Lee IP Law, P.C.
Optical proximity correction (OPC) method and method of manufacturing mask by using the OPC method
An optical proximity correction (OPC) whereby corner rounding may be effectively controlled, and a mask manufacturing method performed using the OPC method are provided. According to the OPC method, an inner edge is generated through decomposition of a layout, and a displacement (DISin_frag) of an inner fragment and a displacement (DISsel) of a selected fragment are calculated based on the inner edge to additionally displace a fragment, so as to manufacture a mask layout with minimized corner rounding without violating mask rule check (MRC).
SAMSUNG ELECTRONICS CO., LTD.
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Yu-kyung Yun-kyoung Da-woon
Kim Song Choi