Adams & Wilks
Composite focused ion beam device, process observation method using the same, and processing method
A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
SII NanoTechnology Inc.
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Junichi Kazuo Takashi Yoshitomo Toshiaki Takashi Yasuhiko
Tashiro Aita Ogawa Nakagawa Fujii Kaito Sugiyama