Image sensor and fabricating method thereof
The present invention provides an image sensor and a fabricating method thereof capable of approaching higher quantum efficiency and reducing cost. The method comprises: providing a substrate; forming a pixel region on a top surface of the substrate; forming an interlayer insulating layer and at least a metal line on the pixel region; forming an isolation carrier layer having a hole array therein on the interlayer insulating layer; grinding a lower surface of the substrate to reduce the thickness of the substrate; placing a plurality of conductors into the hole array to form a plurality of bumps on the isolation carrier layer.
Himax Imaging, Inc.
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inventional additional inventional inventional
Chih-Min Ping-Hung Chung-Wei Fang-Ming Kuo-Chan
Liu Yin Chang Huang Huang