Haynes and Boone, LLP
Photoresist materials and photolithography process
A material for use in lithography processing includes a polymer that turns soluble to a base solution in response to reaction with acid and a plurality of magnetically amplified generators (MAGs) each having a magnetic element and each decomposing to form acid bonded with the magnetic element in response to radiation energy.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G G G G Y Y G
G03F G03F G03F G03F G03F Y10S Y10S G03F
inventional inventional inventional inventional inventional additional additional inventional
Chin-Hsiang Hsien-Cheng Hua-Tai H. J. Burn Jeng Ching-Yu
Lin Wang Lin Lee Lin Chang