G W i P S
Organic polymers for bottom antireflective coating, process for preparing the same, and compositions containing the same
A bottom antireflective coating layer is made from the compositions of organic photosensitive materials that contain isoflavone chromophore by photolithography utilizing a deep ultraviolet light source for producing a submicro-level, large-scale integrated chip. A copolymer containing an isoflavone chromophore is used as a bottom antireflective coating layer for fabricating a 64-megabit or gigabit DRAM. The antireflective coating layer enables not only the suppression of reflections of light that occur under the substrate layer but also the removal of standing waves. Consequently, a high-resolution sub-micron of a 100&#732;200 nm integrated circuit is able to be stably formed. Therefore, it is possible to increase the production of semiconductors.
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C08F G03F
additional inventional
Sung Hyun Kwang Duk Jong Hee Jun Young
Ha Ahn Kang Kim