McClure, Qualey & Rodack, LLP
Semiconductor device and method for forming the same
Embodiments for forming a semiconductor device structure are provided. The semiconductor device structure includes a substrate and a buried oxide layer formed over the substrate. An interface layer is formed between the substrate and the buried oxide layer. The semiconductor device structure also includes a silicon layer formed over the buried oxide layer; and a polysilicon layer formed over the substrate and in a deep trench. The polysilicon layer extends through the silicon layer, the buried oxide layer and the interface layer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
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inventional inventional inventional additional inventional additional additional additional inventional additional inventional inventional inventional inventional inventional inventional inventional additional inventional
Kuan-Chi Kuo-Yu Wei-Kung Tsung-Yu Chung-Long Chih-Ping Keng-Yu Chun-Hung
Tsai Cheng Tsai Yang Chang Chao Chen Chen