Fenwick & West LLP
Method for setting mounting position of target substrate and film forming system
In a method for setting a mounting position of a target substrate, the test substrate is transferred to a second position deviated from a first position. A mask has expected arrangement position where a non-film formation region has a preset width when the target substrate is mounted at the first position and subjected to a film formation. The film is formed on the test substrate at the second position by using the mask. Width of the non-film formation region formed on the test substrate after the film formation is measured. Actual arrangement position of the mask is specified based on a direction and a distance of the deviation of the second position from the first position and the measured width of the non-film formation region. The first position is corrected such that the non-film formation region has the preset width based on the actual arrangement position of the mask.
TOKYO ELECTRON LIMITED
C G C C G C C C C C
C23C G05B C23C C23C G05B C23C C23C C23C C23C C23C
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Yasunobu
Suzuki