Volentine & Whitt, PLLC
Method of fabricating semiconductor device
A method of manufacturing a semiconductor device capable of preventing a cut portion from becoming chipped when dicing. The method of manufacturing a semiconductor device includes preparing a semiconductor wafer having an upper surface (first surface) including a plurality of device regions and partition regions for dividing the plurality of device regions, and a lower surface (second surface) opposite from the upper surface (first surface), forming upper layer wires on the device regions of the upper surface (first surface), etching the semiconductor wafer from a side of the lower surface (second surface) to form a through hole through which the upper layer wire is exposed, and to form a groove in a region of the lower surface (second surface) corresponding to the partition region of the upper surface (first surface), and dicing the semiconductor wafer to form individual device regions.
Oki Semiconductor Co., Ltd.
H H
H01L H01L
inventional inventional
Hidekazu
Kikuchi