Sughrue, Rothwell, Mion, Zinn & Macpeak
Method for providing dielectric isolation in an epitaxial layer of a compound semiconductor using the plasma oxidation
 Method for providing dielectric isolation of an epitaxial layer of a compound semiconductor or for providing separation and protection of pn-junction of a compound semiconductor by applying plasma oxidation. 
Kentaro Hayashi
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Takuo Yoshifumi
Sugano Mori