Fish & Richardson P.C.
Projection exposure apparatus
A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
Carl Zeiss SMT AG
G G G G G G
G02B G02B G03F G03F G02B G03F
additional inventional inventional inventional inventional inventional
Hans-Juergen Alexander Daniel Toralf Wilhelm David Vladimir Aurelian Michael Rudolf
Mann Epple Kraehmer Gruner Ulrich Shafer Kamenow Dodoc Totzeck von Buenau