Jordan and Hamburg
Process for etching light-shielding thin film
 A light shielding thin film is provided on a light transmitting substrate, and the film is covered by a photoresist. The photoresist is exposed and developed to form a pattern, and the film is etched using the pattern as a mask. The pattern is then exposed through the substrate, using the film as a mask, the pattern then being developed to form a pattern of reduced size. The film is then etched using the reduced size pattern as a mask. 
Seikosha Co., Ltd. Nippon Precision Circuits Ltd.
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Yoshiaki Noboru Kazunori Katsuo Keiko Sakae Yaeko Yoshihisa
Watanabe Motai Saito Shirai Shibuki Tanaka Suzuki Ogiwara