Haynes and Boone, LLP
Method to detect photoresist residue on a semiconductor device
A method for detecting photoresist residue during semiconductor device manufacture includes developing photoresist on a surface of a semiconductor device to expose portions of the surface A plurality of etch paths are then partially etched into the surface and inspected to determine their depths.
Taiwan Semiconductor Manufacturing Company, Ltd.
H H G
H01L H01L G03F
inventional inventional inventional
Yung-Lung To-Yu Mei-Yen
Hsu Chen Li