F. Chau & Associates, LLC
Coating material for photoresist pattern and method of forming fine pattern using the same
A coating material for a photoresist pattern includes a water-soluble polymer and an additive mixed with the water-soluble polymer. The additive may be at least one selected from the group represented by Formulas 1 and 2:
Samsung Electronics Co., Ltd.
G
G03F
inventional
Joon-Seok Ju-Young
Oh Kim