Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Method of cleaning gases
 Method and apparatus for cleaning a gas for preventing the contamination of a surface of a substrate in a localized space are disclosed. A photocatalyst is provided in a selected area of the localized space and the photocatalyst, as it is illuminated with light, is contacted by the gas to be treated, whereby any noxious gases are removed from the treated gas. Alternatively, a unit apparatus composed of an ultraviolet radiation source, a photocatalyst, a photoelectron emitter and an electrode is installed in a selected area of the localized space and the gas to be treated is passed through the unit apparatus, whereby noxious gases and particulates are removed from the treated gas. 
Ebara Corporation
F Y B Y B B B
F24F Y10S B01D Y10S B01J B01D B01D
inventional additional additional additional inventional inventional additional
Toshiaki
Fujii