Harness, Dickey & Pierce, P.L.C.
Heating apparatus and substrate processing apparatus having the same
A heating apparatus including a side wall heat insulator configured to provide an inner space for receiving a reaction tube, an upper wall heat insulator covering a top portion of the side wall heat insulator, a heat generation part in an inner surface of the side wall heat insulator, and a heat compensating part on a lower surface of the upper wall heat insulator, the heat compensating part including a reflection surface in a first region on the lower surface of the upper wall heat insulator, the first region having a first emissivity less than an emissivity of the upper wall heat insulator may be provided.
Sungkyunkwan University's Research & Business Foundation Samsung Electronics Co., Ltd.
H C H C H C C F C H H
H01L C23C H05B C23C H05B C23C C23C F28F C23C H01L H01L
inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Byeong-Hoon Sun Han-Seo Seung-Hwan Sung-Han Seung-Ho Byung-Hwan
Kim Cho Ko Kang Lee Lee Kong