Westerman, Hattori, Daniels & Adrian, LLP
Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same
A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface.
SHIN-ETSU CHEMICAL CO., LTD.
B C C
B24B C09K C09G
inventional inventional inventional
Daijitsu Harunobu Masaki
Harada Matsui Takeuchi