Sterne, Kessler, Goldstein & Fox P.L.L.C.
Polarizers for image sensor devices
The present disclosure is directed to a method of forming a polarization grating structure (e.g., polarizer) as part of a grid structure of a back side illuminated image sensor device. For example, the method includes forming a layer stack over a semiconductor layer with radiation-sensing regions. Further, the method includes forming grating elements of one or more polarization grating structures within a grid structure, where forming the grating elements includes (i) etching the layer stack to form the grid structure and (ii) etching the layer stack to form grating elements oriented to a polarization angle.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chun-Hao Yun-Wei Kuo-Cheng
Chou Cheng Lee