Cushman, Darby & Cushman
Water soluble photoresist composition with bisazide, diazo, polymer and silane
 Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists. 
Tokyo Shibaura Denki Kabushiki Kaisha
G G
G03F G03F
inventional inventional
Shingo Takeo Norio Kunihiro
Watanabe Ito Koike Ikari