Servilla Whitney LLC
Method for metal deposition using hydrogen plasma
Methods for formation and treatment of pure metal layers using CVD and ALD techniques are provided. In one or more embodiments, the method includes forming a metal precursor layer and treating the metal precursor layer to a hydrogen plasma to reduce the metal precursor layer to form a metal layer. In one or more embodiments, treating the metal precursor layer includes exposing the metal precursor layer to a high frequency-generated hydrogen plasma. Methods of preventing a hydrogen plasma from penetrating a metal precursor layer are also provided.
Applied Materials, Inc.
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Anantha K. John C. Michael S. Wei W. Xinliang Yu Seshadri Xinyu
Subramani Forster Jackson Wang Lu Lei Ganguli Fu