Jianq Chyun IP Office
Hole forming by cross-shape image exposure
A method of forming holes in a layer through a cross-shape image exposure. The method includes removing a section from each corner of the rectangular patterns on a photomask to form cross-shape patterns so that circular or elliptical contact holes are formed on a photoresist layer after photo-exposure and development. Optical image contrast between contacts is increased by the cross-shape patterns on the photomask.
Macronix International Co., Ltd.
G H
G03F H01L
inventional additional
Ching-Yu Tahorng Tsung-Hsien
Chang Yang Wu