Martine Penilla Group, LLP
Method and apparatus for detecting plasma unconfinement
A method for detecting plasma unconfinement in a reaction chamber during a bevel edge cleaning operation is provided. The method initiates with selecting a wavelength associated with expected by products of a bevel edge clean process. The method includes cleaning the bevel edge area of a substrate and monitoring the intensity of the selected wavelengths during the cleaning for deviation from a threshold wavelength intensity. The cleaning is terminated if the deviation from the threshold wavelength intensity exceeds a target deviation.
Lam Research Corporation
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inventional inventional inventional additional
Andrew D. KeeChan Yunsang
Bailey, III Kim Kim