Fluorinated surfactants for aqueous acid etch solutions
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
3M Innovative Properties Company
C H
C09K H01L
inventional additional
Zai-Ming George G. I. Patricia M. Zhongxing Richard M. William M. Michael J.
Qiu Moore Savu Zhang Flynn Lamanna Parent