Martine Penilla & Gencarella, LLP
Plasma oxidation and removal of oxidized material
A method of etching a conductive layer includes converting at least a portion of the conductive layer and etching the conductive layer to substantially remove the converted portion of the conductive layer and thereby expose a remaining surface. The remaining surface has an average surface roughness of less than about 10 nm. A system for etching a conductive layer is also disclosed.
Lam Research Corporation
H H H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
inventional inventional inventional inventional inventional inventional inventional additional inventional inventional
Hyungsuk Alexander Arthur M. Yunsang Andrew D.
Yoon Howald Kim Bailey, III