Maschoff Brennan
Developing method
A developing method includes rotating a wafer. A developer solution is dispensed onto the rotated wafer through a first nozzle. The first nozzle is moved from a first position to a second position. The first position and the second position are over the wafer and within a perimeter of the wafer when viewed from a top of the wafer. The developer solution is dispensed through the first nozzle when moving the first nozzle from the first position to the second position. The first nozzle is moved back from the second position to the first position immediately after the first nozzle is moved from the first position to the second position. The developer solution is dispensed through the first nozzle when moving the first nozzle from the second position to the first position.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H H G
H01L H01L G03F
inventional inventional inventional
Ming-Shane Jui-Ping Fei-Gwo Chung-Hao Yi-Rem Li-Kong
Lu Chuang Tsai Chang Chen Turn