Slater & Matsil, L.L.P.
Photoresist defect reduction system and method
A system and method for reducing defects in photoresist processing is provided. An embodiment comprises cleaning the photoresist after development using an alkaline environment. The alkaline environment may comprise a neutral solvent and an alkaline developer. The alkaline environment will modify the attraction between residue leftover from development and a surface of the photoresist such that the surfaces repel each other, making the removal of the residue easier. By removing more residue, there will be fewer defects in the photolithographic process.
Taiwan Semiconductor Manufacturing Company, Ltd.
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inventional inventional inventional
Ching-Yu Wen-Yun
Chang Wang