Beyer Weaver & Thomas, LLP
Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications
Process for stripping photoresist from a semiconductor wafer formed with at least one layer of OSG dielectric. The stripping process may be formed in situ or ex situ with respect to other integrated circuit fabrication processes. The process includes a reaction may be oxidative or reductive in nature. The oxidative reaction utilizes an oxygen plasma. The reductive reaction utilizes an ammonia plasma. The process of the present invention results in faster ash rates with less damage to the OSG dielectric than previously known stripping methods.
Lam Research Corporation
G H
G03F H01L
inventional inventional
Ian J. Rao V. Chok W.
Morey Annapragada Ho