Pollock, Vande Sande & Priddy
Solution for cleaning silicon semiconductors and silicon oxides
 A cleaning solution for achieving highly accurate cleaning of silicon semiconductors and silicon oxides. The solution which enables a great reduction in the metal contaminants and the number of fine particles adhered on the surfaces and retention of the hydrophilic property of the surfaces to prevent the surfaces from being unstable, comprising an aqueous acidic solution containing 0.005% by weight or more to less than 0.05% by weight hydrogen fluoride and 0.3% by weight or more to 20.0% by weight or less hydrogen peroxide and having a pH in the range from 1 or more to less than 5. 
NSC Electron Corporation Nippon Steel Corporation
H Y
H01L Y10S
inventional additional
Shuji Kenichi Yoshihiro Susumu Kengo Tadashi
Munehira Uemura Mori Ohtsuka Shimanoe Sakon