Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Gas supply member, plasma treatment method, and method of forming yttria-containing film
According to one embodiment, a gas supply member is provided with a gas supply passage including a gas flow channel with a first diameter, and an exhaust port connected to one end portion of the gas flow channel and provided to a surface of a downstream side of the gas supply member. An yttria-containing film is formed on a surface constituting the exhaust port and the surface of the downstream side of the gas supply member. At least a part of the surface constituting the exhaust port is formed with a curved surface.
Kabushiki Kaisha Toshiba
H H H C H H C Y
H01J H01J H01J C23C H01J H01J C23C Y10T
inventional inventional inventional additional additional inventional additional additional
Hideo Rikyu Sachiyo Makoto
Eto Ikariyama Ito Saito