Blakely, Sokoloff, Taylor & Zafman, LLP
Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning
The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a pattern on a single crystal silicon layer separated by an insulator layer from a substrate layer; defining a structure in the single-crystal silicon layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; and releasing the formed structure.
Xerox Corporation Microscan Systems, Inc.
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B81B B81B B81C
additional additional inventional
Peter M. Joel A. Jingkuang Bruce R. Chuang-Chia Alex T.
Gulvin Kubby Chen Scharf Lin Tran