Fitzpatrick, Cella, Harper & Scinto
Antireflection film and exposure apparatus using the same
 This specification discloses antireflection film and an exposure apparatus using the same. The exposure apparatus has an optical system, and antireflection film formed on the refracting surface of the optical system, the antireflection film having a high refractive index layer having Al.sub.2 O.sub.3 or Ta.sub.2 O.sub.5 and a low refractive index layer having SiO.sub.2. 
Canon Kabushiki Kaisha
G G
G02B G02B
inventional inventional
Yasuyuki Kenji Ryuji
Suzuki Ando Biro