Dentons US LLP
Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.
LG CHEM, LTD.
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Nam Seok Jungsun Dong Hyun Seung Heon Ji Young Han Min
Bae You Oh Lee Hwang Seo