The Mueller Law Office, P.C.
Cell projection charged particle beam lithography
The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.
D2S, Inc.
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inventional inventional inventional inventional
Donald Larry Lam Shohei Kenji Tam Dinh Thanh Akira Takashi
MacMillen Chau Matsushita Yoshida Nguyen Fujimura Mitsuhashi