Beyer Law Group LLP
Method and apparatus for determining process rate
A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.
Lam Research Corporation
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Andrew D. Yassine Jorge Luc Seonkyung Thorsten
Bailey, III Kabouzi Luque Albarede Lee Lill