Scully Scott Murphy and Presser
Sub-fin doping method
A gap fill method for sub-fin doping includes forming semiconductor fin arrays over a semiconductor substrate, forming a first dopant source layer over a first fin array and filling intra fin gaps within the first array, and forming a second dopant source layer over a second fin array and filling intra fin gaps within the second array. The first and second dopant source layers are recessed to expose a channel region of the fins. Thereafter, an annealing step is used to drive dopants from the dopant source layers locally into sub-fin regions of the fins below the channel regions.
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Shesh Mani Baofu David P. Jiehui Jinping
Pandey Zhu Brunco Shu Liu