Volentine Francos & Whitt, PLLC
Photolithography system and method of monitoring the same
A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
Samsung Electronics Co., Ltd.
G
G03F
inventional
Jung-Sung Seok-Ryeul Tae-Jin Yo-Han Byung-Moo
Hwang Lee Hwang Ahn Lee