Haynes and Boone, LLP
Method of semiconductor fabrication with height control through active region profile
A method includes forming trenches on a semiconductor substrate, thereby defining regions for forming semiconductor devices; extracting a profile of the regions; determining an etch recipe based on at least the profile of the regions; filling in the trenches with a dielectric material; and performing an etching process to the dielectric material using the etch recipe.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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Che-Cheng Jung-Jui Po-Chi Yi-Cheng
Chang Li Wu Chao