Fish & Richardson P.C.
Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
Carl Zeiss SMT GmbH
G G G G
G02B G02B G02B G03F
inventional inventional inventional inventional
Alexander Hans-Juergen Tilman
Epple Rostalski Schwertner