Knobbe Martens Olson & Bear LLP
Method of plasma treatment using amplitude-modulated RF power
A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
ASM Japan K.K.
H C H
H01J C23C H01J
inventional inventional inventional
Yasuaki Mitsutoshi Yasushi
Suzuki Shuto Fukasawa