Myers Bigel Sibley & Sajovec, PA
Methods of forming semiconductor devices formed by processes including the use of specific etchant solutions
The present invention provides etchant solutions including deionized water and an organic acid having a carboxyl radical and a hydroxyl radical. Methods of forming magnetic memory devices are also disclosed.
Samsung Electronics Co., Ltd.
C C B H H H C C B H
C23F C23F B82Y H01L H01F H01F C23F C23F B82Y H01L
inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Chang-Ki Sang-Jun Yu-Kyung Jeong-Nam
Hong Choi Kim Han