Fitzpatrick, Cella, Harper & Scinto
Method for forming deposited film
 A method for forming a deposited film by forming a gaseous atmosphere of a hydrogenated silicon compound of the general formula Si.sub.n H.sub.m wherein n is an integer of 1 or more, and m is an integer of 2 or more in a chamber housing a substrate therein and forming a deposited film containing silicon on said substrate by excitation of said compound to effect decomposition or polymerization thereof comprises introducing a gaseous radical polymerization initiator into said chamber and utilizing light energy, thereby exciting said compound to effect decomposition or polymerization thereof. 
Canon Kabushiki Kaisha
C H C H
C23C H01L C23C H01L
inventional inventional inventional inventional
Satoshi Katsuji Yutaka Masafumi Yoshiyuki Hisanori
Omata Takasu Hirai Sano Osada Tsuda