Patterson and Sheridan
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme
A method of etching a substrate is provided. The method of etching a substrate includes transferring a pattern into the substrate using a double patterned amorphous carbon layer on the substrate as a hardmask. Optionally, a non-carbon based layer is deposited on the amorphous carbon layer as a capping layer before the pattern is transferred into the substrate.
Applied Materials
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H01L H01L H01L H01L H01L H01L G03F H01L H01L
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Meihua Wendy H. Chistopher D. Jim Zhongyi Hichem Sang H. Wei
Shen Yeh Bencher He M'Saad Ahn Liu