Birch, Stewart, Kolasch & Birch, LLP
Resist composition and patterning process
A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing an organic group having a hydroxyl group and having at least 3 fluorine atoms, in total, on a proximate carbon atom, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively. The resist composition has satisfactory resolution and overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.
Shin-Etsu Chemical Co., Ltd.
G Y G
G03F Y10S G03F
inventional additional additional
Mutsuo Katsuya Toshihiko Kazumi Yoshitaka
Nakashima Takemura Fujii Noda Hamada