Muir Patent Law, PLLC
Plasma processing apparatus and method of manufacturing semiconductor device using the same
A plasma processing apparatus includes a chamber, a lower and upper electrodes vertically spaced apart from each other in the chamber, a RF transmitting part connected to the lower electrode and configured to supply RF power to the lower electrode, a ground plate spaced downwardly from the lower electrode, and an insulating member laterally surrounding a cavity formed between the lower electrode and the ground plate. The cavity is isolated from a region under the ground plate by the ground plate.
SAMSUNG ELECTRONICS CO., LTD.
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inventional inventional inventional inventional
Jongwoo Youngjin Akira Masato Dowon Yongwoo Kyohyeok Yunhwan Taeil
Sun Noh Koshiishi Horiguchi Kim Lee Kim Kim Cho