Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning
A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
Tokyo Electron Limited
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inventional inventional inventional inventional
Yoshio Issei Shinichi Yasushi Nobuaki Masami Hikaru
Kimura Ueda Hayashi Hayashida Matsuoka Akimoto Ito