Haynes and Boone, LLP
Surface switchable photoresist
A material is provided for use in an immersion lithographic process of a semiconductor substrate. The material includes a photo-sensitive polymer configured to turn soluble to a base solution in response to reaction with an acid and at least one of either a base soluble polymer or an acid labile polymer. The base soluble polymer is configured to turn soluble to water in response to reaction with a developer solution. The acid labile polymer is configured to turn soluble to water after releasing a leaving group in reaction to the acid.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chih-Cheng Ching-Yu
Chiu Chang