Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Dry processing apparatus and dry processing method
A dry processing apparatus includes a lower electrode for holding a substrate to be processed in a chamber, a shower head, provided to face a surface of the lower electrode, on which the substrate to be processed is placed, for supplying a process gas to the substrate to be processed, placed on the lower electrode, and a pumping channel formed to surround an outer circumference of the lower electrode, wherein a pumping gap portion for communicating a processing space formed between the lower electrode and the shower head, and the pumping channel with each other, is made such that a width of the gap portion differs between an exhaust pump side where the pumping channel is connected to an exhaust pump, and an opposite side thereto.
Kabushiki Kaisha Toshiba
H H H C C
H01L H01J H01J C23C C23C
inventional inventional inventional inventional inventional
Makoto Ichiro Shigeyuki Seiji Hiroshi
Saito Tohno Takagi Onoue Nishimura