Wenderoth, Lind & Ponack, L.L.P.
Method for depositing layer
A method for depositing a layer includes repeatedly performing a unit deposition process until the layer on a deposition target reaches a predetermined thickness. The unit deposition process includes (A) placing the deposition target in a chamber, (B) providing a non-oxidizing gas atmosphere or a vacuum atmosphere in the chamber, (C) depositing the layer on the deposition target by a cold spray process in the non-oxidizing gas atmosphere or the vacuum atmosphere, and (D) heat treating the deposition target after the depositing.
MITSUBISHI HEAVY INDUSTRIES, LTD.
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Noriyuki Makoto Akira
Hiramatsu Saito Fukushima