Onello & Mello, LLP
Semiconductor device and method for fabricating the same
A semiconductor device and a method of fabricating the same include a semiconductor substrate, a high-k dielectric pattern and a metal-containing pattern sequentially being stacked on the semiconductor substrate, a gate pattern including poly semiconductor and disposed on the metal-containing pattern, and a protective layer disposed on the gate pattern, wherein the protective layer includes oxide, nitride and/or oxynitride of the poly semiconductor.
Samsung Electronics Co., Ltd.
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Yeong-Jong Youngjoon Duck-nam Chongkwang
Jeong Moon Kim Chang