Sughrue, Mion, Zinn, Macpeak & Seas
Ultra high purity vapor phase treatment
 A semiconductor wafer vapor phase treatment method and apparatus for dissolving an insulating film formed on a semiconductor wafer at a high speed and high purity. A liquid reagent is heated and vaporized to obtain reagent vapors capable of dissolving an object to be treated. The reagent vapors are passed through a hydrophobic porous film to intercept mists having a diameter greater than a predetermined value and obtain high purity reagent vapors. The purified reagent vapors are supplied to the cooled object. The vapors which dissolved the object are liquidized to generate droplets. 
Fuji Photo Film Co., Ltd.
C
C30B
inventional
Kaoru Shinzaburo Norihiko
Nozaki Onda Kato