Haynes Beffel & Wolfeld LLP
Method for manufacturing a narrow structure on an integrated circuit
A method of manufacturing for providing a narrow line, such as a phase change bridge, on a substrate having a top surface, includes first forming a layer of first material on the substrate. Then, a layer of a pattern material is applied on the layer of first material, and a pattern is defined. The pattern includes a ledge having a sidewall extending substantially to the layer of first material. A sidewall etch mask is formed on the ledge, and used to define a line of the first material on the substrate having a width substantially determined by the width of the sidewall etch mask.
Macronix International Co., Ltd.
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Chieh Fang Chiahua Shih Hung Hsiang Lan
Chen Ho Chen Lung