Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
 A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid. 
Horizons Incorporated, a division of Horizons Research Incorporated
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G03F Y10S
inventional additional
Raymond W. James M.
Newyear Lewis