Manufacturing method and manufacturing equipment of thin film transistor substrate
A manufacturing method and a manufacturing equipment of a thin film transistor substrate are provided. In the manufacturing method, after forming a gate and a gate insulating layer of a thin film transistor, a semiconductor layer and a first protection layer are sequentially deposited. After patterning the first protection layer, the patterned first protection layer is used as a mask to pattern the semiconductor layer to form a semiconductor channel of the thin film transistor. By the above solution, the invention can reduce the number of mask and therefore is beneficial to reduce the cost.
Shenzhen China Star Optoelectronics Technology Co., Ltd
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Longqiang Xiaowen Chih-yu Wenhui Chih-yuan
Shi Lv Su Li Tseng