McClure, Qualey & Rodack, LLP
Mechanisms for etching apparatus and etching-detection method
Embodiments of mechanisms of an etching apparatus are provided. The etching apparatus includes a processing chamber. The etching apparatus also includes a gas distribution plate disposed in the processing chamber and comprising a number of exhaust openings. The etching apparatus further includes a number of end-point detectors disposed on the gas distribution plate. The gas distribution plate is configured to spurt gas into the processing chamber via the exhaust openings during a semiconductor process.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
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H01J H01J H01J H01J H01L
inventional additional inventional inventional inventional
Chi-Wei Ping-Ling
Chang Fan