Young & Thompson
Method of electron-beam exposure and mask and electron-beam exposure system used therein
An electron-beam exposure method of segmented mask-pattern transfer type wherein a prescribed pattern is segmented into a plurality of divisions so as to form a segmented pattern in every division and exposure is made through every division one after another, so that the projection of the whole of the prescribed pattern is accomplished. The method includes the steps of carrying out the exposure through every division and transcribing a segmented pattern thereon one after another. The method also includes the steps of carrying out the correction exposure for every projection region of the segmented patterns one after another with a defocused beam of the inverse pattern of the respective segmented patterns, and thereby the proximity effect caused by the pattern exposure is corrected.
NEC Electronics Corporation
G B G G H H H H B
G03F B82Y G01N G03F H01J H01J H01J H01J B82Y
inventional inventional inventional additional additional inventional additional inventional inventional
Hiroshi Hideo
Yamashita Kobinata