Ditthavong & Steiner, P.C.
EUV pellicle frame with holes and method of forming
A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are disclosed. Embodiments include forming a frame around a patterned area on an EUV mask; forming a membrane over the frame; and forming holes in the frame.
GLOBALFOUNDRIES INC.
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inventional inventional inventional
Lei Wenhui Hui Chanro
Sun Wang Zang Park