Nano-imprint lithography templates
Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
Molecular Imprints, Inc. Canon Nanotechnologies, Inc.
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Weijun Frank Y. Edward Brian Fen Niyaz
Liu Xu Fletcher Wan Khusnatdinov