Scully, Scott, Murphy & Presser
Thiophene-containing photo acid generators for photolithography
Thiophene-containing photo acid generators having either of the following general formulas: wherein at least one of R1, R2 or R3 is thiophene or thiophene that is substituted with alkyl, alkoxy or cycloalkyl, and the remaining R1, R2 or R3, not containing a thiophene moiety, are independently selected from the group consisting of alkyl, cycloalkyl and aryl, or at least one of R1, R2 or R3 are joined together to form a cyclic moiety having from about 4 to about 8 ring carbon atoms; and Y is a counter ion, are disclosed as well as the use thereof as a component of a chemically amplified resist composition. In addition to the thiophene-containing photo acid generator, the inventive composition includes a chemically amplified base polymer, a solvent, an optional photosensitizer, an optional base, an optional dissolution modifying agent and an optional surfactant.
International Business Machines Corporation
G G C C Y G C
G03F G03F C07C C07D Y10S G03F C07C
additional inventional inventional inventional additional additional additional
Kuang-Jung Wenjie Pushkara Rao
Chen Li Varanasi