Servilla Whitney LLC
In-situ tungsten deposition without barrier layer
In-situ methods for depositing a metal film without the use of a barrier layer are disclosed. Some embodiments comprise forming an amorphous nucleation layer comprising one or more of silicon or boron and forming a metal layer on the nucleation layer. These processes are performed without an air break between processes.
APPLIED MATERIALS, INC.
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Jianqiu Yumin Yixiong Wei V. Jacqueline S. Mandyam Yong Srinivas Wenyi
Guo He Yang Tang Wrench Sriram Wu Gandikota Liu