Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask
A position deviation and an image of a danger control pattern predicted after multiple exposure of each mask used for multiple exposure are acquired and an image after lap exposure by means of the masks based on the above image and position deviation information. At this time, parameters such as an offset amount caused by overlapping of images of the masks, rotation amount and the like are changed and a parameter capable of avoiding occurrence of faults in a dangerous pattern in an image predicted after lap exposure is calculated.
Kabushiki Kaisha Toshiba
G G G G G
G03F G03F G03F G03F G03F
inventional inventional inventional inventional inventional
Masato
Saito