Method of making thin film transistor
A photo-mask includes a first opaque pattern, a second opaque pattern, a transparent single slit, and a translucent pattern. The transparent single slit is disposed between the first opaque pattern and the second opaque pattern, and the width of the transparent single slit is substantially between 1.5 micrometers and 2.5 micrometers. The translucent pattern is connected to the first opaque pattern and the second opaque pattern.
AU Optronics Corp.
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Hsiang-Chih Chia-Ming
Hsiao Chang