Whitham, Curtis & Christofferson, PC
Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure
The present invention relates to a method of forming a mask with an opening pattern used for a charged particle beam exposure; which comprises the steps of: outlining a pattern figure represented by prescribed pattern data; descerning whether every polygonal pattern represented by pattern data being obtained through said contouring is a convex polygon or not; splitting every polygonal pattern which is not identified as a convex polygon into a plurality of pattern sections; and distributing a plurality of said pattern sections onto masks which constitute a set of complementary masks. In the present invention, any of singular patterns which may cause a problem in stencil mask formation is, through systematical identification, extracted and then, this singular pattern is split and distributed onto different masks constituting a set of complementary masks so that, while maintaining sufficient mechanical strength, the number of openings can be reduced to a minimum by avoiding superfluous pattern splitting. As a result, a stencil mask capable to improve the reliability of the pattern projection can be provided efficiently.
NEC Electronics Corporation
G
G03F
inventional
Hiroshi
Yamashita