Millen, White, Zelano & Branigan, P.C.
Chemical amplification type resist composition
A chemical amplification type resist composition uses as the base resin a polymer having a molecular weight dispersity of 1.0 to 1.5 which is a polymer comprising recurring units of formula (1) and recurring units of formula (2) or a polymer comprising recurring units of formula (2) wherein R1 is alkyl, alkoxyalkyl, acetyl or carbonylalkoxy, 0<p/(p+q)&lE;1, R2 is hydrogen or methyl, and R3 is a tertiary hydrocarbon group of 4 to 30 carbon atoms. By virtue of the narrow dispersity effect of the polymer, the resist composition is improved in resolution as compared with prior art base resins having a wide dispersity. Advantages including a high resolution, good pattern profile and storage stability are obtained. 
Shin-Etsu Chemical Co., Ltd.
G Y G Y
G03F Y10S G03F Y10S
inventional additional inventional additional
Osamu Tsunehiro Takanobu Takeshi Jun Jun
Watanabe Nishi Takeda Kinsho Hatakeyama Watanabe