WPAT, PC
Method of monitoring processing system for processing substrate
A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
UNITED MICROELECTRONICS CORP.
G
G05B
inventional
Ming-Tung Feng-Chi Li-Ting Yung-Yu Lian-Hua Chiu-Ping Ching-Hsing Chia-Chi Meng-Chih
Wang Chung Lin Yang Shih Chang Hsieh Chang Chang