Haynes and Boone, LLP
Surface-modified middle layers
Methods and materials for making a semiconductor device are described. The method includes providing a substrate, forming a surface-modified middle layer (SM-ML) that includes a fluorine-containing material over the substrate, forming a photoresist layer over the SM-ML, exposing the photoresist layer to an exposure energy, and developing the photoresist layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G
G03F G03F
inventional inventional
Ching-Yu Fang
Chang Lin