Fujitsu Patent Center
Exposure mask and method of manufacturing a semiconductor device
A method of manufacturing a film pattern includes forming a film over a substrate, applying a photoresist over the film, exposing the photoresist using a first mask pattern including a first mask opening and a second mask opening, and an optical proximity correction being applied only to the first mask opening, exposing the photoresist using a second mask pattern including a third mask opening and a fourth mask opening, an optical proximity correction being applied only to the fourth mask opening.
Fujitsu Semiconductor Limited
H G
H01L G03F
inventional inventional
Yuji
Setta