Sughrue Mion, PLLC
Semiconductor probe having embossed resistive tip and method of fabricating the same
A semiconductor probe having an embossed resistive tip and a method of fabricating the semiconductor probe are provided. The semiconductor probe includes a protrusion portion protruded to a predetermined height on a cantilever in a first direction crossing a length direction of the cantilever, an embossed resistive tip formed on the protrusion portion, and first and second semiconductor electrode regions formed at opposite sides of the embossed resistive tip at the protrusion portion, wherein the cantilever is doped with a first dopant, the first and second semiconductor electrode regions and the embossed resistive tip are doped with a second dopant having a different polarity from the first dopant, and the embossed resistive tip is doped with a concentration lower than the first and second semiconductor electrode regions.
Samsung Electronics Co., Ltd.
G B
G01Q B82Y
inventional inventional
Seung-bum Hyung-cheol Ju-hwan Jun-soo Jae-hong
Hong Shin Jung Kim Lee