Haynes and Boone, LLP
Systems and associated methods for tuning processing tools
The present disclosure provides various methods for tuning process parameters of a process tool, including systems for implementing such tuning. An exemplary method for tuning process parameters of a process tool such that the wafers processed by the process tool exhibit desired process monitor items includes defining behavior constraint criteria and sensitivity adjustment criteria; generating a set of possible tool tuning process parameter combinations using process monitor item data associated with wafers processed by the process tool, sensitivity data associated with a sensitivity of the process monitor items to each process parameter, the behavior constraint criteria, and the sensitivity adjustment criteria; generating a set of optimal tool tuning process parameter combinations from the set of possible tool tuning process parameter combinations; and configuring the process tool according to one of the optimal tool tuning process parameter combinations.
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
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G05B G05B
inventional inventional
Jong-I Sunny Chia-Tong Po-Feng Jo Fei Chin-Hsiang
Mou Wu Ho Tsai Wang Lin