McDonnell Boehnen Hulbert & Berghoff LLP
Photopatternable compositions and methods of fabricating transistor devices using same
The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.
Flexterra, Inc.
G C C G C G G H G G H G G G H C H G G G G H
G03F C08K C08L G03F C08L G03F G03F H01L G03F G03F H01L G03F G03F G03F H01L C09D H01L G03F G03F G03F G03F H01L
inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional additional inventional inventional inventional inventional additional
Antonio Wei Yan Yan
Facchetti Zhao Zheng Hu