Positive image formation utilizing resist material with carbazole diazonium salt acid generator
 Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt. 
E. I. Du Pont de Nemours and Company
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inventional inventional additional
Yuan Yu G. Albert G. Robert C. Walter R.
Chen Anderson Wheland Hertler