McDermott Will & Emery LLP
Photoresist composition and method of forming photoresist pattern
A method of forming a photoresist pattern includes forming a protective layer over a photoresist layer formed on a substrate, and selectively exposing the protective layer and the photoresist layer to actinic radiation. The protective layer and the photoresist layer are developed to form a pattern in the photoresist layer, and the protective layer is removed. The protective layer includes a polymer having pendant fluorocarbon groups and pendant acid leaving groups.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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Ching-Yu Chin-Hsiang An-Ren
Chang Lin Zi