McDermott Will & Emery LLP
Photoresist, developer, and method of forming photoresist pattern
A photoresist composition comprises a polymer resin, a photoactive compound, an organometallic compound, an enhancement additive, and a first solvent. The enhancement additive is an ionic surfactant, a non-ionic surfactant, or a second solvent having a boiling point of greater than 150° C.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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An-Ren Ching-Yu Chin-Hsiang
Zi Chang Lin