Method for forming contact plug layout
A method for forming a contact plug layout include following steps. (a) Receiving a plurality of active region patterns and a plurality of buried gate patterns that are parallel with each other, and each active region pattern overlaps two buried gate patterns to form two overlapping regions and one contact plug region in between the two overlapping regions in each active region pattern; and (b) forming a contact plug pattern in each contact plug region, the contact plug pattern respectively includes a parallelogram, and an included angle of the parallelogram is not equal to 90°. The contact plug pattern in each active region pattern partially overlaps the two buried gate pattern, respectively. The step (a) to the step (b) are implemented using a computer.
UNITED MICROELECTRONICS CORP. Fujian Jinhua Integrated Circuit Co., Ltd.
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Chien-Ting Li-Wei Yu-Cheng Ying-Chiao Emily SH
Ho Feng Tung Wang Huang