Finnegan, Henderson, Farabrow, Garrett & Dunner LLP
Film formation apparatus and film formation method
A film formation apparatus according to an embodiment includes: a film formation chamber performing film formation on a substrate; a cylindrical liner provided inside of a sidewall of the film formation chamber; a process-gas supply unit provided at a top of the film formation chamber and having a first gas ejection hole supplying a process gas to inside of the liner; a first heater provided outside the liner in the film formation chamber and heating the substrate from above; a second heater heating the substrate from below; and a shielding gas supply unit having a plurality of second gas ejection holes supplying a shielding gas to a position closer to a sidewall of the film formation chamber than a position of the first gas ejection hole.
NuFlare Technology, Inc.
C C C C C C C C
C30B C23C C23C C23C C23C C30B C30B C23C
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Masahiko Hiroaki Koichi Hideki Isaho Ayumu Hidekazu Masami Kunihiko
Ito Fujibayashi Nishikawa Ito Kamata Adachi Tsuchida Naito Suzuki