Davidson Berquist Jackson & Gowdey LLP
Chemical mechanical polishing composition
A chemical mechanical polishing composition includes: an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, and water. The metal residue inhibitor is selected from the group of compounds having the following formulas:and combinations thereof,wherein R1, R2, R3, and R4 are independently selected from H, C1-C6 alkyl, C2-C6 alkenyl, and C2-C6 alkylidyne; and R5, R6, R7, R8, R9, and R10 are independently selected from H and C1-C6 alkyl.
Epoch Material Co., Ltd.
C
C09K
inventional
Pao-Cheng Hui-Fang Jui-Ching Wen-Cheng Yen-Liang
Chen Hou Chen Liu Chen