Tutunjian & Bitetto, P.C.
Nanosheet CMOS transistors
Methods of forming integrated chips include forming a respective stack of sheets in two regions, each stack having first layers and second layers. The second layers are etched away in the first region. The second region is annealed to change the composition of the first layers in the second region by interaction with the second layers in the second region. A gate stack is formed in the first and second region.
INTERNATIONAL BUSINESS MACHINES CORPORATION
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Zhenxing Kangguo Juntao Peng
Bi Cheng Li Xu