Photolithographic methods
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Rohm and Haas Electronic Materials LLC
G G G G G H G
G03F G03F G03F G03F G03F H01L G03F
inventional inventional inventional inventional inventional inventional inventional
Jong Keun Seung-Hyun Young Cheol Rosemary
Park Lee Bae Bell