Haynes and Boone, LLP
System and method of vapor deposition
Provided is a method and system for vapor deposition of a coating material onto a semiconductor substrate. In an embodiment, photoresist is deposited. An in-situ baking process may be performed with the vapor deposition. In an embodiment, a ratio of chemical components of a material to be deposited onto the substrate is changed during the deposition. Therefore, a layer having a gradient chemical component distribution may be provided. In an embodiment, a BARC layer may be provided which includes a gradient chemical component distribution providing an n,k distribution through the layer. Other materials that may be vapor deposited include pattern freezing material.
Aiwan Semiconductor Manufacturing Company, Ltd.
B H G H B
B05D H01L G03F H01L B05D
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David Ding-Chung Chien-Wei Ching-Yu
Lu Wang Chang