WPAT, P.C., Intellectual Property Attorneys
Semiconductor structure and method for manufacturing the same
A semiconductor structure is provided. The semiconductor structure includes a substrate, a source/drain structure, a metal gate structure, a ferroelectric layer, a spacer and a metal layer. The source/drain structure is disposed over the substrate. The metal gate structure is disposed over the substrate and between the source/drain structure. The ferroelectric layer is disposed over the metal gate structure and the source/drain structure. The spacer is disposed over the ferroelectric layer. The metal layer is disposed over the ferroelectric layer and surrounded by the spacer. A method for manufacturing a semiconductor structure is also provided.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
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Chih-Yu Sai-Hooi Chih-Hao Yu-Ming
Chang Yeong Wang Lin