Sughrue Mion, PLLC
Insulating film material containing an organic silane compound, its production method and semiconductor device
An insulating film material formed by chemical vapor deposition, which contains an organic silane compound having such a structure that at least one secondary hydrocarbon group and/or tertiary hydrocarbon group is directly bonded to a silicon atom.
Tosoh Corporation
H H H H C H C Y H H
H01L H01L H01L H01L C23C H01L C07F Y10T H01L H01L
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Keisuke Daiji
Yoshida Hara