Volpe and Koenig, P.C.
Antireflection structure and manufacturing method thereof
An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.
National Applied Research Laboratories
C Y C C C C C G
C23C Y10T C23C C23C C23C C23C C23C G02B
inventional additional inventional inventional inventional inventional inventional inventional
Chien-Nan Hung-Ping Wen-Hao Po-Kai Han-Chang
Hsiao Chen Cho Chiu Pan