Baker & Hostetler, LLP
Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same
A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).
Korea Research Institute of Chemical Technology
C
C07C
inventional
Kiwhan Chang-Gyoun Sun-Sook Ki-Seok Yunsoo Young-Kuk Taek-Mo Seung-Ho
Sung Kim Lee An Kim Lee Chung Yoo