One LLP
Use of photosensitized Epon epoxy resin 1002F for MEMS and bioMEMS applications
Systems and methods directed to the use 1002F to build microdevices and biomedical devices. Through the addition of a photosensitizing agent, Epon epoxy resin 1002F can be linked in the presence of UV light, making it useful as a photoresist or as a micropatternable structural material. One embodiment comprises combining 1002F monomer resin with a solvent and a photoinitiator, placing the monomer solution on a surface, exposing the monomer solution to UV light through a mask to initiate linking, and stripping the unlinked polymer away. In another embodiment, 3-D structures are built using two or more layers of sensitized monomer films, each having different sensitivity to light, and the use of a mask containing opaque and semi-opaque regions.
The Regents of the University of California
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Christopher E. Jeng-Hao Yuli Guann-Pyng Mark Nancy
Sims Pai Wang Li Bachman Allbritton