Millen, White, Zelano & Branigan, P.C.
Resist compositions and patterning process
A resist composition comprising a dendritic or hyperbranched polymer of a phenol derivative having a weight average molecular weight of 500-10,000,000 has an excellent resolution, reduced line edge roughness, and dry etching resistance and is useful as a chemical amplification type resist composition which may be either positive or negative working.
Shin-Etsu Chemical Co., Ltd.
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G03F G03F G03F Y10S
inventional inventional inventional additional
Jun Toshinobu Osamu Jun Tomohiro Takanobu
Hatakeyama Ishihara Watanabe Watanabe Kobayashi Takeda