Antonelli, Terry, Stout & Kraus, LLP.
Method and its apparatus for inspecting particles or defects of a semiconductor device
An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
Hitachi, Ltd. Hitachi High-Technologies Corporation
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Takahiro Kenji Yoshimasa Akira Minori Hidetoshi Tetsuya
Jingu Watanabe Ohshima Hamamatsu Noguchi Nishiyama Watanabe