Dentons US LLP
Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and groove portions provided in a region where the darkened light-shielding pattern layer is not provided, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern manufactured by using the same.
LG CHEM, LTD.
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Nam Seok Ji Young Dae Han Seung Heon Han Min Dong Hyun Min Soo Sangcholl
Bae Hwang Seo Lee Seo Oh Song Han