Myers Bigel, P.A.
Process chamber and substrate processing apparatus including the same
A process chamber and a substrate processing apparatus including the same are disclosed. The process chamber includes a first housing and a second housing on the first housing. The first housing includes a first outer wall, a first partition wall facing the first outer wall, and a first side wall connecting the first outer wall and the first partition wall. The second housing includes a second outer wall, a second partition wall between the second outer wall and the first partition wall, and a second side wall connecting the second outer wall and the second partition wall. Each of the first and second outer walls has a thickness greater than a thickness of the first partition wall and a thickness of the second partition wall.
Samsung Electronics Co., Ltd.
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inventional inventional inventional inventional inventional inventional
Jihoon Young-Hoo Yong-Jhin Hyosan Kuntack Yungjun Jung-Min
Jeong Kim Cho Lee Lee Kim Oh