McClure, Qualey & Rodack, LLP
Semiconductor device and method of fabricating the same
A semiconductor device includes a semiconductor substrate, a source/drain over the semiconductor substrate, a bottom conductive feature over the source/drain, a gate structure over the semiconductor substrate, a first spacer between the gate structure and the bottom conductive feature, a second spacer over the first spacer, and a contact plug landing on the bottom conductive feature and the second spacer. A top surface of the gate structure is free from coverage by the second spacer.
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H H H H H H H H H H H H H H H H
H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L H01L
inventional inventional inventional inventional inventional additional inventional inventional inventional inventional inventional inventional inventional inventional inventional inventional
Chia-Hao Jia-Chuan Chih-Hao Yu-Ming Wai-Yi
Chang You Wang Lin Lien