Duane Morris LLP
Semiconductor structure including silicide regions and method of making same
A method of forming a silicided gate on a substrate having active regions, comprising the steps of: forming a first silicide in the active regions from a first material; and forming a second silicide in the gate from a second material, wherein the first silicide forms a barrier against the second material forming a silicide in the active regions during the second silicide forming step, wherein said second silicide is thicker than said first silicide.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chii-Ming Cheng-Tung Shau-Lin Chih-Wei Mei-Yun
Wu Lin Shue Chang Wang