Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Method and system for drying a substrate
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion liquid with the baking process. This interaction has been shown to cause non-uniformity in critical dimension for the pattern formed in the thin film following the developing process.
Tokyo Electron Limited
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G03F G03F
inventional additional
Chung-Peng Kathleen Kaz Richard
Ho Nafus Yoshioka Yamaguchi