Hauptman Ham, LLP
Method of depositing a ruthenium metal thin film or ruthenium oxide thin film
A method of depositing a ruthenium metal thin film or ruthenium oxide thin film comprising a ruthenium compound used for depositing metallic Ru or RuO2 thin film on a substrate via atomic layer deposition, and the ruthenium compound represented by Chemical Formula 1, wherein L is a ligand selected from the group consisting of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene, and isoprene.
HANSOL CHEMICAL CO., LTD.
C C C
C07F C23C C23C
inventional inventional inventional
Jun Young Jung Woo Whee Won Kwang deok
Kim Park Jin Lee