Resist compositions with polymers having 2-cyano acrylic monomer
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano acrylic monomer.
International Business Machines Corporation
G G
G03F G03F
inventional inventional
Pushkara Rao Wenjie
Varanasi Li