Procopio, Cory, Hargreaves & Savitch LLP
Support unit, apparatus and method for treating a substrate
An embodiment includes a support unit, substrate treating apparatus and substrate treating method. The substrate treating apparatus comprises: a process chamber having a treatment space inside thereof; a support unit for supporting a substrate inside of the process chamber; and a gas supply unit for supplying the treatment gas into the treatment space, wherein the support unit comprises: an electrode layer of a metal material to which a high frequency electric power can be applied; a ground line having one end connected to the electrode layer and the other end grounded; and a switch provided on the ground line.
SEMES CO., LTD.
H H H H H
H01J H01J H01L H01J H01J
inventional inventional inventional inventional inventional
Doo Ho Seungbae Chang-Seung
Lim Lee Ha