Jianq Chyun IP Office
Method for fabricating pixel structure
A pixel structure fabricating method is provided. A gate and a gate insulation layer covering the gate are formed on a substrate. A channel layer is formed on the gate insulation layer. A conductive layer is formed on the channel layer and gate insulation layer. A black matrix having a color filer layer accommodating opening is formed on the conductive layer. The black matrix includes a first block and a second block which is thicker than the first block. The conductive layer is patterned with the black matrix as a mask to form a source and a drain on the channel layer. A color filter layer is formed within the color filter layer accommodating opening through inkjet printing. A dielectric layer is formed on the black matrix and color filter layer. The dielectric layer is patterned to expose the drain. A pixel electrode electrically connected to the drain is formed.
Au Optronics Corporation
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Chen-Pang Hsiang-Chih Che-Yung Chun-Yi Chia-Chi Zong-Long Chou-Huan Han-Tang Ta-Wen Jun-Kai Chia-Ming
Tung Hsiao Lai Chiang Tsai Jhang Yu Chou Liao Chang Chang