Fenwick & West LLP
TiN-based film and TiN-based film forming method
A TiN-based film includes TiON films having an oxygen content of 50% or above and TiN films which are laminated alternately on a substrate. In a TiN-based film forming method, a TiON film having an oxygen content of 50 at % or above and a TiN film are alternately formed on a substrate.
TOKYO ELECTRON LIMITED
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Seokhyoung Masaki Masaki Tadahiro
Hong Sano Koizumi Ishizaka