Myers Bigel, P.A.
Gas supply unit and substrate processing system
A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.
Samsung Electronics Co., Ltd.
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Sukjin MinHwa Jungil In-Sun Seung Han Geunkyu JongCheol Jin Pil Jaechul
Chung Jung Ahn Yi Lee Choi Lee Heo Shin