Fish & Richardson P.C.
Selection of polishing parameters to generate removal or pressure profile
Values are selected for a plurality of controllable parameters of a chemical mechanical polishing system that includes a carrier head with a plurality of zones to apply independently controllable pressures on a substrate. Data is stored relating variation in removal profile on a front surface of the substrate to variation in the controllable parameters, the data including removal at a plurality of positions on the front surface of the substrate, there being a greater number of positions than chambers. A value is determined for each parameter of the plurality of controllable parameters to minimize a difference between a target removal profile and an expected removal profile calculated from the data relating variation in removal profile on a front surface of the substrate to variation in the parameters. The value for each parameter of the plurality of controllable parameters is stored.
Applied Materials, Inc.
G B B G G
G05D B24B B24B G05B G05B
inventional inventional inventional inventional additional
Huanbo Nathan Qing Garrett Ho Yee King Yi
Zhang Bohannon Zhang Sin Heung