Duane Morris LLP
Method for repairing opaque defects on semiconductor mask reticles
A method is disclosed for repairing an opaque defect on a mask substrate. After examining one or more opaque patterns in a predetermined area of the mask substrate, at least one opaque defect in the opaque patterns is identified based on a difference between its light reflection rate and a reference reflection rate. A residue height of the opaque defect is further determined based on its light transmission rate, and a repair formula such as an etching dosage is devised based on the determined residue height.
Taiwan Semiconductor Manufacturing Company
G G
G01N G01N
inventional inventional
Shan-Chan Wei-Lian Chun-Hung Chian-Hun Chia-Hsien Shao-Chi Chi-Kang
Suc Lin Kung Lai Chen Wei Chang