Oblon, McClelland, Maier & Neustadt, L.L.P.
Aperture set for multi-beam and multi-charged particle beam writing apparatus
In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.
NuFlare Technology, Inc.
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inventional additional additional inventional additional
Kenichi Hiroshi Hiroshi
Kataoka Yamashita Matsumoto