Haynes and Boone, LLP
Photoresist materials and photolithography processes
A lithography apparatus generates a tunable magnetic field to facilitate processing of photoresist. The lithography apparatus includes a chamber and a substrate stage in the chamber operable to hold a substrate. A magnetic module provides a magnetic field to the substrate on the substrate stage. The magnetic module is configured to provide the magnetic field in a tunable and alternating configuration with respect to its magnitude and frequency. The magnetic field is provided to have a gradient in magnitude along a Z-axis that is perpendicular to the substrate stage to cause magnetically-charged particles disposed over the substrate stage to move up and down along the Z-axis. The lithography apparatus also includes a radiation energy source and an objective lens configured to receive radiation energy from the radiation energy source and direct the radiation energy toward the substrate positioned on the substrate stage.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Burn Jeng Heng-Jen Hua-Tai Ching-Yu Hsien-Cheng Chin-Hsiang
Lin Lee Lin Chang Wang Lin