Hard mask spacer structure and fabrication method thereof
A hard mask spacer structure includes a first spacer on a device layer, the first spacer defining a plurality of hole patterns and at least an asteriated hole pattern between the hole patterns; and a second spacer on the first spacer and inlaid into the asteriated hole pattern, thereby rounding the asteriated hole pattern.
Nanya Technology Corp.
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Ya-Chih Hai-Han Wen-Chieh
Wang Hung Wang