Hayes, Soloway, Hennessey, Grossman & Hage, P.C.
Method for E-beam writing
 A method for writing on a semiconductor wafer using electron beams is provided. One embodiment of the method includes the steps of using electron beams to irradiate a semiconductor substrate on which a resist layer has been formed, to thereby draw patterns on the resist layer, and then baking the resist layer and substrate in a vacuum. 
NEC Corporation
B H Y B G
B82Y H01J Y10S B82Y G03F
inventional inventional additional inventional inventional
Hiroshi Hiroshi Junko
Nozue Yamashita Morikawa