McDermott Will & Emery LLP
Slurry feed system and method of providing slurry to chemical mechanical planarization station
Disclosed herein is a method of providing slurry to a chemical mechanical planarization (CMP) station. The method includes the operations of: mixing slurry, water and a chemical to form dilute slurry; measuring a surface tension of the dilute slurry; supplying the dilute slurry to a CMP station through piping; and modulating a flow rate of the dilute slurry in the piping in accordance with the measured surface tension.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
B B
B24B B24B
inventional inventional
Wei-Cheng Chi-Tung Tsung-Huang Yung-Ti
Li Lai Chen Hung