McClure, Qualey & Rodack, LLP
Method and system for cleaning wafer and scrubber
A method of cleaning a wafer in semiconductor fabrication is provided. The method includes cleaning a wafer using a wafer scrubber. The method further includes moving the wafer scrubber into an agitated cleaning fluid. The method also includes creating a contact between the wafer scrubber and a cleaning stage in the agitated cleaning fluid. In addition, the method includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning fluid.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
B H H B B
B08B H01L H01L B08B B08B
inventional inventional inventional inventional inventional
Ju-Ru Shun-Yu Chien-Chun Po-Chia Chen-Liang Wei-Tuzo
Hsieh Chuang Hu Chen Chang Lin