Jones Volentine, L.L.C.
Method of manufacturing semiconductor devices
 A semiconductor device is manufactured by forming a thin layer over a semiconductor substrate, coating photoresist on the thin layer, forming a photoresist pattern over the semiconductor substrate, injecting ions into the photoresist pattern so as to harden the photoresist pattern, and etching the thin layer by using the hardened photoresist pattern as an etch mask. The hardened photoresist pattern has an increased etch selectivity with respect to an underlying layer, allowing the use of thinner photoresist layers and improved etching. 
Samsung Electronics, Co., Ltd.
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Dong-ha Jung-ki Sung-kyu Yeon-sang Sang-kuen
Lim Kim Han Hwang Oh