Method to determine process window
A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.
United Microelectronics Corp.
G
G03F
inventional
Chia-Wei Po-I Chuen Huei Te-Hung Sheng-Yuan Cheng-Te Pei-Ru Ping-I
Huang Lee Yang Wu Huang Wang Tsai Hsieh