Tool and method of developing
A tool and a method of developing are provided. In various embodiments, the method of developing includes rotating a wafer at a first rotating speed. The method further includes dispensing a developer solution onto the wafer at the first rotating speed by a first nozzle above the wafer, wherein the first nozzle moves back and forth along a path during dispensing the developer solution. The method further includes rotating the wafer at a second rotating speed to spread the developer solution onto the wafer uniformly. The method further includes dispensing a rinse solution onto the wafer at the second rotating speed by a second nozzle above the wafer.
Taiwan Semiconductor Manufacturing Co., Ltd.
H G H
H01L G03F H01L
inventional inventional inventional
Jui-Ping Ming-Shane Fei-Gwo Yi-Rem Li-Kong Chung-Hao
Chuang Lu Tsai Chen Turn Chang