Polymers, photoresist compositions and methods of forming photolithographic patterns
Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Dow Global Technologies LLC Rohm and Haas Electronic Materials LLC
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Jibin Jong Keun Matthew M. Seung-Hyun Young Cheol
Sun Park Meyer Lee Bae