Harness, Dickey & Pierce, P.L.C.
Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
An exposure method may include: radiating a charged particle beam in an exposure system comprising a beam generator, radiating the beam, and main and auxiliary deflectors deflecting the beam to determine a position of a beam shot; determining whether a deflection distance from a first position of a latest radiated beam shot to a second position of a subsequent beam shot is within a first distance in a main field area of an exposure target area, the main field area having a size determined by the main deflector; setting a settling time according to the deflection distance so that a settling time of the subsequent beam shot is set to a constant minimum value, greater than zero, when the deflection distance from the first position to the second position is within the first distance; and deflecting the beam using the main deflector based on the set settling time.
Samsung Electronics Co., Ltd.
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Yong-Seok Jin Sang-Hee In-Kyun Shuichi In-Hwan
Jung Choi Lee Shin Tamamushi Noh