Haynes and Boone, LLP
Advance ridge structure for microlens gapless approach
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of patterned photoresist features each disposed within one of the plurality of openings. The plurality of patterned photoresist features can then be reflowed inside the grid.
Taiwan Semiconductor Manufacturing Company, Ltd.
H G B H
H01L G02B B29D H01L
inventional inventional inventional inventional
Fu-Tien Chih-Kung Chin Chen Bii-Junq Jack
Weng Chang Kuo Chang Deng