Millen, White, Zelano & Branigan, P.C.
Positive resist composition
 A hydroxystyrene-(meth)acrylate copolymer in which some phenolic hydroxyl groups are crosslinked with acid labile groups is blended as a base resin in a positive resist composition, which has the advantages of enhanced dissolution inhibition and an increased dissolution contrast after exposure. 
Shin-Etsu Chemical Co., Ltd.
G Y G
G03F Y10S G03F
inventional additional inventional
Takanobu Jun Jun Toshinobu Osamu Youichi
Takeda Watanabe Hatakeyama Ishihara Watanabe Ohsawa