Ditthavong Mori & Steiner, P.C.
Composition for forming resist underlayer film and method for forming pattern
A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent,wherein R3 to R8 individually represent a group shown by the following formula (2) or the like,—O—R1≡R2  (2)wherein R1 represents a single bond or the like, and R2 represents a hydrogen atom or the like.
JSR Corporation
G G C C
G03F G03F C08L C08G
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Kyoyu Makoto Takanori Yushi Shin-ya Shinya Kazuhiko Satoru
Yasuda Sugiura Nakano Matsumura Minegishi Nakafuji Komura Murakami