Slater & Matsil, L.L.P.
Dosage accuracy monitoring systems of implanters
An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.
Taiwan Semiconductor Manufacturing Company, Ltd.
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inventional inventional inventional additional additional
Yung-Fu Juan-Lin Nai-Han Yuk-Tong
Yeh Chen Cheng Lee