F. Chau & Associates, LLC
Resist composition and method for forming a pattern using the same
The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.
Samsung Electronics Co., Ltd.
G B G G Y Y B
G03F B82Y G03F G03F Y10S Y10S B82Y
inventional inventional inventional inventional additional additional inventional
Jung-Mok Bo-Sung Seung-Jun
Bae Kim Lee