Fish & Richardson P.C.
Physical vapor deposition with phase shift
A method of physical vapor deposition includes applying a first radio frequency signal having a first phase to a cathode in a physical vapor deposition apparatus, wherein the cathode includes a sputtering target, applying a second radio frequency signal having a second phase to a chuck in the physical vapor deposition apparatus, wherein the chuck supports a substrate, and wherein a difference between the first and second phases creates a positive self bias direct current voltage on the substrate, and depositing a material from the sputtering target onto the substrate.
FUJIFILM Corporation
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H01J C23C H01J H01J
inventional inventional inventional inventional
Yoshikazu Takamichi Youming Jeffrey Takayuki
Hishinuma Fujii Li Birkmeyer Naono