Maschoff Brennan
Semiconductor structure and testing method thereof
A method for testing a semiconductor structure includes forming a dielectric layer over a test region of a substrate. A cap layer is formed over the dielectric layer. The dielectric layer and the cap layer are annealed. The annealed cap layer is removed. A ferroelectricity of the annealed dielectric layer is in-line tested.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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G01R H01L H01L
inventional inventional additional
Cheng-Yi Chia-Cheng Chih-Sheng Chun-Chieh Ming-Shiang
Peng Ho Chang Lu Lin