Resist compositions with polymers having pendant groups containing plural acid labile moieties
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a monomer with a pendant group containing plural acid labile moieties. Preferred pendant groups containing plural acid labile moieties are characterized by the presence of a bulky end group.
International Business Machines Corporation
G G Y
G03F G03F Y10S
inventional inventional additional
Margaret C. Wenjie Pushkara Rao
Lawson Li Varanasi