Janah & Associates, P.C.
Detachable electrostatic chuck for supporting a substrate in a process chamber
A substrate support has an electrostatic chuck comprising an electrostatic puck with a dielectric covering an electrode capable of being charged to energize a process gas. The chuck has a frontside surface to receive a substrate and a base plate having an annular flange. A spring loaded heat transfer plate contacts the base plate, and has a fluid channel comprising first and second spiral channels. A pedestal is below the heat transfer plate.
Applied Materials, Inc.
Y H
Y10T H01L
additional inventional
Allen Steve Cheng-Hsiung Karl Vineet Semyon Wei W.
Lau Sansoni Tsai Brown Mehta Sherstinsky Wang