Lee IP Law, P.C.
Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same
An etching composition for silicon nitride layers and a method of etching a silicon nitride layer using the composition, the etching composition including an inorganic acid or a salt thereof; a solvent; an acid-modified silica or an acid-modified silicic acid; and a cyclic compound containing four or more nitrogen atoms.
SAMSUNG SDI CO., LTD.
C H C H C H C H C C C
C09K H01L C09K H01L C09K H01L C09G H01L C09G C09G C09G
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Kwen Woo Jun Young Ki Wook Ji Hye Hyun Jung Hyung Rang Jung Min
Han Jang Hwang Lee Kim Moon Choi