Wolff & Samson PC
Inverter made of complementary p and n channel transistors using a single directly-deposited microcrystalline silicon film
A p channel thin-film transistor (TFT) made of directly deposited microcrystalline silicon (uc-Si). The p TFT is integrated with its n channel counterpart on a single uc-Si film, to form a complementary metal-silicon oxide-silicon (CMOS) inverter of deposited uc-Si. The uc-Si channel material can be grown at lower temperatures by plasma-enhanced chemical vapor deposition in a process similar to the deposition. The p and n channels share the same uc-Si layer. The Figure shows the processing steps of manufacturing the TFT, where (12) represents the uc-Si layer of the device.
The Trustees of Princeton University
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Yu Sigurd
Chen Wagner