F. Chau & Associates, LLC
Method of exposing a semiconductor structure, apparatus for controlling a lithography process performed by a lithography apparatus across a semiconductor structure, non-transitory computer readable medium having instructions stored thereon for generating a weight function
Multiple model functions may be calculated by detecting alignment marks on a semiconductor wafer structure. The model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model functions. Thus, even when asymmetry of alignment marks or overlay marks has high dependency on a horizontal location on a wafer, reliability of exposure process is insured.
SAMSUNG ELECTRONICS CO., LTD.
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Seung-yoon Moo-song
Lee Lee