Fluorine free tungsten ALD/CVD process
A tungsten precursor useful for forming tungsten-containing material on a substrate, e.g., in the manufacture of microelectronic devices. The tungsten precursor is devoid of fluorine content, and may be utilized in a solid delivery process or other vapor deposition technique, to form films such as elemental tungsten for metallization of integrated circuits, or tungsten nitride films or other tungsten compound films that are useful as base layers for subsequent elemental tungsten metallization.
Entegris, Inc.
C C C H C C C C C
C23C C23C C23C H01B C07F C01C C09D C07F C01G
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Weimin William David W. Scott L.
Li Hunks Peters Battle