Oblon, McClelland, Maier & Neustadt, L.L.P.
Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes a hot plate which supports and heats a substrate, a light source which emits etching energy beam such that the etching energy beam etches the substrate held by the hot plate, a window device which is positioned between the light source and the hot plate and transmits the etching energy beam emitted by the light source toward the substrate, and an adjusting device which adjusts emission amounts of the etching energy beam from portions of the window device toward the substrate such that the adjusting device reduces difference in etching amounts of portions of the substrate.
TOKYO ELECTRON LIMITED
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Shoichi Keisuke Yuzo Keisuke
Terada Sasaki Ohishi Yoshida