Novick, Kim & Leem, PLLC
I-line negative type photoresist composition having excellent etching resistance
This invention relates to an I-line negative photoresist composition having excellent etching resistance, which can exhibit superior etching resistance compared to conventional I-line negative photoresists and is thus suitable for use in semiconductor processing.
YOUNG CHANG CHEMICAL CO., LTD
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Young Cheol Sang Woong Seung Hun Seung Hyun
Choi Yoon Lee Lee