Slater & Matsil, L.L.P.
Capacitors integrated with metal gate formation
A semiconductor structure including a capacitor having increased capacitance and improved electrical performance is provided. The semiconductor structure includes a substrate; and a capacitor over the substrate. The capacitor includes a first layer including a first capacitor electrode and a second capacitor electrode, wherein the first capacitor electrode is formed of a metal-containing material and is free from polysilicon. The semiconductor structure further includes a MOS device including a gate dielectric over the substrate; and a metal-containing gate electrode on the gate dielectric, wherein the metal-containing gate electrode is formed of a same material, and has a same thickness, as the first capacitor electrode.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chia-Yi Chung-Long David Ding-Chung I-Lu
Chen Chang Lu Wu