Haynes and Boone, LLP
Humidity control in EUV lithography
A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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An-Ren Joy Chin-Hsiang Ching-Yu
Zi Cheng Lin Chang