F. Chau & Associates, LLC
Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same
A method of forming a thin film is provided. The method includes introducing an organometallic compound represented by the following formula onto a substrate;
Samsung Electronics Co., Ltd.
H H C H H H H C H H
H01L H01L C23C H01L H01L H01L H01L C23C H01L H01L
additional inventional inventional additional inventional inventional additional inventional inventional additional
Jung-Sik Sang-Mun Jun-Hyun Jung-Ho
Choi Chon Cho Lee