Slater Matsil, LLP
Structure and formation method of semiconductor device structure
Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a gate stack over a semiconductor substrate and a cap element over the gate stack. The cap element has an upper portion and a lower portion, and the upper portion is wider than the lower portion. The semiconductor device structure also includes a spacer element over a sidewall of the cap element and a sidewall of the gate stack.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Kuo-Hui Chai-Wei Po-Chi Yi-Cheng
Chang Chang Wu Chao