Oblon, McClelland, Maier & Neustadt, L.L.P.
Vapor phase growth apparatus and vapor phase growth method
A vapor phase growth apparatus according to an embodiment includes, n reactors performing a deposition process for a plurality of substrates at the same time, a first main gas supply path distributing a predetermined amount of first process gas including a group-III element to the n reactors at the same time, a second main gas supply path distributing a predetermined amount of second process gas including a group-V element to the n reactors at the same time, a controller controlling a flow rate of the first and second process gas, on the basis of control values of the flow rates of the first and second process gas supplied to the n reactors, and independently controlling predetermined process parameter independently set for each of the n reactors on the basis of control values, rotary drivers, and a heater.
NuFlare Technology, Inc.
H C C C C C C C C H C
H01L C23C C23C C30B C30B C23C C23C C23C C30B H01L C30B
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Yuusuke Hideshi Takanori Hideki
Sato Takahashi Hayano Ito