Posz Law Group, PLC
Method of making a mask, method of patterning by using this mask and method of manufacturing a micro-device
The present invention relates to a method of making a mask for patterning a thin film. The method includes a step of forming an inorganic material, which is resolvable into alkali solution, on a substrate; a step of forming the inorganic material in a predetermined pattern; and a step of narrowing the inorganic material with the alkali solution to form the mask.
TDK Corporation
G
G11B
inventional
Hiromichi Tetsuji Hisayoshi Takayasu Masashi Takayuki Hideyuki
Umehara Hori Watanabe Kanaya Sano Nishizawa Yatsu