Saile Ackerman LLC
Reduced plasmon shield-generator gap structure and process
Three structures, and processes for manufacturing them, that improve the performance of a TAMR feature in a magnetic write head are disclosed. This improvement is achieved by making the separation between the edge plasmon generator and the plasmon shield less than the separation between the edge plasmon generator and the optical wave-guide.
Headway Technologies, Inc.
G G G
G11B G11B G11B
inventional additional inventional
Shigeki Hiroyuki Xuhui Dayu
Tanemura Ito Jin Zhou