Slater & Matsil, L.L.P.
Photo resist baking in lithography process
A method includes coating a photo resist on a wafer in a first production tool, and performing a pre-exposure baking on the photo resist in a second production tool separate from the first production tool. After the pre-exposure baking, the photo resist is exposed using a lithography mask. After the step of exposing the photo resist, a post-exposure baking is performed on the photo resist. The photo resist is then developed.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G
G03F G03F
inventional inventional
Ching-Yu
Chang