Keohane & D'Alessandro PLLC
Methods for improving double patterning route efficiency
A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs.
GLOBALFOUNDRIES Inc.
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Juhan Lei Jongwook Hidekazu Yunfei Mahbub
Kim Yuan Kye Yoshida Deng Rashed