Moser Taboada
Apparatus for controlling the temperature uniformity of a substrate
Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.
APPLIED MATERIALS, INC.
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inventional additional
Shahid Kallol Douglas A. Andrew Hamid Xiaoping Surajit
Rauf Bera Buchberger, Jr. Nguyen Tavassoli Zhou Kumar