Haynes and Boone, LLP
Method of defining an intensity selective exposure photomask
An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern.
Taiwan Semiconductor Manufacturing Company, Ltd.
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inventional inventional inventional
Wen-Hao Tsong-Hua Kuei Shun Ying-Chou Te-Chih Yao-Ching Ru-Gun Boren Chih-Yang Wen-Chun Yu Lun Yu-Po Chia-Chu Shu-Chen Tsai-Sheng
Liu Ou Chen Cheng Huang Ku Liu Luo Yeh Huang Liu Tang Liu Lu Gau