Semiconductor device and method for fabricating the same
A method for fabricating semiconductor device includes the steps of: forming a magnetic tunneling junction (MTJ) stack on a substrate; forming a top electrode on the MTJ stack; performing a first patterning process to remove the MTJ stack for forming a first MTJ; forming a first inter-metal dielectric (IMD) layer around the first MTJ; and performing a second patterning process to remove the first MTJ for forming a second MTJ and a third MTJ.
UNITED MICROELECTRONICS CORP.
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inventional additional additional inventional
Hui-Lin Yu-Ping Po-Kai Hung-Yueh
Wang Wang Hsu Chen