Haynes and Boone, LLP
Developer for lithography
A method for lithography patterning includes forming a material layer over a substrate; exposing a portion of the material layer to a radiation; and removing the exposed portion of the material layer in a developer, resulting in a patterned material layer. The developer comprises an organic solvent and a basic solute, wherein the organic solvent is more than 50% of the developer by weight. In an embodiment, the developer further comprises water that is less than 50% of the developer by weight.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chen-Yu Ching-Yu
Liu Chang