Tung & Associates
Dual mode hybrid control and method for CMP slurry
A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.
Taiwan Semiconductor Manufacturing Co., Ltd.
B B
B24B B24B
inventional inventional
Jui-Cheng Chien-Ling Chien-Kuo Chao-Jung Chin-Hsin Ping-Hsu
Lo Huang Lu Chang Peng Chen