Method of removing material layer and remnant metal
A method of removing material layer is disclosed. First, a semiconductor substrate is fixed on a rotating platform, where a remnant material layer is included on the surface of the semiconductor substrate. Afterward, an etching process is carried out. In the etching process, the rotating platform is rotated, and an etching solution is sprayed from a center region and a side region of the rotating platform toward the semiconductor substrate until the material layer is removed. Since the semiconductor substrate is etched by the etching solution sprayed from both the center region and the side region of the rotating platform, the etching uniformity of the semiconductor substrate is improved.
United Microelectronics Corp.
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inventional inventional additional additional inventional inventional inventional inventional inventional
Yu-Lan Chao-Ching Chun-Chieh Yi-Wei Tzung-Yu
Chang Hsieh Chang Chen Hung