Haynes and Boone, LLP
Integrated circuit layout design
Provided is a photolithography apparatus including a photomask. The photomask includes a pattern having a plurality, of features, in an example, dummy line features. The pattern includes a first region being in the form of a localized on-grid array and a second region where at least one of the features has an increased width. The apparatus may include a second photomask which may define an active region. The feature with an increased width may be adjacent, and outside, the defined active region.
Taiwan Semiconductor Manufacturing Company, Ltd.
H H G G H H
H01L H01L G03F G03F H01L H01L
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Chang-Yun Shinn-Sheng Shao-Ming Ming-Feng Anthony Clement Hsingjen Jeff J.
Chang Yu Yu Shieh Yen Wann Xu