Patterson & Sheridan, L.L.P.
Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
Applied Materials, Inc.
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H01L C23C C23C H01L Y10T C23C
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Jeffrey Ronald Satheesh Herman Kailash Kiran Xiaowei Zouming David Keith Howard Brian Hayes Errol Antonio
Campbell Kuppurao Diniz Patalay Li Zhu Carlson Beckford Burrows Sanchez