Haynes and Boone, LLP
Pellicle for advanced lithography
The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame attached to the pellicle membrane. The pellicle frame has a surface that defines at least one groove. The apparatus further includes a substrate that is in contact with the surface of the pellicle frame such that the grove is positioned between the pellicle frame and the substrate.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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inventional inventional
Ching-Fang Ting-Hao Chun-Hung Ching-Hsiang Yu-Ching Sheng-Chi
Yu Hsu Lin Chang Lee Chin