Oblon, McClelland, Maier & Neustadt, L.L.P.
Particle measurement mask and particle managing method
According to one embodiment, a particle measurement mask includes a first mask substrate, a support member, and a particle measurement unit. The support member is arranged at a peripheral edge portion of a second main face of the first mask substrate, which is opposite to a first main face of the first mask substrate to come into contact with a mask stage. The particle measurement unit is arranged on a side surface of the support member, and configured to measure presence and absence of particles near the second main face.
Kabushiki Kaisha Toshiba
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additional inventional inventional inventional
Masaru Hiroyuki
Suzuki Mizuno