Method for chemical mechanical planarization of a metal layer located over a photoresist layer and a method for manufacturing a micro pixel array using the same
The present invention provides a method for planarizing a metal layer, and a method for manufacturing a micro pixel array. The method for planarizing the metal layer, without limitation, may include the steps of forming a metal layer over a photoresist layer, and then planarizing the metal layer using a chemical mechanical planarization process.
Texas Instruments Incorporated
G G
G02B G03F
additional inventional
Yanghua James C. David A. Jingqiu Anthony
He Baker Rothenbury Chen DiCarlo