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Semiconductor silicon-germanium thin film preparation method
A semiconductor silicon-germanium thin film preparation method, comprising the following steps: cleaning a mono-crystalline silicon substrate and then disposing the same on a substrate table; respectively sputtering a silicon single thin film and a germanium single thin film; depositing a silicon-germanium alloy thin film having different components on another single crystal silicon substrate using a co-sputtering method, measuring the thickness of the deposited thin film, and obtaining a silicon-germanium alloy thin film having different component ratios.
NINGBO CRRC TIMES TRANSDUCER TECHNOLOGY CO., LTD.
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Huaxiong Fei Juping Xiaowei Junjie Liangguang Dacheng
Zheng Wang Li Hou Guo Zheng Ni