Novick, Kim & Lee, PLLC
Negative photoresist composition for KRF laser, having high resolution and high aspect ratio
Disclosed is a negative photoresist composition for a KrF laser, having high resolution and a high aspect ratio and, more particularly, a negative photoresist composition for a KrF laser, which includes a specific additive in order to improve the properties of a conventional negative photoresist, whereby the negative photoresist composition can prevent fine-pattern collapse even using a short-wavelength exposure light source, compared to conventional negative photoresists, and can also exhibit high resolution and a high aspect ratio and is thus suitable for use in semiconductor processing.
YOUNG CHANG CHEMICAL CO., LTD
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inventional inventional additional inventional inventional
Seung Hun Young Cheol Su Jin Seung Hyun
Lee Choi Lee Lee