J.C. Patents
Wafer cleaning device
 A wafer-cleaning device comprises a looped belt forming an enclosed region and a pair of rollers. Each roller occupies one end inside the enclosed region. Furthermore, a supporting structure located inside the enclosed region not only supports the rollers, but also maintains some tension on the belt. Thus, one portion of the belt is flat. The supporting structure is capable of supporting a wafer as well. In addition, a wafer-rotating device can be installed next to the edge of a wafer so that the wafer can rotate in a prescribed direction while the wafer surface is cleaned. 
Worldwide Semiconductor Manufacturing Corp.
H B
H01L B08B
inventional inventional
Ying-Chih Sen-Nan
Liu Lee