Millen White Zelano & Branigan, P.C.
Silica glass substrates and their selection
A silica glass substrate is obtained by polishing, cleaning, drying and etching a silica glass substrate slice. When the substrate on one surface is treated with a reactive reagent, defects having a size of at least 0.3 μm in a direction parallel to the substrate major surface are absent on the substrate surface. The silica glass substrate, in which no submicron defects manifest on the substrate surface even when treated as by cleaning or etching, serves as a reticle for use in photolithographic IC fabrication, achieving an improved manufacturing yield in the semiconductor device fabrication and microelectronic system fields.
Shin-Etsu Chemical Co., Ltd.
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C03C C03C
inventional inventional
Atsushi Masaki Tetsushi Yukio
Watabe Takeuchi Tsukamoto Shibano