K & L Gates LLP
Dimension monitoring method and system
A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.
Taiwan Semiconductor Manufacturing Co.
H H G
H01L H01L G03F
inventional inventional inventional
Hsin-Chang Yen-Bin Chi-Lun Chang-Cheng Chia-Jen Hong-Chang Wen-Chuan Chen-Yuan Kai-Chung Shih-Ming
Lee Huang Lu Hung Chen Hsieh Wang Hsia Liu Chang