Method of forming a floating gate self-aligned to STI on EEPROM
A method is disclosed for forming a split-gate flash memory cell where the floating gate of the cell is self-aligned to a shallow trench isolation (STI), which in turn makes it self-aligned to source and to word line. This will advantageously affect a shrinkage in the size of the memory cell. In a first embodiment, the close self-alignment is made possible through a new use of an anti-reflective coating (ARC) in the various process steps of the making of the cell. In the second embodiment, a low-viscosity material is used in such a manner so as to enable self-alignment of the floating gate to the STI in a simple way.
Taiwan Semiconductor Manufacturing Company
H H
H01L H01L
inventional inventional
Wen-Ting Chuan-Li Chia-Ta Jack Di-Son
Chu Chang Hsieh Yeh Kuo