Knobbe Martens Olson & Bear LLP
Exposure apparatus, method of controlling the same, and alignment method for exposure
An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask.
Samsung Display Co., Ltd.
G H
G03F H01L
inventional inventional
Seok-Joo Jin-Hong Jung-Hun
Lee Jeun Yeon