Westerman, Hattori, Daniels & Adrian, LLP
Resist composition and patterning process
A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.
Shin-Etsu Chemical Co., Ltd.
G G
G03F G03F
inventional inventional
Satoshi Tamotsu Osamu Ryuji Youichi Takanobu
Watanabe Watanabe Watanabe Koitabashi Ohsawa Takeda