Antonelli, Terry, Stout & Kraus, LLP
Optical apparatus for defect and particle size inspection
The present invention provides a defect inspecting apparatus and a defect inspection method for inspecting an object of inspection for a defect such as a foreign particle existing on the object wherein, by using a high-efficiency illumination optical system for radiating an illumination beam to the object of inspection from a direction to reduce the intensity of a scattered light generated by a pattern on the object of inspection, it is possible to decrease the intensity of the scattered light from the pattern which causes a variation of a signal and, in addition, by using a means for setting a detection threshold value based on a variation of a signal computed for each area in a chip on the object of inspection, the detection threshold value can be made small and, thus, the sensitivity as well as the throughput can be raised.
Hitachi, Ltd. Hitachi Electronics Engineering Co., Ltd.
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Tetsuya Hisato Yoshimasa Hidetoshi Shuichi Minori Shunichi Yoshio Ryouji Takahiro Yukio Takanori Keiji
Watanabe Nakamura Ohshima Nishiyama Chikamatsu Noguchi Matsumoto Morishige Matsunaga Jingu Kembo Ninomiya Sakai