Hauptman Ham, LLP
Region based shrinking methodology for integrated circuit layout migration
A method of modifying an integrated circuit (IC) design layout is provided. The method includes receiving a first IC design layout having first gate layout patterns and first interconnect layout patterns. Second gate layout patterns for a second IC design layout are then obtained from the first gate layout patterns according to a set of design rules associated with a technology node different from that of the first IC design layout. After determining scaling factors for the first IC design layout based on the first gate layout patterns and the second gate layout patterns such that each scaling factor corresponds to one of at least one shrinkable region and at least one non-shrinkable region in the first IC design layout, the first interconnect layout patterns are adjusted using the scaling factors to determine second interconnect layout patterns for the second IC design layout.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
G G
G06F G06F
inventional inventional
Chi-Wen Jui-Feng
Chang Kuan