Sughrue Mion, PLLC
Pattern forming method, etching method and method for producing capacitance-type input device
A pattern forming method includes forming a photosensitive resin composition layer on at least one surface of a substrate using a photosensitive transfer material, exposing the photosensitive resin composition layer; and developing the exposed photosensitive resin composition layer, in which the photosensitive transfer material includes a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, and the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
FUJIFILM Corporation
G H G Y G C G C G G G G G G G C G C C
G03F H03K G03F Y02P G03F C08F G03F C08F G03F G03F G03F G03F G03F G03F G03F C08F G03F C08F C08F
inventional inventional inventional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Shinji Yasumasa Hideaki
Fujimoto Kawabe Ito