Cyclic olefin-based resist compositions having improved image stability
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form resist structures of improved development characteristics, improved etch resistance, and reduced post-exposure bake sensitivity are enabled by the use of resist compositions containing an imaging polymer having cyclic olefin monomeric units respectively having pendant, acid-labile protecting moieties, lactone moieties and fluoroalcohol moieties. The lactone moiety is preferably a pendant lactone ester.
International Business Machines Corporation
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inventional inventional additional
Masafumi Pushkara Rao Wenjie
Yamamoto Varanasi Li