Michael Best & Friedrich LLP
Method for forming a virtual germanium substrate using a laser
The present disclosure provides a method of manufacturing a semiconductor device. Furthermore the present disclosure provides a photovoltaic device and a light emitting diode manufactured in accordance with the method. The method comprises the steps of forming a germanium layer using deposition techniques compatible with high-volume, low-cost manufacturing, such as magnetron sputtering, and exposing the germanium layer to laser light to reduce the amount of defects in the germanium layer. After the method is performed the germanium layer can be used as a virtual germanium substrate for the growth of III-V materials.
NewSouth Innovations Pty Limited
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Martin Andrew Anita Wing Yi Xiaojing Wei Ziheng
Green Ho-Baillie Hao Li Liu