Oblon, Spivak, McClelland, Maier & Neustadt
Method for the production of highly pure copper thin films by chemical vapor deposition
 The present invention relates to a method for the production of highly pure copper thin films free from carbonaceous impurities, which comprises depositing a thin copper film using an organic copper compound precursor containing ketoesters alone or in combination with a Lewis base as ligands, by which the ligands are not thermally decomposed during the vapor deposition. 
Korea Institute of Science and Technology
C
C23C
inventional
Young S. Hyung S. Soon T. Chong J.
Cho Choi Hwang Lim