Haynes and Boone, LLP
Method and apparatus for compensated illumination for advanced lithography
Disclosed is a lithography system. The lithography system includes a source designed to provide energy; an imaging system configured to direct the energy onto a substrate to form a predefined image thereon, and defining an optical axis; and an aperture incorporated with the imaging system, the aperture having a plurality of transmitting regions defined along radial axis not parallel to the optical axis, and each transmitting region operable to transmit the energy with adjustable intensity.
Taiwan Semiconductor Manufacturing Company, Ltd.
G
G03F
inventional
Shih-Ming Chi-Lun Hung Chang Chih-Cheng Sheng-Chi Wen-Chuan
Chang Lu Hsieh Chin Chin Wang