Morgan, Lewis & Bockius LLP
Trichlorodisilane
Disclosed is a Silicon Precursor Compound for deposition, the Silicon Precursor Compound comprising trichlorodisilane; a composition for film forming, the composition comprising the Silicon Precursor Compound and at least one of an inert gas, molecular hydrogen, a carbon precursor, nitrogen precursor, and oxygen precursor; a method of forming a silicon-containing film on a substrate using the Silicon Precursor Compound, and the silicon-containing film formed thereby.
JIANGSU NATA OPTO-ELECTRONIC MATERIALS CO. LTD.
C C C C C
C01B C23C C23C C01B C23C
inventional inventional inventional additional inventional
Travis Byung K Xiaobing
Sunderland Hwang Zhou