Developer compositions and methods of forming photolithographic patterns
Provided are photoresist developer compositions that include a mixture of organic solvents. Also provided are methods of forming photolithographic patterns using negative tone development, coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.
Rohm and Haas Electronic Materials LLC
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inventional additional inventional inventional
Young Cheol Seung-Hyun
Bae Lee