McGuireWoods LLP
Thinner for rinsing photoresist and method of treating photoresist layer
A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.
Samsung Electronics Co., Ltd.
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Sae-Tae Yu-Kyung Jin-Ho Sung-Chul Doek-Man Hong-Sick
Oh Lee Ju Kang Kang Park