Novick, Kim & Lee, PLLC
EUV developer composition for forming photosensitive photoresist micropattern
An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.
YOUNG CHANG CHEMICAL CO., LTD
G G
G03F G03F
additional inventional
Gi Hong Su Jin Seung Hun Seung Hyun
Kim Lee Lee Lee