Janah & Associates
Electrostatic chuck having improved gas conduits
 An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises a dielectric covered electrode 110 having at least one heat transfer gas flow conduit 150 therein. An electrical isolator 200 comprising dielectric material is positioned in the gas flow conduit 150 to (i) electrically isolate the gas in the conduit from the plasma or electrode 110, and (ii) allow passage of heat transfer gas through the conduit. Preferably, the dielectric material comprises a plasma-deactivating material that has a high surface area that reduces plasma formation of gas passing through the conduit 150 in a plasma process. A semiconducting dielectric member 115 useful for rapidly charging and discharging electrostatic chucks is also described. 
Applied Materials, Inc.
H H H H Y C
H01J H01J H01L H01L Y10T C23C
additional inventional inventional inventional additional inventional
Kenneth S. Kadthala R. Arnold Robert J. Brian Timothy Edwin C. Alexander M. Semyon L. Arik Ananda H. Shamouil Dennis S. Dan
Collins Narendrnath Kholodenko Steger Lue Dyer Weldon Veytser Kats Donde Kumar Shamouilian Grimard Maydan