Oblon, McClelland, Maier & Neustadt, L.L.P.
Film-forming apparatus and film-forming method
A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.
NuFlare Technology, Inc. Toyota Jidosha Kabushiki Kaisha Denso Corporation Central Research Institute of Electric Power Industry
C
C30B
inventional
Koichi Isaho Hiroaki Masami Ayumu Masahiko Hidekazu Naohisa Hideki Kunihiko
Nishikawa Kamata Fujibayashi Naito Adachi Ito Tsuchida Ikeya Ito Suzuki