Slater Matsil, LLP
Slot contacts and method forming same
A method of forming an integrated circuit structure includes forming a first source/drain contact plug over and electrically coupling to a source/drain region of a transistor, forming a first dielectric hard mask overlapping a gate stack, recessing the first source/drain contact plug to form a first recess, forming a second dielectric hard mask in the first recess, recessing an inter-layer dielectric layer to form a second recess, and forming a third dielectric hard mask in the second recess. The third dielectric hard mask contacts both the first dielectric hard mask and the second dielectric hard mask.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Chia-Hao Sheng-Tsung Li-Zhen Jia-Chuan Chih-Hao Yu-Ming Tien-Lu Lin-Yu
Chang Wang Yu You Wang Lin Lin Huang