Foley & Lardner LLP
Electrostatic chuck and semiconductor manufacturing apparatus
An electrostatic chuck includes a first electrode provided in a first plane, a second electrode provided in a second plane parallel to the first plane, and an insulator. The second electrode includes a plurality of portions which intersect with an intersection line between a region in which the first electrode is orthogonally projected to the second plane and a third plane vertical to the second plane. The insulator is provided between the first and second electrodes.
KABUSHIKI KAISHA TOSHIBA
H
H01L
inventional
Hiroshi Makoto Eiichi Shinya
Sanda Saito Nagumo Ito