Steinberg & Raskin
Method of washing and drying substrates
 A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps of immersing a carrier carrying at least one substrate thereon into wash liquid; drawing up the carrier from the wash liquid while oscillating the substrate; and feeding drying gas to the substrate during the drawing-up of the carrier to remove the wash liquid from the surface of the substrate. The apparatus of the invention is constructed to allow the method to be effectively practiced. 
Sharp Corporation Dainichi Shoji Co., Inc.
H Y
H01L Y10S
inventional additional
Masayoshi Yoshifumi
Takeuchi Kishida