Tung & Associates
Method for forming low thermal budget sacrificial oxides
A method for forming a silicon dioxide layer over a silicon substrate including providing a substrate having exposed silicon portions; and, forming a silicon dioxide layer over the exposed silicon portions according to an oxide formation process including contacting the exposed silicon portions with an oxidizing solution comprising water and ozone.
Taiwan SEmiconductor Manufacturing Co., Ltd.
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Vincent Kuo-Chi Chia-Shiung Chung-Wei Chun-Yao
Pai Tu Tsai Chang Chen