Fish & Richardson P.C.
High transmission, high aperture catadioptric projection objective and projection exposure apparatus
The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
Carl Zeiss SMT GmbH
G G G G G
G02B G02B G03F G03F G03F
inventional inventional inventional inventional inventional
Ralf Daniel Alexander Wilhelm Thomas
Mueller Kraehmer Epple Ulrich Schicketanz