Vierra Magen Marcus LLP
Memory device with charge isolation to reduce injection type of program disturb
Techniques are described for reducing an injection type of program disturb in a memory device. A charge isolation region is created in a channel of a NAND string on the source side of the selected word line, WLn, and spaced apart from WLn by one or more other word lines, when the program voltage is increased to a program voltage (Vpgm). The isolation region is created by applying 0 V or other low voltage to an isolation word line. The isolation region is maintained for a first portion of a time period in which Vpgm is applied. The charge isolation region can be modified based on factors associated with a risk of program disturb including the magnitude of Vpgm, the position of WLn in a set of word lines and an ambient temperature.
SanDisk Technologies LLC
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Hong-Yan Wei
Chen Zhao