Slater & Matsil, L.L.P.
Semiconductor device and method of manufacture
A system and method for etching a substrate is provided. An embodiment comprises utilizing an inert carrier gas in order to introduce a liquid etchant to a substrate. The inert carrier gas may prevent undesirable chemical reactions from taking place during the etching process, thereby helping to reduce the number of defects that occur to the substrate and other structures during the etching process.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chun-Li Hobin Chi-Yun Shao-Yen Sheng-Chi Tsai-Pao Yu-Yen
Chou Chen Tseng Ku Shih Su Hsu