Crowell & Moring LLP
Chemical for forming protective film
Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R1aSi(H)b(X)4−a−b and an acid; or a silicon compound (C) represented by the general formula R7gSi(H)h(CH3)w(Z)4−g−h−w and a base that contains no more than 35 mass % of water. The total amount of water in the liquid chemical is no greater than 1000 mass ppm relative to the total amount of the liquid chemical. The liquid chemical can improve a cleaning step that easily induces pattern collapse.
Central Glass Company, Limited
H H H H C
H01L H01L H01L H01L C09D
inventional inventional inventional inventional inventional
Atsushi Shuhei Yoshinori Soichi Hidehisa Shinobu Masanori Takashi
Ryokawa Yamada Akamatsu Kumon Nanai Arata Saito Saio