Oblon, McClelland, Maier & Neustadt, L.L.P.
Film-forming apparatus and film-forming method
A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.
Denso Corporation NuFlare Technology, Inc. Central Research Institute of Electric Power Industry Toyota Jidosha Kabushiki Kaisha
Ayumu Kunihiko Naohisa Masahiko Masami Hidekazu Hideki Koichi Hiroaki Isaho
Adachi Suzuki Ikeya Ito Naito Tsuchida Ito Nishikawa Fujibayashi Kamata