Process control system
A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
Hitachi, Ltd. Hitachi Instruments Engineering Co., Ltd.
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inventional inventional additional additional additional inventional
Toshimitsu Tetsuji Ikuo Fumio Terushige Isao Yuichi Makoto Yasuhiro Mari Seiji Masataka Yoshiharu Seiji Kenji Jun Hidekuni Masami
Hamada Yokouchi Suzuki Mizuno Asakawa Miyazaki Ohyama Ariga Yoshitake Nozoe Isogai Shiba Shigyo Ishikawa Watanabe Nakazato Sugimoto Ikota