Lowe Hauptman & Ham, LLP
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarizing process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber is substantially co-planar with the top surface of the hard mask layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
G G
G03F G03F
inventional inventional
Ching-Hsu Hung-Chun Wen-Chun Ru-Gun Boren
Chang Wang Huang Liu Luo