Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Coating and developing system and coating and developing method
A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.
Tokyo Electron Limited
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Yoshio Issei Yasushi Masami Hikaru Nobuaki Shinichi
Kimura Ueda Hayashida Akimoto Ito Matsuoka Hayashi