Fish & Richardson P.C.
Projection lens system of a microlithographic projection exposure installation
A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
Carl Zeiss SMT GmbH
G G
G03F G03F
inventional inventional
Sascha Wolfgang Heiko Olaf Helmut Alexander Arif Susanne Toralf Jochen Baerbel Norbert
Bleidistel Singer Feldmann Rogalsky Beierl Epple Kazi Beder Gruner Weber Schwaer Wabra