Abelman, Frayne & Schwab
Substrate processing method and substrate processing apparatus
The substrate processing method according to an exemplary embodiment includes a low temperature dissolving processing and an etching processing. The low temperature dissolving processing dissolves oxygen in an alkaline aqueous solution cooled to a predetermined temperature lower than the room temperature. The etching processing etches a substrate by supplying the alkaline aqueous solution in which oxygen is dissolved to the substrate.
TOKYO ELECTRON LIMITED
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Takahisa Takashi Yuichi Kazuyoshi Seiya Hiroyuki
Otsuka Nakazawa Douki Shinohara Fujimoto Higashi