Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
Method for forming pattern using anti-reflective coating composition comprising photoacid generator
The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.
Rohm and Haas Electronic Materials Korea Ltd.
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Hye-Won Jae-Bong Seung Uk Sook Jihoon
Lee Lim Lee Lee Kang