Morrison & Foerster LLP
Parallel profile determination in optical metrology
In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
Tokyo Electron, Ltd.
G G G G G
G01N G03F G01N G01B G01N
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Pranav Jeffrey Alexander Tri Thanh Hong Sachin Junwei Ying Wei
Sheth Chard Khuong Qiu Deshpande Bao Zhu Liu