Moser, Patterson, & Sheridan
Process chamber having a voltage distribution electrode
The present invention provides a process chamber and voltage distributive electrode (VDE) which distributes capacitive coupling between an inductive source and a plasma in a process chamber. The VDE is preferably slotted defining energy opaque and energy transparent portions which enable inductive coupling into the chamber while distributing capacitive coupling uniformly over the dielectric window.
Applied Materials Inc.
H
H01J
inventional
Jin-Yuan Valentin N. Xueyu Zhiwen Robert E. Arthur
Chen Todorov Qian Sun Ryan Sato