Schwegman Lundberg & Woessner, P.A.
Resist stripping solution composition, and method for stripping resist by using same
Disclosed is a resist stripping solution composition, which is highly capable of removing a resist pattern and an etching residue after dry etching or wet etching, manifests excellent anticorrosive effects on metal wiring including aluminum and/or copper because a predetermined polyol compound is used, and also can process a number of substrates because a predetermined amide compound is used, thus greatly contributing to reducing the cost. A method of stripping a resist using the resist stripping solution composition is also provided.
Dongwoo Fine-Chem Co., Ltd.
C G
C11D G03F
additional inventional
Tae-Hee Seung-Yong Myun-Kyu Jeong-Hyun Byoung-Mook
Kim Lee Park Kim Kim