Surface flaw modification for strengthening of glass articles
Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na2O, K2O and Li2O.
CORNING INCORPORATED
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H01L H01L H01L C09K C03C G02F
inventional inventional inventional additional inventional inventional
Jeanne Spadinger Gregory Scott Daniel Arthur Jum Sik Toshihiko Sean Matthew Jun Donald A.
Cavuoti Glaesemann Sternquist Kim Ono Garner Hou Clark