Keil & Weinkauf
Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon
 Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain benzotriazole compound as a sensitizer and optionally further additive and/or auxiliary substances. 
BASF Aktiengesellschaft
G
G03F
inventional
Friedrich Reinhard Andreas Peter Thomas
Seitz Aldag Boettcher Neumann Bluemel