Christensen, Fonder, Dardi & Herbert PLLC
Method for adjusting effective work function of metal gate
A method for adjusting an effective work function of a metal gate. The method includes forming a metal gate arrangement comprising at least a metal work function layer, and performing plasma treatment on at least one layer in the metal gate arrangement. In this way, it is possible to adjust the effective work function of the metal gate in a relatively flexible way.
INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
H H H H H
H01L H01L H01L H01L H01L
additional inventional inventional inventional inventional
Weichun Jiang Wenwu Hong
Luo Yan Wang Yang