Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting method
According to one embodiment, a flow rate adjusting unit is disposed on a gas passageway and includes a valve that adjusts the flow rate of a gas and an actuator that controls the displacement amount of the valve. A displacement amount storage unit stores displacement amount information in which a displacement amount of the valve, used when a gas flows into the gas passageway at a flow rate defined according to a process procedure before performing the process procedure, is obtained in advance for each process procedure. A setting circuit acquires the displacement amount corresponding to the process procedure from the displacement amount storage unit, and controls the actuator on the basis of the acquired displacement amount.
Kabushiki Kaisha Toshiba
G Y Y Y Y Y
G05D Y10T Y10T Y10T Y10T Y10T
inventional additional additional additional additional additional
Hideo Nobuyasu Makoto
Eto Nishiyama Saito