Brooks Kushman P.C.
Method for the wet-chemical treatment of a semiconductor wafer
A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 μm or less to the rotating wafer such that a liquid film forms on the wafer; c) exposing the rotating semiconductor wafer to a gas atmosphere containing a reactive gas; and d) removing the liquid film from the wafer.
Siltronic AG
H H B
H01L H01L B08B
inventional inventional inventional
Yoshihiro Teruo Thomas Guenter Diego Clemens
Mori Haibara Buschhardt Schwab Feijoo Zapilko