Fleshner & Kim, LLP
Semiconductor device mask and method for forming the same
 A semiconductor device mask and a method for forming the same is provided in which a mask pattern defines dummy active regions in isolating regions. The semiconductor device mask and method reduce surface unevenness and prevent damage to an active region, which have been problems in isolating devices by trenches. The semiconductor device mask includes real active pattern regions formed in regions defined as the active regions in a mask having an isolating region and the active regions. A plurality of dummy active pattern regions preferably spaced at fixed intervals from one another surrounding relatively isolated active regions and excluding gate pattern forming regions. The gate pattern forming regions are preferably formed extending in one direction across the isolating region and the real active pattern regions. 
Hyundai Electronics Industries Co., Ltd.
H H Y
H01L H01L Y10S
inventional inventional additional
Seung Ho
Lee