Duane Morris LLP
Rotatable and tunable heaters for semiconductor furnace
A semiconductor furnace suitable for chemical vapor deposition processing of wafers. The furnace includes a thermal reaction chamber having a top, a bottom, a sidewall, and an internal cavity for removably holding a batch of vertically stacked wafers. A heating system is provided that includes a plurality of rotatable heaters arranged and operative to heat the chamber. In one embodiment, spacing between the sidewall heaters is adjustable. The heating system controls temperature variations within the chamber and promotes uniform film deposit thickness on the wafers.
Taiwan Semiconductor Manufacturing Co., Ltd.
H H F
H01L H01L F27B
inventional inventional inventional
Chun-Lin Hsin-Hsien Zin-Chang
Chang Wu Wei