Innovation Counsel LLP
Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.
Samsung Electronics Co. Ltd.
G G H H H H
G03F G03F H01L H01L H01L H01L
inventional inventional inventional inventional additional inventional
Ji-Haeng Bae-Hyoun Young-Bae Jong-An
Han Jung Jung Kim