McDermott Will & Emery LLP
Chemical vapor deposition apparatus and method for manufacturing light-emitting devices using same
Provided are a CVD apparatus and a method of manufacturing a light emitting device using the same. The CVD apparatus includes a chamber body including a susceptor having at least one pocket part having a wafer stably mounted therein; a chamber cover provided with the chamber body to open or close the chamber body and having a reaction space between the susceptor and the chamber cover; a reactive gas supplier supplying the reactive gas into the reaction space to allow the reactive gas to flow across a surface of the susceptor; and a non-reactive gas supplier supplying a non-reactive gas into the reaction space to allow the non-reactive gas to flow across a surface of the chamber cover between the susceptor and the chamber cover so as to prevent the reactive gas from contacting the surface of the chamber cover.
Samsung Electronics Co., Ltd.
C H C C C C H H H C H C C C
C30B H01L C23C C30B C23C C23C H01L H01L H01L C30B H01L C23C C23C C23C
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Jae Bong In Hoe Choo Ho Takeya Jun Woo
Lee Hur Kim Motonobu Kim