Photoresist compositions and methods of forming photolithographic patterns
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Rohm and Haas Electronics Materials LLC
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Thomas Young Cheol Jong Keun Yi Rosemary Seung-Hyun
Cardolaccia Bae Park Liu Bell Lee