JCIPRNET
Plasma treatment apparatus and driving method thereof
A plasma treatment apparatus is provided to suppress plasma from being generated between an antenna conductor and a lid to prevent contamination inside a vacuum chamber and to put an elongated antenna unit to practical use. The plasma treatment apparatus includes a vacuum chamber that accommodates a treatment target; an inductively coupling antenna unit that generates plasma in the vacuum chamber; and a high frequency power source that supplies a high frequency power to the inductively coupling antenna unit. The inductively coupling antenna unit has one or a plurality of antenna conductors and a lid that covers an opening formed in a wall surface of the vacuum chamber, and the one or plurality of antenna conductors are attached to the lid without a gap where discharge may occur.
Plasma Ion Assist Co., Ltd.
H H H H H H H
H01J H01J H01J H01J H01J H01J H01J
additional inventional inventional inventional inventional inventional additional
Masanori Yasuo
Watanabe Suzuki