Haynes and Boone, LLP
Microlens structure for improved CMOS image sensor sensitivity
A method of manufacturing a microlens device by depositing a microlens material layer over a substrate that includes photo-sensors. The microlens material layer is then exposed and developed to define microlens material elements, including first microlens material elements and second microlens material elements. Each second microlens material element is substantially greater in thickness relative to each first microlens material element. The microlens material elements are then heated to form a microlens array that includes first microlens array elements, each corresponding to a first microlens material element, and second microlens array elements, each corresponding to a second microlens material element. Each first microlens array element has a substantially greater focal length relative to each second microlens array element. For example, each second microlens array element is substantially greater in thickness relative to each first microlens array element.
Taiwan Semiconductor Manufacturing Company
G G
G02B G02B
inventional inventional
Chih-Kung Ming-Chang Chin Chen Jack Fu-Tien Bii-Junq
Chang Kao Kuo Deng Weng Chang