WPAT, P.C., Intellectual Property Attorneys
Polishing pad, polishing apparatus and method for manufacturing polishing pad
The present invention relates to a polishing pad comprising a base sheet containing a restriction layer. The invention also relates to a polishing apparatus and a method for manufacturing a polishing pad.
San Fang Chemical Industry Co., Ltd.
B B B B
B24D B24B B24D B24B
inventional inventional inventional inventional
Wei-Te Yung-Chang Chun-Ta Chung-Chih I-Peng
Liu Hung Wang Feng Yao