Haynes and Boone, LLP
Error diffusion and grid shift in lithography
The present disclosure involves a method of data preparation in lithography processes. The method of data preparation includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, and converting the IC layout design GDS grid to a second exposure grid by applying an error diffusion and a grid shift technique to a sub-pixel exposure grid.
Taiwan Semiconductor Manufacturing Company, Ltd.
G
G03F
inventional
Pei-Yi Burn Jeng Wen-Chuan Shy-Jay Jaw-Jung
Liu Lin Wang Lin Shin