Maschoff Brennan
Focus metrology method and photolithography method and system
The present disclosure provides a focus metrology method and photolithography method and system. The focus metrology method includes recognizing at least one relevant region and at least one irrelevant region on a workpiece surface, measuring a height of the relevant region and determining a focal length for an exposure process based on the measured height of the relevant region.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
G G G
G03F G01B G03F
inventional inventional inventional
Hung-Ming Jui-Chun Heng-Hsin Yung-Yao
Kuo Peng Liu Lee