Birch, Stewart, Kolasch & Birch, LLP
Polymer compound, resin composition for photoresists, and method for producing semiconductor
Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects.The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(═O)—, —C(═O)—O—, —O—C(═O)—O—, —C(═O)—O—C(═O)—, —C(═O)—NH—, —S(═O)—O—, —S(═O)2—O—, —ORa, —C(═O)—ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.
Daicel Corporation
C G H G C G C C H
C08F G03F H01L G03F C08F G03F C08F C08F H01L
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Akira Mitsuru Masamichi
Eguchi Ohno Nishimura