Lee & Morse, P.C.
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
Cheil Industries, Inc.
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G03F G03F G03F G03F G03F G03F G03F G03F
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Yo-Choul Hea-Jung Yu-Shin Yun-Jun Joon-Young Seung-Wook You-Jung Seung-Hee Go-Un Yoo-Jeong Yong-Woon Chung-Heon Hyun-Ji Young-Min
Park Kim Park Kim Moon Shin Park Hong Kim Choi Yoon Lee Song Kim