Green, Howard & Mughal LLP
Method for fabricating transistor with thinned channel
A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.
Intel Corporation
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Robert S. Mark L. Suman Marko Matthew V. Amlan Jack T. Brian S. Justin K.
Chau Doczy Datta Radosavljevic Metz Majumdar Kavalieros Doyle Brask