Lee & Morse, P.C.
Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
CHEIL INDUSTRIES, INC.
G G C G C B C G B G B G B C C
G03F G03F C07C G03F C07C B05D C09D G03F B05D G03F B05D G03F B05D C07C C07C
inventional inventional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional additional inventional
Young-Min Yun-Jun Yoo-Jeong Hyo-Young Yong-Woon Youn-Jin Chung-Heon
Kim Kim Choi Kwon Yoon Cho Lee