Westerman, Hattori, Daniels & Adrian, LLP
Photoresist undercoat-forming material and patterning process
A material comprising a novolac resin having a C6-C30 aromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 gas for substrate processing.
Shin-Etsu Chemical Co., Ltd.
G C G C
G03F C08G G03F C09D
inventional inventional additional inventional
Toshihiko Jun Youichi Takeru
Fujii Hatakeyama Ohsawa Watanabe