Method for pitch reduction
A method for pitch reduction is disclosed. The method can form a pattern with a pitch &frac13; the original pitch formed by available photolithography technologies by only using one photo mask or one pattern transfer process, self-aligned etching back processes, and conventional deposition processes. By choosing appropriate layers to be deposited and etched, the pattern can be an etching mask or it can be a device structure itself.
Macronix International Co., Ltd.
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Wei-Ming Ching-Yu
Chung Chang