Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Photomask evaluation method and manufacturing method of semiconductor device
A photomask evaluation method includes applying energy waves to a photomask having a to-be-measured pattern, detecting a response wave from the photomask, acquiring an edge profile of the to-be-measured pattern based on the response wave, acquiring dimension of that portion of the to-be-measured pattern which lies in a preset area, based on the edge profile, subjecting that portion of the edge profile which lies in the preset area to frequency analysis to acquire intensity distribution of frequency components, and extracting a portion with a frequency lower than a preset frequency from the intensity distribution.
Kabushiki Kaisha Toshiba
G
G03F
inventional
Masato
Saito