Kenyon & Kenyon
Electron beam exposure apparatus exposing method using an electron beam
In order to provide an electron beam exposure apparatus and an exposing method using an electron beam that realizes highly precise pattern exposure, an axis difference generated by the variable shaping operation, transcription distortion or location difference in the dimensional change of said beam is prevented by measuring an axis difference to high accuracy and by adjusting a shaping lens when an adjusting parameter or a shaping aperture of a lens is changed and beam dimension is changed. Thereby, a beam adjusting method which is capable of achieving high resolution of the electron beam exposure apparatus of a variable shaping type can be offered.
Hitachi, Ltd.
H H B B H
H01J H01J B82Y B82Y H01J
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Hiroyuki
Ito