Smith, Gambrell & Russell, LLP
Substrate carrying apparatus and substrate carrying method
A substrate processing apparatus, adapted to provide a process, such as etching, to a substrate, includes a processing vessel, an ambient atmospheric carrying chamber, a carrying member for carrying the substrate, and a functional module located on a carrying route of the substrate. A first air stream is provided in the ambient atmospheric carrying chamber, and a second air stream is provided in the functional module so as to create a stream of air directed toward the ambient atmospheric carrying chamber from the functional module so as to prevent by-products of the process provided to the substrate from entering the functional module.
Tokyo Electron Limited
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H01L H01L H01L
inventional inventional inventional
Shinji
Wakabayashi