Millen, White, Zelano & Branigan, P.C.
Resist composition and patterning process
A ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate having a Mw of 1,000-500,000 is blended as a base resin to formulate a chemically amplified, positive resist composition which has advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution, a satisfactory pattern profile after exposure, high etching resistance, and process adaptability.
Shin-Etsu Chemical Co., Ltd.
C G Y Y Y
C08F G03F Y10S Y10S Y10S
additional inventional additional additional additional
Wataru Kazunori Shigehiro Osamu Kazuhiro Takanobu
Kusaki Maeda Nagura Watanabe Hirahara Takeda