Servilla Whitney LLC
Methods of etching films with reduced surface roughness
Provided are methods for etching films comprising transition metals which help to minimize higher etch rates at the grain boundaries of polycrystalline materials. Certain methods pertain to amorphization of the polycrystalline material, other pertain to plasma treatments, and yet other pertain to the use of small doses of halide transfer agents in the etch process.
Applied Materials, Inc.
C C C H H
C23F C30B C23F H01J H01J
inventional inventional inventional additional inventional
Srinivas D. Jeffrey W. Jie Xikun David Benjamin Nitin K.
Nemani Anthis Liu Wang Benjaminson Schmiege Ingle