Townsend and Townsend and Crew LLP
Projection exposure system
A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.
Carl Zeiss SMT AG
G G G
G02B G03F G02B
inventional inventional inventional
Reiner Alexander Wilhelm Wolfgang Toralf Helmut Karl-Heinz Daniel
Garreis Epple Ulrich Singer Gruner Beierl Schuster Kraehmer