Haynes and Boone, LLP
EUV radiation modification methods and systems
A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.
Taiwan Semiconductor Manufacturing Co., Ltd.
G H
G03F H05G
inventional inventional
Jen-Hao Li-Jui Tzung-Chi Bo-Tsun Po-Chung Chun-Lin Louis
Yeh Chen Fu Liu Cheng Chang