Haynes and Boone, LLP
Method of planarizating film
A method of fabricating a semiconductor device is disclosed. The method includes forming a flowable-material (FM) layer over a substrate. The substrate has a first region and a second region. A top surface of the FM layer in the first region is higher than a top surface of the FM layer in the second region. The method also includes forming a plurality of trenches in the FM layer in the first region and performing annealing process to reflow the FM layer, wherein the plurality of trenches are filled with the FM layer.
Taiwan Semiconductor Manufacturing Co., Ltd.
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inventional inventional inventional inventional
Chi-Kang Ying-Hao Kuei-Shun Yu-Lun Shih-Chi Chloe
Chang Su Chen Liu Fu Hsu