Kilpatrick Townsend & Stockton LLP
Magnetic induction plasma source for semiconductor processes and equipment
Exemplary magnetic induction plasma systems for generating plasma products are provided. The magnetic induction plasma system may include a first plasma source including a plurality of first sections and a plurality of second sections arranged in an alternating manner and fluidly coupled with each other such that at least a portion of plasma products generated inside the first plasma source may circulate through at least one of the plurality of first sections and at least one of the plurality of second sections inside the first plasma source. Each of the plurality of second sections may include a dielectric material. The system may further include a plurality of first magnetic elements each of which may define a closed loop. Each of the plurality of second sections may define a plurality of recesses for receiving one of the plurality of first magnetic elements therein.
Applied Materials, Inc.
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Kenneth D. Junghoon Dmitry Satoru Soonam Tae Seung Soonwook
Schatz Kim Lubomirsky Kobayashi Park Cho Jung