Summa, Additon & Ashe, P.A.
Photosensitive resin composition and light blocking layer using the same
Disclosed are a photosensitive resin composition and a light blocking layer using the same. The photosensitive resin composition includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the detailed description, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent.
Cheil Industries Inc.
G G G G
G03F G03F G02B G03F
inventional inventional additional inventional
Kil-Sung Chang-Min Jun-Seok Min-Sung
Lee Lee Kim Kim