Morgan, Lewis & Bockius LLP
Structure including electroconductive pattern regions, method for producing same, stack, method for producing same, and copper wiring
Provided is a structure that has highly reliable electroconductive pattern regions, that offers an extremely simple manufacturing process, and that has excellent electrical insulation between the electroconductive pattern regions. This structure (10) having electroconductive pattern regions is provided with a support (11), and, on a surface configured by the support, a layer (14) in which insulation regions (12) containing a copper oxide- and phosphorus-containing organic substance and electroconductive pattern regions (13) containing copper are disposed next to one another. This stack is provided with: a support, a coating layer containing copper oxide and phosphorus and disposed on a surface configured by the support; and a resin layer disposed so as to cover the coating layer.
Asahi Kasei Kabushiki Kaisha
H H B H H H H H H H H H H
H05K H05K B32B H05K H05K H05K H05K H05K H05K H05K H05K H01B H05K
inventional additional inventional inventional inventional inventional inventional inventional additional additional additional inventional additional
Masanori Masato Toru
Tsuruta Saito Yumoto