Green, Howard & Mughal LLP
Method for fabricating transistor with thinned channel
A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.
Intel Corporation
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Brian S. Amlan Matthew V. Marko Robert S. Jack T. Mark L. Suman Justin K.
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