Tung & Associates
Apparatus and method for removing particles from wafer pods
An apparatus and method useful for removing potential wafer-contaminating particles from semiconductor wafer pods. The apparatus includes a rotatable air sprinkler which is mounted in a housing and connected to a source of clean, dry air (CDA) . The air sprinkler rotates as the air is distributed under pressure through the sprinkler and ejected from nozzles in the sprinkler. The ejected air impinges against a semiconductor wafer pod placed on the housing, above the air sprinkler to dislodge or remove particulate contaminants from the pod and prevent or at least significantly reduce the likelihood of particle contamination during transport of the pod and/or processing of the wafers in the pod.
Taiwan Semiconductor Manufacturing Co., Ltd.
B H B
B08B H01L B08B
inventional inventional inventional
Wuei-Lung Ming-Chi Chi-Lung Hong-Yi
Hou Ho Yang Chen