Birch, Stewart, Kolasch & Birch
Vapor deposition apparatus for using solid starting materials
 A vapor deposition apparatus for depositing thin film on substrates in which solid starting materials are used. In this apparatus, a carrier gas flows up and down in the same direction as gas convection, such that the effect of gas convection is minimized and film thickness and impurity concentration are uniform over the substrate surface. This uniformity is achieved by orienting a main reaction tube in a vertical direction, attaching two branch reaction tubes at the top of the main reaction tube, and venting carrier gas out the bottom of the main reaction tube. Alternately, the main reaction tube can be oriented horizontally, with the substrates being carried on a holder within a container having pores on its top and bottom. 
Sharp Kabushiki Kaisha
C C
C23C C23C
inventional inventional
Takuo Akiyoshi Takashi Shigeo Koichi Kousuke Kouji Hiroaki Masaru Katsushi
Yamashita Mikami Ogura Nakajima Tanaka Terada Taniguchi Nakaya Yoshida Okibayashi