Pillsbury Winthrop Shaw Pittman LLP
Correction for flare effects in lithography system
A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic apparatus is simulated by mathematically combining a density map of the design layout at the exposure field with a point spread function (PSF), wherein system-specific effects on the flare map may be incorporated in the simulation. Location-dependent flare corrections for the design layout are calculated by using the determined flare map, thereby reducing the effect of flare.
ASML Netherlands B.V.
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G06F G03F G06F G03F
inventional inventional inventional inventional
Hua-Yu Luoqi Jiong Wei Jiangwei
Liu Chen Jiang Liu Li