Fitzpatrick Cella Harper & Scinto
Deposited film forming apparatus
 A method of quickly depositing a non-single-crystal semiconductor film and forming a silicon-type non-single-crystal photovoltaic device, and a method of continuously manufacturing the photovoltaic devices. By this method the deposited film is formed by decomposing a raw material gas with microwave energy which is lower than the microwave energy required to completely decompose the raw material gas. RF energy is applied at the same time which is higher in energy than the microwave energy. The microwave energy acts on the raw material gas at an internal pressure level of 50 mTorr or lower to form a uniform non-single-crystal semiconductor film with excellent electrical characteristics and reduced light deterioration. 
Canon Kabushiki Kaisha
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Masafumi Toshimitsu Yuzou Ryou Masahiko Jinsho Tatsuyuki Keishi Mitsuyuki
Sano Kariya Kouda Hayashi Tonogaki Matsuyama Aoike Saitoh Niwa