Photoresist overcoat compositions and methods of forming electronic devices
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Rohm and Haas Electronic Materials LLC
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C08K G03F C09D G03F G03F C09D Y10S Y10S G03F H01L C08K G03F C08K G03F G03F
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Seung-Hyun Rosemary Young Cheol Jong Keun
Lee Bell Bae Park