Scully, Scott, Murphy & Presser, P.C.
Semiconductor processing method
A method of processing semiconductor material includes applying an organosulfur solution to a top surface of a semiconductor material, the organosulfur solution having at least one organosulfur compound. The at least one organosulfur compound has at least one sulfur atom double bonded to a carbon atom and a pH of not less than 8. An organosulfur solution may be applied at temperatures above 25° C. to increase sulfur deposition rates and increase sulfur coverage on a surface of a semiconductor material.
International Business Machines Corporation
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Joel Pereira Devendra K. Yun Seog Marinus
de Souza Sadana Lee Hopstaken