Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution.
Kabushiki Kaisha Toshiba
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inventional inventional inventional
Hiroyasu Hiroshi Hisashi Mami Soichi Yoshihiro
Iimori Tomita Okuchi Saito Nadahara Ogawa