Negative-working photoresist compositions for laser ablation and use thereof
A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm.The present invention also encompasses a process comprising steps a), b) and c)      The present invention also encompasses a process comprising steps a′), b′) c′) and d′)      
Merck Patent GmbH
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Ping-Hung Chunwei Weihong
Lu Chen Liu