Antonelli, Terry Stout & Kraus
Plasma processing method and apparatus using electron cyclotron resonance
 In a plasma processing apparatus using ECR, faces in contact with plasma excepting a substance to be processed are covered by an insulating material. By such configuration, discharge caused between the plasma and the substance to be processed in plasma processing is prevented beforehand. 
Hitachi, Ltd.
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inventional additional inventional inventional inventional
Tadasi Takuya Michio
Sonobe Fukuda Ohue