Lowe Hauptman Gilman & Berner LLP
Method of enhancing photoresist anti-etching ability
A method of enhancing photoresist anti-etching ability, at least includes follows. Provide a substrate, form a photoresist with a pattern on the substrate, put both photoresist and substrate in a low pressure environment, and treat photoresist by an electron beam to let at least part of photoresist is hardened. This method usually is performed before etch process, but the method also could be modified as follows. Expose photoresist by an electron beam while an etching process being performed, or alternately expose photoresist by an electron beam and perform an etch process.
Macronix International Co., Ltd.
Y G
Y10S G03F
additional inventional
Ching-Yu
Chang