Tung & Associates
Slurry flow control and monitor system for chemical mechanical polisher
A system for controlling and monitoring a rate of flow of a fluid, such as a CMP slurry, comprising a pump for pumping the slurry; a flow meter for monitoring the rate of flow of the slurry; and a controller operably connected to the flow meter and the pump. The controller receives signals from the flow meter indicating the rate of flow of the slurry and controls the operational speed of the pump responsive to the flow meter signals. A degasser equipped with a level sensor may be further provided in the system for removing gas bubbles from the slurry.
Taiwan Semiconductor Manufacturing Co., Ltd
F F
F04B F04B
additional inventional
Ben-Shu Chin-Hsin Jui-Cheng Chien-Kuo Chao-Jung
Chen Peng Lo Lu Chang