Haynes and Boone, LLP
Method and composition of a dual sensitive resist
The present disclosure provides a sensitive material. The sensitive material includes a polymer that turns soluble to a base solution in response to reaction with acid; a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; and a thermal sensitive component that generates acid in response to thermal energy.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chen-Hau Ching-Yu
Wu Chang