Young & Thompson
Semiconductor device and method of forming the same as well as a photo-mask used therein
A method of forming a device pattern of a semiconductor device. The method includes the steps of carrying out an over-exposure to a resist film using a mask which has transmission regions which are positioned about a circumference of each of intended patterns of a resist film. Then carrying out a development of the resist film to form a resist pattern having the intended patterns. And then forming a device pattern of a semiconductor device by use of the resist pattern.
NEC Electronics Corporation
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H01L G03F H01L H01L
additional inventional inventional additional
Mami
Takeuchi