Haynes and Boone, LLP
Semiconductor device with an interconnect structure and method for forming the same
A method for forming a semiconductor device structure includes providing a substrate and forming a gate electrode on the substrate. A first contact structure is formed in and on the gate electrode. The first contact structure comprises a first portion and a second portion. The first portion is formed in the gate electrode, and the second portion is formed on the first portion.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chih-Hung Chia-Der Wei-Chin Guo-Chiang
Lu Chang Chen Chi