Polishing composition and method utilizing abrasive particles treated with an aminosilane
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Cabot Microelectronics Corporation
C C B H C
C09G C09K B24B H01L C09K
inventional inventional inventional inventional inventional
Pankaj Shoutian William Steven Jeffrey
Singh Li Ward Grumbine Dysard