Blakely, Sokoloff, Taylor & Zafman LLP
Method for fabricating transistor with thinned channel
A method of fabricating a MOS transistor having a thinned channel region is described. The channel region is etched following removal of a dummy gate. The source and drain regions have relatively low resistance with the process.
Intel Corporation
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Robert S. Amlan Jack T. Suman Marko Justin K. Mark L. Brian S. Matthew V.
Chau Majumdar Kavalieros Datta Radosavljevic Brask Doczy Doyle Metz