Antonelli, Terry, Stout and Kraus, LLP.
Apparatus and method for testing defects
A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.
Hitachi High-Technologies Corporation Hitachi, Ltd.
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Minori Yoshio Tetsuya Yoshimasa Ryouji Hidetoshi Yukio Takanori Shuichi Takahiro Hisato Keiji Shunichi
Noguchi Morishige Watanabe Ohshima Matsunaga Nishiyama Kembo Ninomiya Chikamatsu Jingu Nakamura Sakai Matsumoto