Fish & Richardson P.C.
Projection objective for lithography
In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
Carl Zeiss SMT GmbH
G G G G
G02B G03F G03F G02B
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Susanne Heiko Aurelian Alexander Hans-Juergen
Beder Feldmann Dodoc Epple Rostalski