Kenyon & Kenyon
Plasma operation apparatus
 A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations. 
Service Engineering Co. Ltd. Hitachi, Ltd.
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C23C H01J H01J
inventional inventional inventional
Noboru Shigeru Takuya Kazuo Naohiro Kiyosi Tadasi Yasuhiro
Suzuki Takahashi Fukuda Suzuki Momma Chiba Sonobe Mochizuki