Snell & Wilmer L.L.P.
Cyclical deposition method including treatment step and apparatus for same
A method and apparatus for depositing a material on a surface of a substrate are disclosed. The method can include a treatment step to suppress a rate of material deposition on the surface of the substrate. The method can result in higher-quality deposited material. Additionally or alternatively, the method can be used to fill a recess within the surface of the substrate with reduced or no seam formation.
ASM IP Holding B.V.
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KiKang SeongRyeong SeungHwan JongHyun HakYong SungBae
Kim Kim Lee Ahn Kwon Kim