Duane Morris LLP
System and method of ion neutralization with multiple-zoned plasma flood gun
An apparatus comprises a plasma flood gun for neutralizing a positive charge buildup on a semiconductor wafer during a process of ion implantation using an ion beam. The plasma flood gun comprises more than two arc chambers, wherein each arc chamber is configured to generate and release electrons into the ion beam in a respective zone adjacent to the semiconductor wafer.
Taiwan Semiconductor Manufacturing Co., Ltd.
G A H H G
G21G A61N H01J H01J G21K
inventional inventional additional inventional additional
Chih-Hong Wen-Yu Chi-Ming Chun-Lin Chin-Hsiang
Hwang Ku Yang Chang Lin