Craig & Antonelli
Photosensitive resin composition
 A photosensitive resin composition comprising (a) a linear polymer or copolymer having tetrahydrofurfuryl groups at side chains, (b) one or more photopolymerizable unsaturated compounds having at least two terminal ethylene groups, and (c) one or more sensitizers which initiate polymerization of said unsaturated compounds by irradiation of active light, has excellent storage stability and photosensitivity. The composition can produce permanent protective films having excellent resistance to solvents, heat resistance and the like and can be used as a solder resist and the like. 
Hitachi Chemical Company, Ltd.
G Y
G03F Y10S
inventional additional
Toshiaki Nobuyuki Hideo Katsushige Hajime
Ishimaru Hayashi Yamada Tsukada Kakumaru