Altis Law Group, Inc.
Device cover and method for fabricating the same
A device cover includes a bottom base and at least one sidewall extending from the bottom base. The at least one sidewall is formed by an upsetting process. The device cover is made of metal. Only one fold is formed by flow tracks of metallic grain of the at least one sidewall. A method for fabricating the device cover is also disclosed.
Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd. Hon Hai Precision Industry Co., Ltd.
H B Y B
H05K B21D Y10T B21J
inventional inventional additional inventional
Wei Yu-Lun Lie-Chao
Luo Li Luo