Haynes and Boone, LLP
Method and system for cleaning a photomask
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.
Taiwan Semiconductor Manufacturing Company, Ltd.
Y G
Y10S G03F
additional inventional
Chih-Cheng Ching-Yu
Chiu Chang