Scully, Scott, Murphy & Presser, P.C.
Asymmetric channel MOSFET
A field effect transistor includes a partial SiGe channel, i.e., a channel including a SiGe channel portion, located underneath a gate electrode and a Si channel portion located underneath an edge of the gate electrode near the drain region. The SiGe channel portion can be located directly underneath a gate dielectric, or can be located underneath a Si channel layer located directly underneath a gate dielectric. The Si channel portion is located at the same depth as the SiGe channel portion, and contacts the drain region of the transistor. By providing a Si channel portion near the drain region, the GIDL current of the transistor is maintained at a level on par with the GIDL current of a transistor having a silicon channel only during an off state.
International Business Machines Corporation Globalfoundries Inc.
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Nam Sung Xiangdong Jie Daniel Weipeng Xiaobin Jae-Eun Deleep R.
Kim Chen Deng Tekleab Li Yuan Park Nair