Volentine & Whitt, PLLC
Semiconductor device and method of manufacturing the same by using atomic layer deposition
A method of manufacturing a semiconductor device by using atomic layer deposition includes depositing a silicon atomic layer film on a semiconductor substrate. The method may also include forming an epitaxial silicon film on the silicon atomic layer film by using the silicon atomic layer film as a seed layer.
Samsung Electronics Co., Ltd.
C H H H H H C C H
C30B H01L H01L H01L H01L H01L C30B C30B H01L
inventional inventional inventional inventional inventional inventional inventional inventional inventional
Jun-Seuck
Kim