Oliff & Berridge PLC
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.
Nikon Corporation
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Kinya Masaki Masato Masashi Hiroshi Hiroshi
Kato Kato Kumazawa Tanaka Shirasu Chiba