Process for simultaneous development and etch of photoresist and substrate
 Photoresists are developed and the supporting substrate is etched simultaneously therewith by bringing the resist (after exposure) into physical contact with a fluid containing a developer for the resist and an etchant for the supporting substrate. 
Horizons Incorporated, a division of Horizons Research Incorporated
G
G03F
inventional
Raymond W. James M.
Newyear Lewis