Westerman, Hattori, Daniels & Adrian, LLP
Semiconductor device
A silicide film is formed between a ferroelectric capacitor structure, which is formed by sandwiching a ferroelectric film between a lower electrode and an upper electrode, and a conductive plug (the conductive material constituting the plug is tungsten (W) for example). Here, an example is shown in which a base film of the conductive plug is the silicide film.
Fujitsu Semiconductor Limited
H H H H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
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Kouichi Hideaki
Nagai Kikuchi