Myers Bigel, P.A.
Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition
The present inventive concepts relate to a polymer for a hard mask, a hard mask composition including a polymer for a hard mask as described herein, and a method for forming a pattern of a semiconductor device using a hard mask composition as described herein. The polymer includes a structure represented by the following chemical formula 1.In chemical formula 1, “A”, “Q”, “L”, “R1”, “R2”, “R3”, and “n” are the same as defined in the specification.
Samsung Electronics Co., Ltd.
C H C G C C H H C G G G C H H G
C08G H01L C08G G03F C08F C08G H01L H01L C08G G03F G03F G03F C08G H01L H01L G03F
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Myeong koo Boodeuk Songse Ahreum Jungsik
Kim Kim Yi Choi Choi