Millen White Zelano & Branigan, P. C.
Styrene polymer, chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition comprising a styrene polymer represented by formula (1), terminated with P, and having a weight average molecular wherein R is OH or OR3, R1 is H or CH3, R2 is alkyl, R3 is acid labile group, x&gE;0, y>0, k&gE;0, m&gE;0, n>0, 0<q&lE;0.8, p+q=1, P is H, alkyl, alkenyl, aromatic, carboxyl, OH, &#8212;R4(COR5)r, &#8212;R4O(OH)r or &#8212;R4 (OR5)r. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity and resolution and forms resist patterns having plasma etching resistance, heat resistance, and reproducibility.
Shin-Etsu Chemical Co., Ltd.
C G C Y C Y G
C08F G03F C08F Y10S C08F Y10S G03F
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Osamu Shimada Takeda Nagura
Watanabe Junji Takanobu Shigehiro