Harness, Dickey & Pierce, P.L.C.
Pellicle for extreme ultraviolet lithography and method of manufacturing the same
A pellicle for extreme ultraviolet lithography and a method of manufacturing the pellicle for extreme ultraviolet lithography are provided. The pellicle for extreme ultraviolet lithography includes a pellicle layer having a specific (or, alternatively, predetermined) thickness, a frame on an edge area of the pellicle layer and supporting the pellicle layer, and a boron implantation layer located between the pellicle layer and the frame. The boron implantation layer is spaced by a specific (or, alternatively, predetermined) distance inward from an outer periphery of the pellicle layer.
Samsung Electronics Co., Ltd.
G G
G03F G03F
inventional inventional
Seungwon Minsu Dongwook Hyeonjin
Lee Seol Lee Shin