Oliff & Berridge, PLC
Cleaning method, exposure method, and device manufacturing method
A cleaning method includes cleaning a member, used at the time of exposing a substrate via liquid, which is in contact with the liquid. The method includes cleaning the member with an alkali solution followed by cleaning the member with a solution including hydrogen peroxide.
Nikon Corporation
G G G G
G03F G03F G03F G03F
inventional inventional inventional inventional
Shunji
Watanabe