Morgan, Lewis & Bockius LLP
Plasma spectroscopy analysis method
The disclosure provides plasma spectroscopy analysis methods using a preparatory process of adding a control metal species that is different from an analyte metal species to a sample so as to have a known concentration; a concentration process of introducing the sample to a measurement container, and applying an electric current across a pair of electrodes disposed in the measurement container to concentrate the analyte metal species and the control metal species in the sample in a vicinity of at least one of the electrodes; a detection process; a correction process; and a quantification process.
ARKRAY, Inc.
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Kentaro Hirofumi Kojiro
Kiriyama Yamada Honma