Oliff & Berridge, PLC
Polymer, resist composition and patterning process using the same
There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.
Shin-Etsu Chemical Co., Ltd.
Y G
Y10S G03F
additional inventional
Satoshi Keiichi Osamu Tamotsu Takanobu Ryuji
Watanabe Masunaga Watanabe Watanabe Takeda Koitabashi