Method and apparatus for polishing and planarization
This invention pertains to methods and apparatus for polishing and planarization of workpieces, such as fiber optics connectors, metallographic samples, semiconductor wafers, microelectronic substrate, optical devices and the like. The polishing pattern is a hypotrochoid generated by a spur gear rotating inside of an internal gear. The hypotrochoid is a superior polishing pattern because it not only provides a pattern similar to a figure eight pattern for producing optimal polishing conditions, but it also appears to precess around the center of the polishing space and maximize the utilization of the polishing pad or film.
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Wei-Min
Wang