Oliff PLC
Plasma device
The plasma device includes a vessel with the first and second molds facing to each other. A work is sealed in the closed first and second molds. The work includes an object to be processed with a part to be processed and a part not to be processed on an outer periphery of the part to be processed, and a masking member covering the part not to be processed. The first mold includes a facing plane portion disposed facing an outer periphery surface of the work, a first recessed portion disposed facing the part to be processed and generating plasma, and a second recessed portion disposed facing the part not to be processed between the facing plane portion and the first recessed portion and generating plasma. A depth of the second recessed portion is different from a depth of the first recessed portion.
TOYOTA JIDOSHA KABUSHIKI KAISHA
H H H H C C H C C Y C H
H01M H01J H01M H01J C23C C23C H01J C23C C23C Y02E C23C H01J
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Noriyuki Tetsuharu
Kato Baba