Haynes and Boone, LLP
Materials and methods for improved photoresist performance
A photosensitive material and methods of making a pattern on a substrate are disclosed. The photosensitive material includes a polymer that turns soluble to a developer solution after a chemically amplified reaction, and at least one chemical complex having a single diffusion length. The material includes at least one photo-acid generator (PAG) linked to at least one photo decomposable base (PDB) or quencher.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Chen-Yu Ching-Yu
Liu Chang