F. Chau & Associates, LLC
CMOS image sensor including an interlayer insulating layer and method of manufacturing the same
Provided are a CMOS image sensor and a method of manufacturing the same. The CMOS image sensor includes a semiconductor substrate having photodiodes and transistors. An interlayer insulating layer is formed on the resultant structure having the photodiodes and transistors, and light blocking patterns are formed on the interlayer insulating layer to surround the peripheries of the photodiodes.
Samsung Electronics Co., Ltd.
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Jae-Seob Hee-Geun Seok-Ha
Roh Jeong Lee