Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Method and apparatus for the preparation of clean gases
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
Ebara Research Co., Ltd.
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Hidetomo Toshiaki Tsukuru Kazuhiko
Suzuki Fujii Suzuki Sakamoto