Moser Taboada
Biased cover ring for a substrate processing system
Apparatus and methods for reducing and eliminating accumulation of excessive charged particles from substrate processing systems are provided herein. In some embodiments a process kit for a substrate process chamber includes: a cover ring having a body and a lip extending radially inward from the body, wherein the body has a bottom, a first wall, and a second wall, and wherein a first channel is formed between the second wall and the lip; a grounded shield having a lower inwardly extending ledge that terminates in an upwardly extending portion configured to interface with the first channel of the cover ring; and a bias power receiver coupled to the body and extending through an opening in the grounded shield.
APPLIED MATERIALS, INC.
H C H H C H C H H C
H01J C23C H01J H01J C23C H01J C23C H01J H01J C23C
inventional inventional inventional inventional additional inventional inventional inventional additional inventional
Adolph Miller Zhong Qiang Kirankumar Sundarapandian Ramalinga Vijayalaks Viachslav Jingjing William Carl R. Vaibhav Vanessa
Allen Hua Savandaiah Reddy Babayan Liu Johanson Johnson Soni Faune