Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Insulating film and electronic device
An insulating film includes a first barrier layer, a well layer provided on the first barrier layer, a second barrier layer provided on the well layer. The first barrier layer consists of a material having a first bandgap and a first relative permittivity. The well layer consists of a material having a second bandgap smaller than the first bandgap and having a second relative permittivity larger than first relative permittivity. The second barrier layer consists of a material having a third bandgap larger than the second bandgap and having a third relative perminivity smaller than second relative permittivity. Each of the first and second barrier layers has a thickness not smaller than 2.5 angstroms, and 2.5>(d1/ε1+d2/ε2) is satisfied where d1 and d2 (angstrom) are the thicknesses of the first and second barrier layers, respectively, ε1 is the first relative permittivity, and ε2 is the third permittivity.
Kabushiki Kaisha Toshiba
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Tatsuo Hideki
Shimizu Satake