Hogan & Hartson, LLP
Negative resist material and pattern formation method using the same
A negative resist material, which comprises at least a high polymer containing repeating units represented by the following general formula (1) and having a weight average molecular weight of 1,000 to 500,000. There is provided a negative resist material, in particular, a negative resist material of chemical amplification type, which shows high sensitivity, resolution, exposure latitude and process adaptability as well as good pattern shape after light exposure, and further shows superior etching resistance.
Shin-Etsu Chemical Co., Ltd.
Y Y G
Y10S Y10S G03F
additional additional inventional
Wataru Osamu Ryuji Takanobu
Kusaki Watanabe Koitabashi Takeda