McCormick, Paulding & Huber LLP
Etch resistant alumina based coatings
Method of forming a protective hard mask layer on a substrate in a semiconductor etch process, comprising the step of applying by solution deposition on the substrate a solution or colloidal dispersion of an alumina polymer, said solution or dispersion being obtained by hydrolysis and condensation of monomers of at least one aluminium oxide precursor in a solvent or a solvent mixture in the presence of water and a catalyst. The invention can be used for making a hard mask in a TSV process to form a high aspect ratio via a structure on a semiconductor substrate.
PIBOND OY
H G H H H G H H G G H G C
H01L G03F H01L H01L H01L G03F H01L H01L G03F G03F H01L G03F C23C
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William Juha T. Wei-Min Thomas David A.
McLaughlin Rantala Li Gadda Thomas