Frommer Lawrence & Haug LLP
Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound
A method for the vapor deposition of aluminum films is provided. Such method employs a dialkyl amido dihydroaluminum compound of the formula [H2AlNR1R2]n wherein R1 and R2 are the same or different alkyl groups having 1 to 3 carbons, and n is an integer of 2 or 3. The aluminum films may be thick or thin and may be aluminum films or may be mixed metal films with aluminum metal. Both CVD and ALD methods may be employed.
UP Chemical Co., Ltd.
C
C23C
inventional
Jin Sik Hyun Koock Young Seop Bum Soo Jun Young Bo Yearn
Kim Shin Kim Kim Kim Cho