Oblon, Spivak, McClelland, Maier & Neustadt
Method of manufacturing oxide high-temperature superconductor thin film by means of molecular-beam epitaxy
 Monatomic layers each formed of a single metal are sequentially formed on a substrate using a molecular-beam epitaxy to form a multilayered metal film consisting of a plurality of types of metals, and sequentially with formation the monatomic layers, nitrogen dioxide gas as an oxidizer is supplied to oxidize the multilayered metal film. The same operation is repeatedly performed a predetermined number of times to form an oxide high-temperature superconductor thin film having a predetermined thickness. 
President of Tokyo Institute of Technology
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Shunji Maki
Watanabe Kawai