Ditthavong & Steiner, P.C.
Two pass MRAM dummy solution
Methods of fabricating a flexible dummy fill to increase MTJ density are provided. Embodiments include forming a first oxide layer; forming lower interconnect layers in the first oxide layer; forming a nitride layer over the first oxide layer and the lower interconnect layers; forming a second oxide layer over the nitride layer; forming bottom electrodes through the second oxide layer and the nitride layer contacting a portion of an upper surface of the lower interconnect layers; forming MTJ structures over the bottom electrodes; forming top electrodes over the MTJ structures; and forming upper interconnect layers over one or more of the top electrodes.
GLOBALFOUNDRIES SINGAPORE PTE. LTD.
H
H01L
inventional
Curtis Chun-I Mahesh Wanbing Neha Juan Boon Wenjun
Hsieh Bhatkar Yi Nayyar Tan Liu