Klarquist Sparkman Campbell Leigh & Whinston, LLP
Exposure apparatus
 Apparatus and methods are disclosed for transferring a pattern defined by a mask onto a surface of a substrate. The apparatus includes an illumination optical system for illuminating the pattern on the mask. A projection optical system forms an erect image of the pattern on the substrate. For exposure, the mask and substrate are movable together in a scanning direction relative to the projection optical system. First and second relative-displacement measuring systems, the first being separated from the second by a predetermined distance perpendicular to the scanning direction, measure displacement of the mask relative to the substrate in the scanning direction. First and second detection systems detect displacement of the mask and substrate, respectively, in the direction perpendicular to the scanning direction. A position-adjusting system adjusts the position of at least one of the mask and substrate. A calculation system calculates a position-adjusting amount based on outputs from the first and second relative-displacement measuring systems and from the first and second detection systems. A control system controls the position-adjusting system based on an output from the calculation system. 
Nikon Corporation
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inventional inventional inventional inventional
Kei Kinya Hiroshi Yukio
Nara Kato Shirasu Kakizaki