F. Chau & Associates, LLC
Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes
Semiconductor fabrication processes are provided for removing sidewall spacers from gate structures while mitigating or otherwise preventing defect mechanisms such as damage to metal silicide structures or otherwise impeding or placing limitations on subsequent process flows.
International Business Machines Corporation Samsung Electronics Co., Ltd.
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Jun Jung Chong Kwang Jong Ho Thomas W. Kyoung Woo Ja Hum Min-Chul
Kim Chang Yang Dyer Lee Ku Sun