Haynes and Boone, LLP
System and method for real-time overlay error reduction
Disclosed is a lithography system. The lithography system includes a radiation source to provide radiation energy for lithography exposure; a substrate stage configured to secure a substrate; an imaging lens module configured to direct the radiation energy onto the substrate; at least one sensor configured to detect a radiation signal directed from the substrate; and a pattern extraction module coupled with the at least one sensor and designed to extract a pattern of the substrate based on the radiation signal.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Wen-Chuan Shih-Ming
Wang Chang