Muncy, Geissler, Olds & Lowe, P.C.
Method for fabricating mesa sidewall with spin coated dielectric material and semiconductor element thereof
A method for fabricating a mesa sidewall with a spin coated dielectric material and a semiconductor element fabricated by the same are provided in the present invention. The method includes the steps of: disposing an object on a semiconductor substrate; performing a spin coating process to coat with a liquid dielectric material; performing a drying process to dry the liquid dielectric material; performing a first etching process to remove an upper part of the dried dielectric material to expose a metal part (unaffected by ion bombardment) of the object; performing a deposition process to insulate the metal part (unaffected by ion bombardment) of the object; and performing a second etching process to form a semiconductor element with a mesa sidewall.
NATIONAL CENTRAL UNIVERSITY
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Jiun-Ming Jen-Inn Sheng-Yu
Chen Chyi Wang