WPAT, PC
Method for manufacturing silicon nitride layer and method for manufacturing semiconductor structure applying the same
A method for manufacturing a silicon nitride layer and a method for manufacturing a semiconductor structure applying the same are provided. The method for manufacturing a silicon nitride layer includes forming the silicon nitride layer and stressing the silicon nitride layer by a high density plasma chemical vapor deposition (HDPCVD) treatment.
UNITED MICROELECTRONICS CORP.
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Wei-Hsin Tzu-Chin
Liu Wu