Lerner, David, Littenberg, Krumholz & Mentlik, LLP
Block copolymer
The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
LG Chem, Ltd.
C C B G C H C B G C C C C C C C C C B G C G C H H G C B G C C C C C C C C G C B G H C C C G C C G
C08L C08G B05D G03F C08F H01L C08G B81C G03F C08F C08G C08F C08L C08J C08J C08J C08F C08G B05D G03F C07B G03F C08G H01L H01L G03F C09D B81C G03F C08F C08F C08F C08F C08F C08F C08F C08G G03F C08L B82Y G03F H01L C01P C08G C08F G03F C08F C08G G03F
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Je Gwon Hyung Ju No Jin Se Jin Eun Young Jung Keun Sung Soo Mi Sook
Lee Ryu Park Ku Choi Kim Yoon Lee