Smith, Gambrell & Russell, LLP
Batch type heat treatment system, method for controlling same, and heat treatment method
There is provided a batch type heat treatment system, control method and heat treatment method capable of appropriately coping with a multi-product small-lot production.A reaction tube 2 comprises a plurality of heaters 31 through 35 and a plurality of temperature sensors, and houses therein a wafer boat 23. A control part 100 stores therein many mathematical models for estimating (calculating) the temperature of wafers W in the reaction tube 2, in accordance with the number and arranged position of the wafers W mounted on the wafer boat 23, and many target temperature trajectories. If the wafer boat 23 is loaded in the reaction tube 2, a mathematical model and a target temperature trajectory corresponding to the number and arranged position of the mounted wafers W are read. If a deposition process is started, the output of a temperature sensor S and the model are used for estimating the temperature of the wafers W in the reaction tube 2, and the powers to be supplied to the heaters 31 through 35 are separately controlled so that the estimated temperature approaches the target temperature trajectory.
Tokyo Electron Limited
H H
H01L H01L
inventional inventional
Moyuru Koichi Fujio Wenling Sunil Pradeep
Yasuhara Sakamoto Suzuki Wang Shah Pandey