Millen, White, Zelano & Branigan, P.C.
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C&#8212;O&#8212;C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group &#8801;C&#8212;COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
Shin-Etsu Chemical, Co., Ltd.
C G C C Y G
C08F G03F C08F C08F Y10S G03F
additional inventional additional inventional additional inventional
Toshinobu Tsuguo Shigehiro Osamu Yoshihumi Tomoyoshi Satoshi
Ishihara Yamaoka Nagura Watanabe Takeda Furihata Watanabe