Harrity & Harrity, LLP
Void free interlayer dielectric
A method of manufacturing a non-volatile memory device includes forming a number of memory cells. The method also includes depositing a first dielectric layer over the memory cells, where the first dielectric layer is a conformal layer having a substantially uniform thickness. The method further includes depositing a second dielectric layer over the first dielectric layer. Together, the first and second dielectric layers form an interlayer dielectric without voids.
Advanced Mirco Devices, Inc. Spansion LLC
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Hsiao-Han Wenmei Minh Van Angela T. Hirokazu
Thio Li Ngo Hui Tokuno