McDermott Will & Emery LLP
Plasma doping method and plasma doping apparatus
Before a plasma doping process is performed, there is generated a plasma of a gas containing an element belonging to the same group in the periodic table as the primary element of a silicon substrate 9, e.g., a monosilane gas, in a vacuum chamber 1. Thus, the inner wall of the vacuum chamber 1 is covered with a silicon-containing film. Then, a plasma doping process is performed on the silicon substrate 9. 
Panasonic Corporation
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C23C H01L H01J
inventional inventional inventional
Bunji Hisao Katsumi Yuichiro Hiroyuki Tomohiro
Mizuno Nagai Okashita Sasaki Ito Okumura