Lerner, David, Littenberg, Krumholz & Mentlik, LLP
Block copolymer
The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
LG Chem, Ltd.
H C C C C G C C G C C C C C C C C G C C C C C G B C C C B G B C H C C G B C G H H G C C C C B G
H01L C08G C01P C08J C08L G03F C08G C08F G03F C07B C08G C08F C08F C08G C08F C09D C08J G03F C08G C08F C08F C08F C08G G03F B82Y C08F C08F C08F B81C G03F B05D C08F H01L C08G C08L G03F B05D C08G G03F H01L H01L G03F C08F C08L C08J C08F B81C G03F
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Hyung Ju Je Gwon No Jin Mi Sook Sung Soo Eun Young Se Jin Jung Keun
Ryu Lee Park Lee Yoon Choi Ku Kim