Sutro LLP Cushman Darby & Cushman Intellectual Property Group of Pillsbury Madison &
Waste gas processing apparatus and method for semiconductor fabricating equipment
 The waste gas processing apparatus and method thereof for semiconductor device fabricating equipment includes a water spraying chamber, and an exhaust tube. A demister and an external gas introducer, for causing external gas to enter the exhaust tube adjacent the demister, are installed in the exhaust tube. 
Samsung Electronics Co., Ltd.
B
B01D
inventional
Yung-ho Sang-min Young-soek Hong-rok
Kim Lee No Choi