Method for forming a layout pattern
A method of forming a layout pattern is disclosed. First, an array comprising a plurality of main features is provided wherein the main features are arranged into a plurality of rows along a first direction and are parallel and staggered along a second direction. Assistant features are inserted into each row of the main features. A shortest distance d1 between the main features in row n to the main features in row n+1 and a shortest distance d2 between the main feature in row n−1 to the main feature in row n+1 are obtained. The assistance features inserted in row n of the main features are then adjusted according to the difference between the distances d1 and d2. After that, the main features and the assistant features are output to a photo mask.
Fujian Jinhua Integrated Circuit Co., Ltd. UNITED MICROELECTRONICS CORP.
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inventional inventional inventional inventional additional inventional
Chien-Ting Li-Wei Yu-Cheng Ying-Chiao
Ho Feng Tung Wang