Oblon, McClelland, Maier & Neustadt, L.L.P.
Processing apparatus and collimator
A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.
Kabushiki Kaisha Toshiba
H C C H H H
H01L C23C C23C H01J H01J H01J
additional inventional inventional inventional inventional additional
Yoshinori Masakatsu Shiguma Yasuhiro Takahiro
Tokuda Takeuchi Kato Aoyama Terada