Ladas & Parry LLP
Mask, manufacturing method thereof and exposure system
A mask, including a transparent substrate and mask patterns formed on a surface of the transparent substrate, wherein the mask patterns include a first area for forming film patterns in a display area and a second area for forming film patterns in a non-display area; both the first area and the second area are provided with a plurality of patterned sub-masks; a distribution density of the patterned sub-masks in the first area is less than a distribution density of the patterned sub-masks in the second area; each patterned sub-mask includes a first pattern for forming a source electrode of a transistor, a second pattern for forming a drain electrode of the transistor, and a slit interposed between the first pattern and the second pattern; and a width of the slit in the first area is greater than a width of the slit in the second area.
BOE TECHNOLOGY GROUP CO., LTD. BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
H G H H H H H H
H01L G03F H01L H01L H01L H01L H01L H01L
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Zengbiao Haichen Liping Kiyong Huishuang Tao
Sun Hu Luo Kim Liu Wang