Pillsbury Winthrop Shaw Pittman LLP
Method and apparatus for design of a metrology target
A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
ASML Netherlands B.V.
G G G G G
G01B G03F G01B G03F G03F
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Wei Maurits Guangqing
Liu Van der Schaar Chen