Pillsbury Winthrop Shaw Pittman LLP
Patterning device, a method of making the same, and a patterning device design method
A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.
ASML Netherlands B.V.
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G03F G03F G03F
inventional inventional inventional
Jingjing Duan-Fu Stephen
Liu Hsu