Sintering of silicon nitride to high density
 A silicon nitride compact with a density of 95% to 100% is produced by forming a particulate dispersion of silicon nitride and beryllium additive into a compact, firstly sintering the compact from about 1900.degree. C. to about 2200.degree. C. in nitrogen at superatmospheric pressure sufficient to prevent thermal decomposition of the silicon nitride until the entire outside surface of the compact becomes impermeable to nitrogen gas, and then secondly sintering the compact from about 1800.degree. C. to about 2200.degree. C. under a nitrogen pressure having a value at least twice the first nitrogen sintering pressure. 
General Electric Company
C C
C04B C04B
inventional inventional
John A. Svante Charles D.
Palm Prochazka Greskovich