Rothwell, Figg, Ernst & Manbeck, P.C.
Stripper composition for removing photoresists and method for stripping photoresists using the same
The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.
LG CHEM, LTD.
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Dae Chul Woo Ram Tae Moon Dong Hoon Ju Young Hyun Jun
Jung Lee Park Lee Kim Lee