Knobbe Martens Olson & Bear LLP
Electrical conditioning of MEMS device and insulating layer thereof
A method of fabricating a MEMS device includes conditioning of an insulating layer by applying a voltage across the insulating layer via a conductive sacrificial layer for a period of time, prior to removal of the conductive sacrificial layer. This conditioning process may be used to saturate or stabilize charge accumulated within the insulating layer. The resistance across the insulating layer may also be measured to detect possible defects in the insulating layer.
QUALCOMM MEMS Technologies, Inc.
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B81B B81C G02B B81C B81C
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Chun-chen Patrick F. Chen-Jean
Wu Brinkley Chou