Chambliss, Bahner & Stophel PC
Method and apparatus for defining leading edge taper of a write pole tip
A method and apparatus for defining leading edge taper of a write pole tip is disclosed. The fabrication process uses reactive ion etching to fabricate LET with tight control of the placement of LET's edge and to achieve higher angle for providing a higher effective write field at the pole tip while minimizing ATI for high-density perpendicular recording. The placement of a resist's edge is used to define the LET's edge and a CMP process is used to provide a planar surface for the fabrication of the write pole.
Hitachi Global Storage Technologies Netherlands B.V.
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Yvette Chung Nga Yi Quang Jui-Lung Sue Siyang
Winton Zheng Le Li Zhang