Westerman, Hattori, Daniels & Adrian, LLP.
Resist undercoat-forming material and patterning process
In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The undercoat-forming material has a high transparency and optimum values of n and k so that it functions as an antireflective coating during short-wavelength exposure, and has etching resistance during substrate processing by etching.
Shin-Etsu Chemical Co., Ltd.
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G03F G03F
inventional inventional
Toshihiko Jun
Fujii Hatakeyama