Chambliss, Bahner & Stophel, P.C.
Method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith
A method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith are disclosed. Chemical mechanical polishing is combined with liftoff using only a single resist layer to allow the removal of leftover fencing on the side of a lifted resist pattern.
Hitachi Global Storage Technologies Netherlands B.V.
G
G11B
inventional
Jui-Lung Marie-Claire Kim Y. Chun-Ming
Li Cyrille Lee Wang