Moser, Patterson & Sheridan, NJ.
Method and apparatus for controlling etch processes during fabrication of semiconductor devices
A method for controlling etch processes during fabrication of semiconductor devices comprises tests and measurements performed on non-product and product substrates to define an N-parameter CD control graph that is used to calculate a process time for trimming a patterned mask to a pre-determined width. An apparatus for performing such a method.
Applied Materials, Inc.
H G H H
H01L G03F H01L H01L
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Wei Hiroki David S L
Liu Sasano Mui