Duane Morris LLP
Cell boundaries for self aligned multiple patterning abutments
A system and method of determining a cell layout are disclosed. The method includes receiving a circuit design corresponding to a predetermined circuit design, the circuit design having a first set of cells and abutting adjacent cells in the first set of cells, the abutted cells having a first boundary pattern therebetween. The first boundary pattern is exchanged with a second boundary pattern based on a number or positions of signal wires in the first boundary pattern. A cell layout for use in a patterning process can then be determined, the cell layout including the second boundary pattern.
Taiwan Semiconductor Manufacturing Co., Ltd.
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Chin-Hsiung Ching Hsiang Wen-Hao Li-Chun Pin-Dai Cheng-I
Hsu Chang Chen Tien Sue Huang