Kaisha Kabushiki Kaisha Toshiba
H C C C C
H01L C11D C11D C11D C11D
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Hiroshi Yuji Yumiko Hiroaki Norio
Tomita Yamada Abe Yamada Ishikawa