Lee & Morse, P.C.
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.
Cheil Industries, Inc.
H C C G H H H C G C G
H01L C08G C07C G03F H01L H01L H01L C08G G03F C07C G03F
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Chung-Heon Yoo-Jeong Hyo-Young Youn-Jin Yun-Jun Yong-Woon Hwan-Sung
Lee Choi Kwon Cho Kim Yoon Cheon