Dentons US LLP
Conductive pattern and manufacturing method thereof
The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.
LG CHEM, LTD.
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Beom-Mo Ji-Young Seung-Heon Dong-Wook Min-Choon Yong-Koo In-Seok Sang-Ki
Koo Hwang Lee Lee Park Son Hwang Chun