Haynes and Boone, LLP
Method of forming a semiconductor structure
A method of forming a semiconductor structure includes depositing a first electrode material over a conductive structure and a dielectric layer, patterning the first electrode material to form a first electrode contacting the conductive structure, depositing a resistance variable layer over the first electrode and the dielectric layer, depositing a second electrode material over the resistance variable layer, and etching a portion of the second electrode material and the resistance variable layer to form a second electrode over a remaining portion of the resistance variable layer.
Taiwan Semiconductor Manufacturing Company
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Hsia-Wei Wen-Ting Kuo-Chi Chih-Yang Chin-Chieh Yu-Wen
Chen Chu Tu Chang Yang Liao