Janah & Associates
Dielectric covered electrostatic chuck
An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises an electrode 110 at least partially covered by a semiconducting dielectric 115, wherein the semiconducting dielectric 115 may have an electrical resistance of from about 5&times;109 &OHgr;cm to about 8&times;1010 &OHgr;cm.
Applied Materials, Inc.
H Y C H H H
H01J Y10T C23C H01L H01L H01J
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Kenneth S. Dennis S. Edwin C. Timothy Robert J. Shamouil Dan Arik Arnold Ananda H. Alexander M. Brian Kadthala R. Semyon L.
Collins Grimard Weldon Dyer Steger Shamouilian Maydan Donde Kholodenko Kumar Veytser Lue Narendrnath Kats