Ostrolenk, Faber, Gerb & Soffen, LLP
Parallel plate plasma CVD apparatus
 A parallel plate plasma CVD apparatus comprises a radio-frequency generator; a reaction chamber; a bottom electrode provided in the reaction chamber and grounded; a top electrode provided opposite to the bottom electrode in the reaction chamber and connected to the radio-frequency generator; a mesh electrode provided between the bottom electrode and the top electrode in the reaction chamber; and one of a resistor and a capacitor electrically connected between the bottom electrode and the mesh electrode. 
Murata Manufacturing Co., Ltd.
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C23C C23C H01J
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Xiao-min
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