Thomas, Kayden, Horstemeyer & Risley
Optical proximity correction photomasks
An optical proximity correction photomask comprises a transparent substrate, a main feature having a first transmitivity disposed on the transparent substrate and at least one assist feature having a second transmitivity disposed to each side of the main feature and on the transparent substrate, wherein the first transmitivity is not equal to the second transmitivity.
Taiwan Semiconductor Manufacturing Co., Ltd.
G
G03F
inventional
Ching-Yu
Chang