Millen,White, Zelano & Branigan, P.C.
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
 A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .ident.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution. 
Shin-Etsu Chemical, Co., Ltd.
C C G G C Y
C08F C08F G03F G03F C08F Y10S
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Tomoyoshi Tsuguo Yoshihumi Toshinobu Shigehiro Osamu Satoshi
Furihata Yamaoka Takeda Ishihara Nagura Watanabe Watanabe