Amerson Law Firm, PLLC
Multiple patterning process for forming trenches or holes using stitched assist features
One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of mask data information corresponding to the first sub-target pattern, and generating a second set of mask data information corresponding to the second sub-target pattern.
GLOBALFOUNDRIES Inc.
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Yuyang Jian Norman S.
Sun Liu Chen