Haynes and Boone, LLP
Conformal etch material and process
The present disclosure provides a method for etching a substrate. The method includes forming a resist pattern on the substrate; applying an etching chemical fluid to the substrate, wherein the etching chemical fluid includes a diffusion control material; removing the etching chemical fluid; and removing the resist pattern.
Taiwan Semiconductor Manufacturing Company, Ltd.
H H H
H01L H01L H01L
inventional inventional inventional
Ching-Yu
Chang