Bacon & Thomas
Positive photoresist composition containing alicyclic dissolution inhibitors
 A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and k are defined in the specification. The photoresist composition of the present invention is useful as a chemically amplified type resist when exposed to deep UV light from a KrF and ArF excimer laser. 
Everlight USA, Inc.
Y C G G C C
Y10S C07C G03F G03F C07C C07C
additional inventional inventional inventional additional additional
Shang-Ho Yen-Cheng Wen-Chieh Shang-Wern
Lin Li Wang Chang