Dentons US LLP
Film mask, method for manufacturing same, and method for forming pattern using film mask
The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.
LG CHEM, LTD.
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Ilha Ji Young Seung Heon Nam Seok Dong Hyun Ki-Hwan Han Min Chan Hyoung
Lee Hwang Lee Bae Oh Kim Seo Park