Leydig, Voit & Mayer
Substrate support and semiconductor manufacturing apparatus
A substrate support for supporting a substrate when forming a film on a surface of the substrate by chemical vapor deposition. The substrate support includes a graphite material having a recessed portion for accommodating the substrate, a multilayer film on the recessed portion and consisting of a first degassing prevention film of SiC and a sublimation prevention film of TaC or HfC stacked together, and a second degassing prevention film of SiC located on portions of the graphite material other than the recessed portion.
Mitsubishi Electric Corporation
H H
H01L H01L
inventional inventional
Akihito Zempei
Ohno Kawazu