Sughrue Mion, PLLC
Cleaning composition for photolithography and method of forming photoresist pattern using the same
Disclosed are a cleaning composition for photolithography and a method of forming a photoresist pattern using the same. The cleaning composition, necessary for forming a photoresist pattern having a high aspect ratio, includes water and a compound represented by Chemical Formula 1 below:
YOUNG CHANG CHEMICAL CO., LTD
C C G G C C C H G G
C11D C11D G03F G03F C11D C11D C11D H01L G03F G03F
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Seung Hyun Sang Woong Seung Hun Gyeong Guk
Lee Yoon Lee Ham