Westerman, Hattori, Daniels & Adrian, LLP
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device including forming a lower electrode over a substrate, increasing the temperature of the substrate with the lower electrode to a predetermined temperature under mixture gas atmosphere of inert gas and oxygen gas, forming a dielectric film on the lower electrode by using an organic metal raw material after the temperature reaches the predetermined temperature, and forming an upper electrode on the dielectric film.
Fujitsu Semiconductor Limited
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Wensheng
Wang