J.C. Patents
Development method for manufacturing semiconductors
A development method in a micro-lithographic process uses a surfactant to overcome the hydrophobic nature on the surface of a photo-resist layer. A developer mixture formed by mixing a developer with a surfactant is used for developing the photo-resist layer. Instead of mixing with the developer, the surfactant may be used to cover the surface of the photo-resist layer before developing. Alternatively, the surfactant can also be applied to the photo-resist layer after it has been developed into a photo-resist pattern.
Macronix International Co., Ltd.
G
G03F
inventional
Ching-Yu
Chang