Cantor Colburn LLP
Cleaning composition and method of manufacturing metal wiring using the same
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
SAMSUNG DISPLAY CO., LTD. LTCAM CO., LTD.
C H H C C C H H C H C C H C H H H
C11D H05K H05K C11D C23F C11D H05K H05K C11D H01L C23F C11D H05K C11D H05K H05K H05K
inventional additional additional inventional inventional inventional additional additional inventional inventional inventional inventional additional inventional additional additional inventional
Jun-Hyuk Seong-Sik Bong-Yeon Jong-Su Jin-Ho Jung-Hwan Seok-Ho
Woo Jeon Kim Han Ju Song Lee