ScienBiziP, P.C.
Sputtering target and method for making the same
A sputtering target includes an indium cerium zinc oxide represented by In2CexZnO4+2x, wherein x=0.5˜2. A method for making a sputtering target includes steps of: mixing indium oxide (In2O3) powder, cerium oxide (CeO2) powder, and zinc oxide (ZnO) powder to form a mixture, a molar ratio of indium (In), cerium (Ce), and zinc (Zn) as In:Ce:Zn in the mixture is 2:(0.5 to 2):1; and sintering the mixture at a temperature in a range from about 1250° C. to about 1650° C.
Tsinghua University HON HAI PRECISION INDUSTRY CO., LTD.
C H C H H H B
C23C H01J C23C H01J H01J H01J B28B
inventional additional inventional additional additional additional inventional
Da-Ming Xiao-Long Shi-Lu Li Ming-Jie Ming
Zhuang Li Zhan Guo Cao Zhao