Lee & Morse, P.C.
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
A monomer for a hardmask composition is represented by the following Chemical Formula 1,
CHEIL INDUSTRIES, INC.
C G G
C07C G03F G03F
additional inventional inventional
Yun-Jun Youn-Jin Bum-Jin
Kim Cho Lee