McGinn IP Law, PLLC
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
International Business Machines Corporation
G G C
G03F G03F C08F
inventional inventional inventional
Wu-Song Marie Robert Neal Wenjie Gregory David R. Wayne Martin Karen Elizabeth
Huang Angelopoulos Lang Li Breyta Medeiros Moreau Petrillo