Maschoff Brennan
Dielectric layer, interconnection structure using the same, and manufacturing method thereof
A method for manufacturing a dielectric layer includes forming a first dielectric film over a substrate. A first porogen is deposited over the first dielectric film. A second dielectric film is formed on and in contact with the first dielectric film and the first porogen. The first porogen is removed.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Yi-Chen You-Hua Yen-Hao Zhen-Cheng Che-Lun
Ho Chou Liao Wu Chang