Moser Taboada
Methods and apparatus for controlling substrate temperature in a process chamber
Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.
Applied Materials, Inc.
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H01L H01L H05B Y10T
inventional inventional inventional additional
Anchel Xiaoping Xing Douglas A. Andrew Valentin
Sheyner Zhou Lin Buchberger, Jr. Nguyen Todorow