Haynes and Boone, LLP
Defect monitoring for resist layer
Methods for detecting and monitoring defects in a resist material are disclosed. In an example, a method includes forming a resist layer over a substrate; developing the resist layer; washing the developed resist layer with a thinner wash solution, wherein the washing reveals any negatively charged defects in the developed resist layer; and after the washing, inspecting for the negatively charged defects.
Taiwan Semiconductor Manufacturing Company, Ltd.
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inventional inventional inventional
Li-Kong Che-Rong Yung-Yao Ping-Hsi
Turn Laing Lee Yang