Photoresist overcoat compositions and methods of forming electronic devices
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Rohm and Haas Electronic Materials LLC
C C G C G G G C Y G G Y G C H
C09D C08K G03F C09D G03F G03F G03F C08K Y10S G03F G03F Y10S G03F C08K H01L
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Young Cheol Rosemary Jong Keun Seung-Hyun
Bae Bell Park Lee