Thompson Hine LLP
Multiple patterning with variable space mandrel cuts
Methods of multiple patterning. First and second mandrel lines are formed on a patternable layer. Sidewall spacers are formed on the patternable layer adjacent to the first mandrel line and adjacent to the second mandrel line. A portion of the first mandrel line is removed to form a gap in the first mandrel line. A gapfill material is deposited in the gap in the first mandrel line. The gapfill material and sidewall spacers are composed of the same material.
GLOBALFOUNDRIES INC.
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Jiehui Jinping Rui
Shu Liu Chen