WPAT, P.C., Intellectual Property Attorneys
Apparatus for forming a photoresist layer, method for forming a masking layer, and method for forming a photoresist layer
The present disclosure provides a method for forming a masking layer, including spinning a wafer, dispensing a first liquid at a first location on the wafer, and dispensing a second liquid at a second location on the wafer simultaneously with dispensing the first liquid at the first location, wherein the second liquid is a remover of the first liquid, and the first location is different from the second location.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
G B H H H G G H
G03F B05D H01L H01L H01L G03F G03F H01L
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Chen Yi Yung-Yao
Hsu Lee