Method of manufacturing a projection objective and projection objective
The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.
Carl Zeiss SMT GmbH
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Toralf Alexander Heiko
Gruner Epple Feldmann