Carter, Deluca & Farrell LLP
Mask cleaning apparatus and method for cleaning mask
Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.
SEMES CO. LTD.
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Sung Bum Byung Chul Seong Soo Jeong Yeong
Park Kang Lee Park