Haynes and Boone, LLP
Wet soluble lithography
A system to form a wet soluble lithography layer on a semiconductor substrate includes providing the substrate, depositing a first layer comprising a first material on the substrate, and depositing a second layer comprising a second material on the substrate. In an embodiment, the first material comprises a different composition than the second material and one of the first layer and the second layer includes silicon.
Taiwan Semiconductor Manufacturing Company, Ltd.
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H01L H01L G03F G03F
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Ching-Yu Chien-Wei
Chang Wang