Haynes and Boone, LLP
Intensity selective exposure photomask
An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage.
Taiwan Semiconductor Manufacturing Company, Ltd.
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G03F G06F G03F
inventional inventional inventional
Shu-Chen Kuei Shun Te-Chih Yao-Ching Ying-Chou Yu-Po Wen-Chun George Wen-Hao Yu Lun Chih-Yang Tsai-Sheng Boren Ru-Gun Tsong-Hua
Lu Chen Huang Ku Cheng Tang Huang Liu Liu Liu Yeh Gau Luo Liu Ou