Eschweiler & Potashnik, LLC
Method for layoutless overlay control
A method for layoutless overlay control is provided. In some embodiments, a target layer covering a workpiece is patterned using a reticle. The patterning forms a plurality of exposure fields arranged according to a first exposure field layout. Alignment of the exposure fields relative to the workpiece is measured to generate displacement vectors. An inter-field model and an intra-field model are trained using the displacement vectors and a reference field layout. The intra-field model is transformed for use with a second exposure field layout, where the second exposure field layout is different than the first exposure field layout. Overlay corrections are generated based on the trained inter-field model and the transformed intra-field model.
Taiwan Semiconductor Manufacturing Co., Ltd.
G G
G03F G03F
inventional inventional
Yung-Yao Yi-Ping
Lee Hsieh