Sughrue Mion, PLLC
Projection objective, projection exposure apparatus and reflective reticle for microlithography
A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.
Carl Zeiss SMT GmbH
G G G
G03F G03F G03F
inventional inventional inventional
Wilhelm Alexander Aurelian Dieter
Ulrich Epple Dodoc Bader