Cantor Colburn LLP
Method for deep trench etching through a buried insulator layer
A method for etching a silicon on insulator (SOI) substrate includes opening a hardmask layer formed on an SOI layer, and etching through the SOI layer, a buried insulator layer underneath the SOI layer, and a bulk silicon layer beneath the buried insulator layer using a single etch step.
International Business Machines Corporation
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Michael D. Brian Herbert L. Mahender
Steigerwalt Messenger Ho Kumar