Swanson & Bratschun, L.L.C.
Image sensor and manufacturing method thereof
An image sensor and a manufacturing method thereof are provided. The image sensor includes: a photo diode; a first-conductive-type isolating layer; a second-conductive-type lightly-doped region formed in the first-conductive-type semiconductor substrate; a first-conductive-type lightly-doped region formed under the second-conductive-type lightly-doped region, where the second-conductive-type lightly-doped region is isolated from the second-conductive-type region by the first-conductive-type lightly-doped region; a gate structure of a transfer transistor; and a floating diffusion region which is second-conductive-type heavily-doped. In the image sensor, the second-conductive-type lightly-doped region is formed to be connected with the floating diffusion region, thus, a distance between the floating diffusion region and the photo diode may be reduced which may enable photo-induced carriers to be transmitted from the photo diode to the floating diffusion region more rapidly, and further increase the transmission efficiency of the photo-induced carriers.
GalaxyCore Shanghai Limited Corporation
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Jie Ze Wenqiang Lixin
Li Xu Li Zhao