JCIPRNET
Manufacturing method of semiconductor device and semiconductor processing system
A method of manufacturing a semiconductor device and a semiconductor processing system are provided. The method includes the following steps. A photoresist layer is formed on a substrate in a lithography tool. The photoresist layer is exposed in the lithography tool to form an exposed photoresist layer. The exposed photoresist layer is developed to form a patterned photoresist layer in the lithography tool by using a developer. An ammonia gas by-product of the developer is removed from the lithography tool.
Taiwan Semiconductor Manufacturing Company, Ltd.
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Ko-Bin Ming-Hung Chia-Hung Su-Yu Yu-Kai Li-Jen Zhi-You
Kao Lin Chung Yeh Chen Wu Ke