Oliff & Berridge, PLC
Method of forming main pole of thermally-assisted magnetic recording head
In a method of forming a main pole, an initial accommodation layer is etched by RIE using a first etching mask having a first opening, whereby a groove is formed in the initial accommodation layer. Next, a part of the initial accommodation layer including the groove is etched by RIE using a second etching mask having a second opening, so that the groove becomes an accommodation part. The main pole is then formed in the accommodation part. The first etching mask has first and second sidewalls that face the first opening and are opposed to each other at a first distance in a track width direction. The second etching mask has third and fourth sidewalls that face the second opening and are opposed to each other at a second distance greater than the first distance.
Headway Technologies, Inc.
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Shigeki Kazuki Yukinori Hiroyuki Yoshitaka Hironori
Tanemura Sato Ikegawa Ito Sasaki Araki