Birch, Stewart, Kolasch & Birch, LLP
Mask with hydrophobic surface
A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.
Taiwan Semiconductor Manufacturing Co. Ltd.
Y Y G
Y10S Y10S G03F
additional additional inventional
Chih-Wing
Chang