Schwegman, Lundberg & Woessner, P.A.
Masking structure having multiple layers including amorphous carbon layer
A masking structure having multiple layers is formed. The masking structure includes an amorphous carbon layer and a cap layer formed over the amorphous carbon layer. The amorphous carbon layer includes transparent amorphous carbon. The cap layer includes non-oxide materials. The masking structure may be used as a mask in an etching process during fabrication of semiconductor devices.
Micron Technology, Inc.
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Gurtej S. Weimin Zhiping
Sandhu Li Yin