Rothwell, Figg, Ernst & Manbeck, P.C.
Plasma processing apparatus and upper electrode assembly
A plasma processing apparatus includes supporting members, connecting members, a rotation member and fixing members. Each of the supporting members is partially disposed in a disc-shaped cooling plate and configured to support an upper electrode provided below the cooling plate. Each of the connecting members is partially disposed in the cooling plate and extends in a diametrical direction of the cooling plate to be engaged with the corresponding supporting member. The rotation member is provided to surround an outer periphery of the cooling plate and has recesses formed to face the cooling plate and engaged with the corresponding connecting members. Each of the fixing members is configured to lift and fix the upper electrode to the cooling plate by applying a torque to the corresponding connecting member.
TOKYO ELECTRON LIMITED
H C H H H H
H01L C23C H01J H01J H01L H01J
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Keita Shin Jun Young
Kambara Matsuura Chung