Morgan, Lewis & Bockius LLP
Sputtering targets and devices including Mo, Nb, and Ta, and methods
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.
H.C. STARCK INC.
C C C C C C C G H C C
C23C C23C C23C C23C C22C C23C C23C G06F H01J C23C C22C
inventional inventional inventional inventional additional inventional inventional additional inventional inventional inventional
Yen-Te Barbara Gary Alan Qi Shuwei
Lee Cox Rozak Zhang Sun