Antonelli, Terry, Stout & Kraus
Resist-peeling liquid and process for peeling a resist using the same
 A resist is peeled without leaving a residue after peeling, by bringing a resist-peeling liquid comprising a primary aliphatic amine of 2-6 carbon atoms into contact with the surface of an etched novolak positive photoresist, and removing the resist-peeling liquid containing the thus peeled resist from the surface of the etched resist. The used resist-peeling liquid can easily be recovered and regenerated. 
Hitachi, Ltd.
C G G C
C11D G03F G02F C11D
inventional inventional additional inventional
Hiroshi Toshiyuki Masato Satoru Mitsuo Hitoshi Yasushi Michio
Kikuchi Koshita Kikuchi Todoroki Nakatani Oka Sano Tsukii