Lee & Morse, P.C.
Rinse solution and method of fabricating integrated circuit device by using the same
A rinse solution includes a surfactant and deionized water. The surfactant includes a compound having a branched structure, the compound having a branched structure including a hydrophobic group-containing main chain and a plurality of side chains that are branched from the main chain and have at least one hydrophilic functional group. A method of fabricating an integrated circuit device includes forming a photoresist pattern, followed by applying the rinse solution onto the photoresist pattern.
Samsung Electronics Co., Ltd.
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Hai-sub Jin Jeong-ju Ju-young
Na Park Park Kim