Haynes and Boone, LLP
Intensity selective exposure photomask
An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage. Each of the features of the first and second array includes an opening disposed in an area of attenuating material.
Taiwan Semiconductor Manufacturing Company, Ltd.
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G03F G03F G06F
inventional inventional inventional
Tsong-Hua Kuei Shun Te-Chih Wen-Chun Yao-Ching George Yu Lun Shu-Chen Wen-Hao Chih-Yang Yu-Po Ying-Chou Tsai-Sheng Boren Ru-Gun
Ou Chen Huang Huang Ku Liu Liu Lu Liu Yeh Tang Cheng Gau Luo Liu