Lowe Hauptman Gilman & Berner, LLP
Inductive plasma processor including current sensor for plasma excitation coil
An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.
Lam Research Corporation
H H
H01J H01J
inventional inventional
Robert G. Thomas E. Jian J.
Veltrop Wicker Chen