Dentons US LLP
Device for forming a layer
Provided are a device for forming a layer and an atomic layer deposition (ALD) method or a method for forming a layer. The present application provides a device for forming a layer which may effectively form a desired layer by a continuous ALD, and an ALD method or a method for forming a layer by using the device for forming a layer.
LG CHEM, LTD.
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Seong Hwan Jang Yeon Dong Ryul
Lee Hwang Kim