Blakely Sokoloff Taylor & Zafman LLP
Mask passivation using plasma
A gas comprising hydrogen is supplied to a plasma source. Plasma comprising hydrogen plasma particles is generated from the gas. A passivation layer is deposited on a first mask layer on a second mask layer over a substrate using the hydrogen plasma particles.
Applied Materials, Inc.
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Jun-Wan Hoon Sang Byungkook Hung Sang Jeong Hyun
Kim Lee Kong Kim Yoo